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| 4. |
- Bravo, L, et al.
(författare)
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- 2021
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swepub:Mat__t
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| 6. |
- Tabiri, S, et al.
(författare)
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- 2021
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swepub:Mat__t
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| 7. |
- Akhtar, Farid, et al.
(författare)
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Effect of WC particle size on the microstructure, mechanical properties and fracture behavior of WC--(W, Ti, Ta) C--6wt% Co cemented carbides
- 2007
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Ingår i: International journal of refractory metals & hard materials. - : Elsevier BV. - 0263-4368. ; 25:5-6, s. 405-410
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Tidskriftsartikel (refereegranskat)abstract
- This study deals with the microstructure and mechanical properties of WC–(W, Ti, Ta) C–9 vol.% Co cemented carbides fabricated by conventional sintering. The conventional WC particles of 4 μm size and ultrafine particles of 0.2 μm were introduced in the system with varying ratio. The ratios of conventional WC particles to ultrafine WC particles were 2:1, 1:1, and 1:2. The microstructures of sintered WC–(W, Ti, Ta) C–9 vol.% Co cemented carbides were sensitively dependent on the ratio of conventional WC particles to ultrafine WC particles. The rim phase increased with the increase in the amount of ultrafine particles. Hardness of WC–(W, Ti, Ta) C–9 vol.% Co cemented carbide increased with increase in the amount of rim phase and decrease in the average grain size of WC particles. The bending strength showed the similar trend of the hardness. The fracture morphologies are reported. The fracture behavior changed from mixed mode to transgranular fracture mode, when the ratio of conventional WC particles to ultrafine WC particles was changed from 2:1 to 1:2.
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| 8. |
- Askari, SJ, et al.
(författare)
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Adherent and low friction nano-crystalline diamond film grown on titanium using microwave CVD plasma
- 2008
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Ingår i: Diamond and related materials. - : Elsevier BV. - 0925-9635 .- 1879-0062. ; 17:3, s. 294-299
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Tidskriftsartikel (refereegranskat)abstract
- The use of titanium alloys for aerospace and biomedical applications could increase if their tribological behavior was improved. The deposition of an adherent diamond coating can resolve this issue. However, due to the different thermal expansion coefficients of the two materials, it is difficult to grow adherent thin diamond layers on Ti and its metallic alloys. In the present work microwave plasma chemical vapor deposition (MWPCVD) was used to deposit smooth nano-crystalline diamond (NCD) film on pure titanium substrate using Ar, CH4 and H2 gases at moderate deposition temperatures. Of particular interest in this study was the exceptional adhesion of approximately 2 μm-thick diamond film to the metal substrate as observed by indentation testing up to 150 kg load. The friction coefficient, which was measured with a cemented carbide ball of 10 mm diameter with 20 N load, was estimated to be around 0.04 in dry air. Morphology, surface roughness, diamond crystal orientation and quality were obtained by characterizing the sample with field emission electron microscopy (FE-SEM), atomic force microscopy (AFM), X-ray diffraction (XRD) and Raman spectroscopy, respectively.
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| 9. |
- Askari, SJ, et al.
(författare)
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Synthesis and characterization of nano-crystalline CVD diamond film on pure titanium using Ar/CH 4/H 2 gas mixture
- 2007
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Ingår i: Materials letters (General ed.). - : Elsevier BV. - 0167-577X .- 1873-4979. ; 61:11-12, s. 2139-2142
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Tidskriftsartikel (refereegranskat)abstract
- Titanium and Ti alloys have poor tribological properties and deposition of a well adherent diamond coating is a promising way to solve this problem. But diamond film deposition on pure titanium and Ti alloys is always difficult due to the high diffusion coefficient of carbon in Ti, the large mismatch in their thermal expansion coefficients, the complex nature of the interlayer formed during diamond deposition, and the difficulty of achieving very high nucleation density. A nano-crystalline diamond (NCD) film can resolve Ti and Ti alloys weak tribological performance due to its smooth surface. A well-adhered NCD film was successfully deposited on pure Ti substrate by using a microwave plasma assisted chemical vapor deposition (MWPCVD) system in the environment of Ar, CH4 and H2 gases at a moderate temperature. Detailed experimental results on the preparation, characterization and successful deposition of the NCD film on pure Ti are discussed
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| 10. |
- Askari, SJ, et al.
(författare)
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Two-step growth of high-quality nano-diamond films using CH 4/H 2 gas mixture
- 2007
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Ingår i: Vacuum. - : Elsevier BV. - 0042-207X .- 1879-2715. ; 81:5, s. 713-717
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Tidskriftsartikel (refereegranskat)abstract
- Diamond films with fine grain size and good quality were successfully deposited on pure titanium substrate using a novel two-step growth technique in microwave plasma-assisted chemical vapor deposition (MWPCVD) system. The films were grown with varying the methane (CH4) concentration at the stage of bias-enhanced nucleation (BEN) and nano-diamond film deposition. It was found that nano-diamond nuclei were formed at a relatively high methane concentration, causing a secondary nucleation at the accompanying growth step. Nano-diamond film deposition on pure titanium was always very hard due to the high diffusion coefficient of carbon in Ti, the big difference between thermal expansion coefficients of diamond and Ti, the complex nature of the interlayer created during diamond deposition, and the difficulty in achieving very high nucleation density. A smooth and well-adhered nano-diamond film was successfully obtained on pure Ti substrate. Detailed experimental results on the synthesis, characterization and successful deposition of the nano-diamond film on pure Ti are discussed
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