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Sökning: WFRF:(Boisen A.)

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1.
  • Kobel, M., et al. (författare)
  • p53 and ovarian carcinoma survival: an Ovarian Tumor Tissue Analysis consortium study
  • 2023
  • Ingår i: Journal of Pathology Clinical Research. - : Wiley. - 2056-4538. ; 9:3, s. 208-222
  • Tidskriftsartikel (refereegranskat)abstract
    • Our objective was to test whether p53 expression status is associated with survival for women diagnosed with the most common ovarian carcinoma histotypes (high-grade serous carcinoma [HGSC], endometrioid carcinoma [EC], and clear cell carcinoma [CCC]) using a large multi-institutional cohort from the Ovarian Tumor Tissue Analysis (OTTA) consortium. p53 expression was assessed on 6,678 cases represented on tissue microarrays from 25 participating OTTA study sites using a previously validated immunohistochemical (IHC) assay as a surrogate for the presence and functional effect of TP53 mutations. Three abnormal expression patterns (overexpression, complete absence, and cytoplasmic) and the normal (wild type) pattern were recorded. Survival analyses were performed by histotype. The frequency of abnormal p53 expression was 93.4% (4,630/4,957) in HGSC compared to 11.9% (116/973) in EC and 11.5% (86/748) in CCC. In HGSC, there were no differences in overall survival across the abnormal p53 expression patterns. However, in EC and CCC, abnormal p53 expression was associated with an increased risk of death for women diagnosed with EC in multivariate analysis compared to normal p53 as the reference (hazard ratio [HR] = 2.18, 95% confidence interval [CI] 1.36-3.47, p = 0.0011) and with CCC (HR = 1.57, 95% CI 1.11-2.22, p = 0.012). Abnormal p53 was also associated with shorter overall survival in The International Federation of Gynecology and Obstetrics stage I/II EC and CCC. Our study provides further evidence that functional groups of TP53 mutations assessed by abnormal surrogate p53 IHC patterns are not associated with survival in HGSC. In contrast, we validate that abnormal p53 IHC is a strong independent prognostic marker for EC and demonstrate for the first time an independent prognostic association of abnormal p53 IHC with overall survival in patients with CCC.
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2.
  • Langer, Judith, et al. (författare)
  • Present and Future of Surface-Enhanced Raman Scattering
  • 2020
  • Ingår i: ACS Nano. - : American Chemical Society (ACS). - 1936-086X .- 1936-0851. ; 14:1, s. 28-117
  • Forskningsöversikt (refereegranskat)abstract
    • The discovery of the enhancement of Raman scattering by molecules adsorbed on nanostructured metal surfaces is a landmark in the history of spectroscopic and analytical techniques. Significant experimental and theoretical effort has been directed toward understanding the surface-enhanced Raman scattering (SERS) effect and demonstrating its potential in various types of ultrasensitive sensing applications in a wide variety of fields. In the 45 years since its discovery, SERS has blossomed into a rich area of research and technology, but additional efforts are still needed before it can be routinely used analytically and in commercial products. In this Review, prominent authors from around the world joined together to summarize the state of the art in understanding and using SERS and to predict what can be expected in the near future in terms of research, applications, and technological development. This Review is dedicated to SERS pioneer and our coauthor, the late Prof. Richard Van Duyne, whom we lost during the preparation of this article. ©
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3.
  • Hakonen, Aron, 1970, et al. (författare)
  • Hand-Held Femtogram Detection of Hazardous Picric Acid with Hydrophobic Ag Nanopillar SERS Substrates and Mechanism of Elasto-Capillarity
  • 2017
  • Ingår i: ACS Sensors. - : American Chemical Society (ACS). - 2379-3694. ; 2:2, s. 198-202
  • Tidskriftsartikel (refereegranskat)abstract
    • Picric acid (PA) is a severe environmental and security risk due to its unstab e, toxic, and explosive properties. It is also challenging to detect in trace amounts and in situ because of its highly acidic and anionic character. Here, we assess sensing of PA under nonlaboratory conditions using surface-enhanced Raman scattering (SERS) silver nanopillar substrates and handheld Raman spectroscopy equipment. The advancing elasto-capillarity effects are explained by molecular dynamics simulations. We obtain a SERS PA detection limit on the order of 20 ppt, corresponding attomole amounts, which together with the simple analysis methodology demonstrates that the presented approach is highly competitive for ultrasensitive analysis in the field.
