| 1. |
- Boonen, Annelies, et al.
(författare)
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2021 EULAR points to consider to support people with rheumatic and musculoskeletal diseases to participate in healthy and sustainable paid work
- 2022
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Ingår i: Annals of the Rheumatic Diseases. - : BMJ. - 0003-4967 .- 1468-2060. ; 82:1, s. 57-64
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Tidskriftsartikel (refereegranskat)abstract
- Aim As part of its strategic objectives for 2023, EULAR aims to improve the work participation of people with rheumatic and musculoskeletal diseases (RMDs). One strategic initiative focused on the development of overarching points to consider (PtC) to support people with RMDs in healthy and sustainable paid work participation. Methods EULAR's standardised operating procedures were followed. A steering group identified six research areas on paid work participation. Three systematic literature reviews, several non-systematic reviews and two surveys were conducted. A multidisciplinary taskforce of 25 experts from 10 European countries and Canada formulated overarching principles and PtC after discussion of the results of literature reviews and surveys. Consensus was obtained through voting, with levels of agreement obtained anonymously. Results Three overarching principles and 11 PtC were formulated. The PtC recognise various stakeholders are important to improving work participation. Five PtC emphasise shared responsibilities (eg, obligation to provide active support) (PtC 1, 2, 3, 5, 6). One encourages people with RMDs to discuss work limitations when necessary at each phase of their working life (PtC 4) and two focus on the role of interventions by healthcare providers or employers (PtC 7, 8). Employers are encouraged to create inclusive and flexible workplaces (PtC 10) and policymakers to make necessary changes in social and labour policies (PtC 9, 11). A research agenda highlights the necessity for stronger evidence aimed at personalising work-related support to the diverse needs of people with RMDs. Conclusion Implementation of these EULAR PtC will improve healthy and sustainable work participation of people with RMDs.
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| 2. |
- Przewlocki, H. M., et al.
(författare)
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Photoemission yield and the electron escape depth determination in metal-oxide-semiconductor structures on N+-type and P+-type silicon substrates
- 2012
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Ingår i: Journal of Applied Physics. - : AIP Publishing. - 0021-8979 .- 1089-7550. ; 111:11, s. 114510-
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Tidskriftsartikel (refereegranskat)abstract
- This article gives a quantitative analysis of electron photoemission yield from N+-type and P+-type substrates of MOS structures. Based on this analysis, a method is presented to estimate both the scattering length, l, of electrons in the image force potential well and of photoelectron escape depth, x(esc), from the semiconductor substrate. This method was used to estimate the scattering length and the escape depth from the substrates of Al-SiO2-Si (N+-type and P+-type) structures. It was found that for N+-type substrate structures the scattering in the image force potential well has a dominating influence on the photoemission yield while for P+-type substrate structures both the scattering in the image force potential well and the photoemission from the subsurface regions of the photoemitter play important roles. It was found that the scattering length in the image force potential well was equal to l = 6.7-6.9 nm for structures on both N+ and P+ substrates, produced in the same processing conditions. For structures on P+ substrates, the escape depth was found to be equal to x(esc) = 8-9 nm. The scattering length, l, determined in this study is considerably larger than the one reported previously (l = 3.4 nm) for similar MOS structures. The escape depth x(esc) determined in this study is also considerably larger than the escape depth determined previously (x(esc) = 1.2-2.5 nm) for the external photoemission from uncovered silicon surfaces into vacuum.
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