| 1. |
- Bafekry, A., et al.
(författare)
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Van der Waals heterostructure of graphene and germanane: tuning the ohmic contact by electrostatic gating and mechanical strain
- 2021
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Ingår i: Physical Chemistry, Chemical Physics - PCCP. - : Royal Society of Chemistry. - 1463-9076 .- 1463-9084. ; 23:37, s. 21196-21206
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Tidskriftsartikel (refereegranskat)abstract
- Recent exciting developments in synthesis and properties study of the Germanane (GeH) monolayer have inspired us to investigate the structural and electronic properties of the van der Waals GeH/Graphene (Gr) heterostructure by the first-principle approach. The stability of the GeH/Gr heterostructure is verified by calculating the phonon dispersion curves as well as by thermodynamic binding energy calculations. According to the band structure calculation, the GeH/Gr interface is n-type Ohmic. The effects of different interlayer distances and strains between the layers and the applied electric field on the interface have been investigated to gain insight into the van der Waals heterostructure modifications. An interlayer distance of 2.11 angstrom and compressive strain of 6% alter the contact from Ohmic to Schottky status, while the electric field can tune the GeH/Gr contact as p- or n-type, Ohmic, or Schottky. The average electrostatic potential of GeH/Gr and the Bader charge analysis have been used to explain the results obtained. Our theoretical study could provide a promising approach for improving the electronic performance of GeH/Gr-based nano-rectifiers.
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| 2. |
- Delgado Carrascon, Rosalia, 1987-
(författare)
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Epitaxy of group III-nitride materials using different nucleation schemes
- 2023
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Doktorsavhandling (övrigt vetenskapligt/konstnärligt)abstract
- Group III-nitride materials, gallium nitride (GaN), aluminum nitride (AlN) and indium nitride (InN) have direct band gaps with band gap energies ranging from the infrared (InN) to the ultraviolet (GaN) and to the deep ultraviolet (AlN) wave-lengths, covering the entire spectral range from 0.7 eV to 6.2 eV upon alloying. The invention of the GaN-based blue LEDs, for which the Nobel prize in Physics was awarded in 2014, has opened up avenues for exploration of III-Nitride mate-rial and device technologies, and has inspired generations of researchers in the semiconductor field. Group III-nitrides have also been demonstrated to be among the most promising semiconductors for next generation of efficient high-power, high-temperature and high-frequency electronic devices. The need to build a sustainable and efficient energy system motivates the development of vertical GaN transistors and diodes for applications with power ratings of 50-150 kW, e.g., in electric vehicles and industrial inverters. The key is to grow GaN layers with low concentration of defects (impurities and dislocations), which enables an expansion in both voltage and current ratings and reduction of cost. Despite intense investigations and impressive advances in the field, defects are still a major problem which hinders exploiting the full potential of GaN in power electronics. The aim of this thesis is to perform an in-depth investigation of the growth of GaN and AlGaN under several nucleation mechanisms provided by different underlying substrates. In that regard, four different epitaxial approaches based on different nucleation schemes have been studied: (i) growth of planar GaN layers trough NWs reformation. We investigated GaN layers with different thicknesses on reformed GaN NW templates and highlight this approach as an alternative to the expensive HVPE GaN substrates. The sapphire used as a substrate limits to some extent the reduction of threading dislocations, however, the resulting GaN material presents smooth surfaces and thermal conductivity close to the value for bulk GaN. (ii) Homoepitaxial GaN growth. We developed a hot-wall MOCVD epitaxial approach that enables low surface roughness and appropriate impurity levels for advanced vertical power device architectures. A comprehensive picture of GaN homoepitaxy on different GaN surfaces, GaN templates on SiC and HVPE GaN substrates, is established on the basis of experimental results and thermodynamic considerations. (iii) GaN growth on GaN NWs templates by hot-wall MOCVD resulted in an atomically flat smooth surface with reduction of threading dislocations when the optimum annealing conditions have been employed. (iv) Heteroepitaxial growth of low Al composition n-AlxGa1-xN on SiC substrates revealed 700 nm crack-free epi-layers for an Al composition up to 12%. The highest mobility corresponds to an Al content of 6.5% where we also get a reduction in screw and edge dislocations. The results show the potential application of AlxGa1-xN(x= 0 - 0.12) as the active material for drift layers. Some of the epitaxial approaches developed in this thesis have been already implemented in the growth of power devices such as quasi-vertical GaN FinFETs on SiC substrates and fully-vertical GaN FinFETs on HVPE GaN substrates.
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| 3. |
- Gogova, Daniela, 1967-, et al.
(författare)
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Epitaxial growth of β-Ga2O3 by hot-wall MOCVD
- 2022
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Ingår i: AIP Advances. - : AIP Publishing. - 2158-3226. ; 12:5
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Tidskriftsartikel (refereegranskat)abstract
- The hot-wall metalorganic chemical vapor deposition (MOCVD) concept, previously shown to enable superior material quality and high performance devices based on wide bandgap semiconductors, such as Ga(Al)N and SiC, has been applied to the epitaxial growth of beta-Ga2O3. Epitaxial beta-Ga2O3 layers at high growth rates (above 1 mu m/h), at low reagent flows, and at reduced growth temperatures (740 degrees C) are demonstrated. A high crystalline quality epitaxial material on a c-plane sapphire substrate is attained as corroborated by a combination of x-ray diffraction, high-resolution scanning transmission electron microscopy, and spectroscopic ellipsometry measurements. The hot-wall MOCVD process is transferred to homoepitaxy, and single-crystalline homoepitaxial beta-Ga2O3 layers are demonstrated with a 201 rocking curve width of 118 arc sec, which is comparable to those of the edge-defined film-fed grown (201) beta-Ga2O3 substrates, indicative of similar dislocation densities for epilayers and substrates. Hence, hot-wall MOCVD is proposed as a prospective growth method to be further explored for the fabrication of beta-Ga2O3.
