| 1. |
- Liu, Zhengjun, et al.
(författare)
-
Aluminum oxide mask fabrication by focused ion beam implantation combined with wet etching
- 2013
-
Ingår i: Nanotechnology. - : IOP Publishing. - 0957-4484 .- 1361-6528. ; 24:17, s. 175304-
-
Tidskriftsartikel (refereegranskat)abstract
- A novel aluminum oxide (Al2O3) hard mask fabrication process with nanoscale resolution is introduced. The Al2O3 mask can be used for various purposes, but in this work it was utilized for silicon patterning using cryogenic deep reactive ion etching (DRIE). The patterning of Al2O3 is a two-step process utilizing focused ion beam (FIB) irradiation combined with wet chemical etching. Gallium (Ga+) FIB maskless patterning confers wet etch selectivity between the irradiated region and the non-irradiated one on the Al2O3 layer, and mask patterns can easily be revealed by wet etching. This method is a modification of Ga+ FIB mask patterning for the silicon etch stop, which eliminates the detrimental lattice damage and doping of the silicon substrate in critical devices. The shallow surface gallium FIB irradiated Al2O3 mask protects the underlying silicon from Ga+ ions. The performance of the masking capacity was tested by drawing pairs consisting of a line and an empty space with varying width. The best result was seven such pairs for 1 mu m. The smallest half pitch was 59 nm. This method is capable of arbitrary pattern generation. The fabrication of a freestanding single-ended tuning fork resonator utilizing the introduced masking method is demonstrated.
|
|
| 2. |
- Oberhammer, Joachim, et al.
(författare)
-
Monocrystalline‐Silicon Microwave MEMS
- 2013
-
Ingår i: Proceedings of PIERS 2013 in Stockholm, August 12-15, 2013. - Cambridge, MA : The Electromagnetics Academy. - 9781934142264 ; , s. 1933-1941
-
Konferensbidrag (refereegranskat)abstract
- This paper gives an overview of recent achievements in microwave micro‐electromechanical systems (microwave MEMS) at KTH Royal Institute of Technology, Stockholm, Sweden. The first topic is a micromachined W‐band phase shifter based on a micromachined dielectric block which is vertically moved by integrated MEMS actuators to achieve a tuning of the propagation constant of a micromachined transmission line. The second topic is W‐band MEMStuneable microwave high‐impedance metamaterial surfaces conceptualized for local tuning of the electromagnetic resonance properties of surface waves on a high‐impedance surface. The third topic covers 3‐dimensional micromachined coplanar transmission lines with integrated MEMS actuators which move the sidewalls of these transmission lines. Multi‐stable switches, tuneable capacitors, tuneable couplers, and tuneable filters have been implemented and characterized for 1‐40 GHz frequencies. As a forth topic, micromachined waveguide switches are presented. Finally, silicon‐micromachined near‐field and far‐field sensor and antenna interfaces are shown, including a micromachined planar lens antenna and a tapered dielectric rod measurement probe for medical applications.
|
|
