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  • Darakchieva, Vanya, et al. (författare)
  • Free electron properties and hydrogen in InN grown by MOVPE
  • 2011
  • Ingår i: PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE. - : WILEY-BLACKWELL, COMMERCE PLACE, 350 MAIN ST, MALDEN 02148, MA USA. - 1862-6300. ; 208:5, s. 1179-1182
  • Tidskriftsartikel (refereegranskat)abstract
    • In this work we present a comprehensive study on the hydrogen impurities, free electron, and structural properties of MOVPE InN films with state-of-the-art quality. We find a correlation between the decrease of free electron concentration and the reduction of bulk hydrogen in the films upon thermal annealing, while no changes in the dislocation densities and strain are observed. Our results suggest that hydrogen is a major source for the unintentional n-type doping in MOVPE InN.
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3.
  • Darakchieva, Vanya, et al. (författare)
  • Unintentional incorporation of H and related structural and free-electron properties of c- and a-plane InN
  • 2012
  • Ingår i: PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE. - : Wiley-VCH Verlag Berlin. - 1862-6300. ; 209:1, s. 91-94
  • Tidskriftsartikel (refereegranskat)abstract
    • In this work, we present a comprehensive study on the hydrogen impurity depth profiles in InN films with polar c-plane and nonpolar a-plane surface orientations in relation to their structural and free-electron properties. We find that the as-grown nonpolar films exhibit generally higher bulk and near-surface H concentrations compared to the polar InN counter-parts. The latter may be partly associated with a change in the growth mode from 2D to 3D and a decrease in the grain size. Thermal annealing leads to a reduction of H concentrations and the intrinsic H levels are influenced by the structural characteristics of the films. The factors allowing reduction of bulk H and free electron concentrations in a-plane films are discussed.
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  • Resultat 1-4 av 4

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