| 1. |
- Gogova, Daniela, et al.
(författare)
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Optical and structural characteristics of virtually unstrained bulk-like GaN
- 2004
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Ingår i: Japanese Journal of Applied Physics. - 0021-4922 .- 1347-4065. ; 43:4A, s. 1264-1268
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Tidskriftsartikel (refereegranskat)abstract
- Bulk-like GaN with high structural and optical quality has been attained by hydride vapor-phase exitapy (HVPE). The as-grown 330 mum-thick GaN layer was separated from the sapphire substrate by a laser-induced lift-off process. The full width at half maximum values of the X-ray diffraction (XRD) omega-scans of the free-standing material are 96 and 129 arcsec for the (1 0 -1 4) and (0 0 0 2) reflection, respectively, which rank among the smallest values published so far for free-standing HVPE-GaN. The dislocation density determined by plan-view TEM images is 1-2 x 10(7) cm(-2). Positron annihilation spectroscopy studies show that the concentration of Ga vacancy related defects is about 1.5 x 10(16) cm(-3). The high-resolution XRD, photoluminescence, mu-Raman, and infrared spectroscopic ellipsometry measurements consistently prove that the free-standing material is of high crystalline quality and virtually strain-free. Therefore it is suitable to serve as a substrate for stress-free growth of high-quality III-nitrides based device heterostructures.
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| 2. |
- Ashkenov, N., et al.
(författare)
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Infrared dielectric functions and phonon modes of high-quality ZnO films
- 2003
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Ingår i: Journal of Applied Physics. - : AIP Publishing. - 0021-8979 .- 1089-7550. ; 93:1, s. 126-133
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Tidskriftsartikel (refereegranskat)abstract
- A study was performed on the phonon modes and infrared dielectric functions of high-quality ZnO thin films. The pulsed laser deposition technique was used to deposit the ZnO films on c-plane sapphire substrates and were investigated by high-resolution transmission electron microscopy, high-resolution x-ray diffraction and Rutherford backscattering experiments. The accurate long-wavelength dielectric constant limits of the films were also obtained and were compared with near-band-gap index-of-refraction data upon the Lyddane-Sachs-Teller relation for both film and bulk samples. It was found that the phonon modes of the film were highly consistent with those of the bulk sample.
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| 3. |
- Darakchieva, Vanya, et al.
(författare)
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Infrared ellipsometry and Raman studies of hexagonal InN films : Correlation between strain and vibrational properties
- 2004
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Ingår i: Superlattices and Microstructures. - : Elsevier BV. - 0749-6036 .- 1096-3677. ; 36:4-6, s. 573-580
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Tidskriftsartikel (refereegranskat)abstract
- The vibrational properties of InN films with different strain have been studied using Infrared ellipsometry and Raman scattering spectroscopy. We have established a correlation between the phonon mode parameters and the strain, which allows the determination of the deformation potentials and the strain-free frequencies of the InN E1(TO) and E2 modes. The LO phonons and their coupling to the free-carrier plasmon excitations are also discussed in relation to the carrier concentration in the films. © 2004 Elsevier Ltd. All rights reserved.
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| 4. |
- Kasic, A., et al.
(författare)
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Micro-Raman scattering profiling studies on HVPE-grown free-standing GaN
- 2004
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Ingår i: Physica status solidi. A, Applied research. - : Wiley. - 0031-8965 .- 1521-396X. ; 201:12, s. 2773-2776
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Tidskriftsartikel (refereegranskat)abstract
- Free-standing GaN of ∼330 μm thickness with low defect density was prepared by hydride vapor-phase epitaxy (HVPE) on sapphire in a vertical atmospheric-pressure reactor and a subsequent laser-induced lift-off process. The structural and optical properties of the material were assessed by various characterization techniques, like X-ray diffraction, photo- and cathodoluminescence, spectroscopic ellipsometry, positron annihilation spectroscopy, and transmission electron microscopy. Here, we focus on μ-Raman scattering profiling studies providing the vertical strain distribution and the evolution of the crystalline quality with increasing layer thickness. Profiles of the free-carrier concentration are obtained from monitoring the LO-phonon plasmon coupled mode. Comparative investigations are performed on the material before and after separation of the sapphire substrate. The GaN material presented here is well capable of serving as a substrate for further homoepitaxial strain-relaxed and crack-free growth needed for fabrication of high-quality III-nitride device heterostructures.
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