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| 4. |
- Gogova, Daniela, 1967-, et al.
(författare)
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High-quality 2? bulk-like free-standing GaN grown by HydrideVapour phase epitaxy on a Si-doped metal organic vapour phase epitaxial GaN template with an ultra low dislocation density
- 2005
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Ingår i: Japanese Journal of Applied Physics. - 0021-4922 .- 1347-4065. ; 44:3, s. 1181-1185
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Tidskriftsartikel (refereegranskat)abstract
- High-quality 2? crack-free free-standing GaN has been attained by hydride vapour phase epitaxial growth on a Si-doped MOVPE GaN template with a low dislocation density and subsequent laser-induced lift-off process. A low value of dislocation density of ~2.0 × 107cm-2 on the Ga-polar face was determined from cathodoluminescence images. X-ray diffraction (XRD) and low-temperature photoluminescence (PL) were exploited to investigate the structural and optical properties of the GaN material. The full width at half maximum value of XRD ?-scan of the free-standing GaN is 248 arcsec for the (1 0 1 4) reflection. The XRD and low-temperature PL mapping measurements consistently proved the high crystalline quality as well as the lateral homogeneity and the small residual stress of the material. Hence, the bulk-like free-standing GaN studied here is highly advantageous for being used as a lattice-constant and thermal-expansion-coefficient matched substrate for additional strain-free homoepitaxy of III-nitrides-based device heterostructures. The strain-free homoepitaxy will significantly reduce the defect density and thus, an improvement of the device performance and lifetime could be achieved. © 2005 The Japan Society of Applied Physics.
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| 5. |
- Gogova, Daniela, 1967-, et al.
(författare)
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Strain-free bulk-like GaN grown by hydride-vapor-phase-epitaxy on two-step epitaxial lateral overgrown GaN template
- 2004
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Ingår i: Journal of Applied Physics. - : AIP Publishing. - 0021-8979 .- 1089-7550. ; 96:1, s. 799-806
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Tidskriftsartikel (refereegranskat)abstract
- Crack-free bulk-like GaN with high crystalline quality has been obtained by hydride-vapor-phase-epitaxy (HVPE) growth on a two-step epitaxial lateral overgrown GaN template on sapphire. During the cooling down stage, the as-grown 270-μm-thick GaN layer was self-separated from the sapphire substrate. Plan-view transmission electron microscopy images show the dislocation density of the free-standing HVPE-GaN to be ∼2.5×107 cm−2 on the Ga-polar face. A low Ga vacancy related defect concentration of about 8×1015 cm−3 is extracted from positron annihilation spectroscopy data. The residual stress and the crystalline quality of the material are studied by two complementary techniques. Low-temperature photoluminescence spectra show the main neutral donor bound exciton line to be composed of a doublet structure at 3.4715 (3.4712) eV and 3.4721 (3.4718) eV for the Ga- (N-) polar face with the higher-energy component dominating. These line positions suggest virtually strain-free material on both surfaces with high crystalline quality as indicated by the small full width at half maximum values of the donor bound exciton lines. The E1(TO) phonon mode position measured at 558.52 cm−1 (Ga face) by infrared spectroscopic ellipsometry confirms the small residual stress in the material, which is hence well suited to act as a lattice-constant and thermal-expansion-coefficient matched substrate for further homoepitaxy, as needed for high-quality III-nitride device applications. © 2004 American Institute of Physics.
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| 6. |
- Malinauskas, T., et al.
(författare)
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All-optical characterization of carrier lifetimes and diffusion lengths in MOCVD-, ELO-, and HVPE- grown GaN
- 2007
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Ingår i: Journal of Crystal Growth, Vol. 300. - : Elsevier BV. - 0022-0248. ; , s. 223-227
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Konferensbidrag (refereegranskat)abstract
- The metrological capability of the picosecond four-wave mixing (FWM) technique for evaluation of the photoelectrical properties of GaN heterostructures grown on sapphire, silicon carbide, and silicon substrates as well as of free-standing GaN films is demonstrated. Carrier recombination and transport features have been studied in a wide excitation, temperature, and dislocation density (from ∼1010 to 106 cm-2) range, exploring non-resonant refractive index modulation by a free carrier plasma. The studies allowed to establish the correlations between the dislocation density and the carrier lifetime, diffusion length, and stimulated emission threshold, to reveal a competition between the bimolecular and nonradiative recombination, and to verify the temperature dependence of bimolecular recombination coefficient in the 10-300 K temperature range. It was shown that the FWM technique is more advantageous than the time-resolved photoluminescence technique for determination of carrier lifetimes in high quality thick III-nitride layers. © 2006 Elsevier B.V. All rights reserved.
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