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4.
  • Tenje, Maria, et al. (författare)
  • Cantilver based sensors
  • 2013
  • Ingår i: Optochemical Nanosensors. - : CRC Press. - 9781439854891 - 9780429063169
  • Bokkapitel (refereegranskat)
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5.
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6.
  • Andersson, Malte, 1941, et al. (författare)
  • ”Minskande befolkning är inte problemet”
  • 2020
  • Ingår i: Dagens Nyheter. ; :1 augusti, DN-debatt
  • Tidskriftsartikel (populärvet., debatt m.m.)abstract
    • Nätverket Population Matters Sweden: En uppmärksammad studie i The Lancet pekar mot en lägre befolkningsökning i världen än tidigare prognoser. Men en miljard människor till är fortfarande långt över vad jorden klarar. Befolkningstrenden måste snarare vända neråt, och det kräver åtgärder för att stärka kvinnors rättigheter världen över.
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7.
  • BENBADIS, L, et al. (författare)
  • WORKING GROUP-VII - FOOD-PRODUCTS
  • 1995
  • Ingår i: MICROBIAL ECOLOGY IN HEALTH AND DISEASE. - 0891-060X. ; 8, s. S43-S44
  • Tidskriftsartikel (övrigt vetenskapligt/konstnärligt)
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8.
  • Forsen, E, et al. (författare)
  • Dry release of suspended nanostructures
  • 2004
  • Ingår i: Microelectronic Engineering. - 1873-5568. ; 73-74, s. 487-490
  • Tidskriftsartikel (refereegranskat)abstract
    • A dry release method for fabrication of suspended nanostructures is presented. The technique has been combined with an anti-stiction treatment for fabrication of nanocantilever based nanoelectromechanical systems (NEMS). The process combines a dry release method, using a supporting layer of photoresist which is removed using oxygen ashing in a reactive ion etcher (RIE), with CHF3 plasma induced deposition of an fluorocarbon (FC) film acting as an antistiction coating. All in a single RIE sequence. The dry release process is contamination free and batch process compatible. Furthermore, the technique enables long time storage and transportation of produced devices without the risk of stiction. By combining the dry release method with a plasma deposited anti-stiction coating both fabrication induced stiction, which is mainly caused by capillary forces originating from the dehydration of meniscuses formed between suspended structures and the substrate during processing, as well as in-use stiction, occurring during mechanical operation of the system, are avoided. (C) 2004 Elsevier B.V. All rights reserved.
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9.
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10.
  • Forsen, E, et al. (författare)
  • Fabrication of cantilever based mass sensors integrated with CMOS using direct write laser lithography on resist
  • 2004
  • Ingår i: Nanotechnology. - : IOP Publishing. - 0957-4484 .- 1361-6528. ; 15:10, s. 628-633
  • Tidskriftsartikel (refereegranskat)abstract
    • A CMOS compatible direct write laser lithography technique has been developed for cantilever fabrication on pre-fabricated standard CMOS. We have developed cantilever based sensors for mass measurements in vacuum and air. The cantilever is actuated into lateral vibration by electrostatic excitation and the resonant frequency is detected by capacitive readout. The device is integrated on standard CMOS circuitry. In the work a new direct write laser lithography (DWL) technique is introduced. This laser lithography technique is based on direct laser writing on substrates coated with a resist bi-layer consisting of poly(methyl methacrylate) (PMMA) on lift-off resist (LOR). Laser writing evaporates the PMMA, exposing the LOR. A resist solvent is used to transfer the pattern down to the substrate. Metal lift-off followed by reactive ion etching is used for patterning the structural poly-Si layer in the CMOS. The developed laser lithography technique is compatible with resist exposure techniques such as electron beam lithography. We demonstrate the fabrication of sub-micrometre wide suspended cantilevers as well as metal lift-off with feature line widths down to approximately 500 nm.
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