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- Ahvenniemi, Esko, et al.
(författare)
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Recommended reading list of early publications on atomic layer deposition-Outcome of the "Virtual Project on the History of ALD"
- 2017
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Ingår i: Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films. - : American Vacuum Society. - 0734-2101 .- 1520-8559. ; 35:1
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Forskningsöversikt (refereegranskat)abstract
- Atomic layer deposition (ALD), a gas-phase thin film deposition technique based on repeated, self-terminating gas-solid reactions, has become the method of choice in semiconductor manufacturing and many other technological areas for depositing thin conformal inorganic material layers for various applications. ALD has been discovered and developed independently, at least twice, under different names: atomic layer epitaxy (ALE) and molecular layering. ALE, dating back to 1974 in Finland, has been commonly known as the origin of ALD, while work done since the 1960s in the Soviet Union under the name "molecular layering" (and sometimes other names) has remained much less known. The virtual project on the history of ALD (VPHA) is a volunteer-based effort with open participation, set up to make the early days of ALD more transparent. In VPHA, started in July 2013, the target is to list, read and comment on all early ALD academic and patent literature up to 1986. VPHA has resulted in two essays and several presentations at international conferences. This paper, based on a poster presentation at the 16th International Conference on Atomic Layer Deposition in Dublin, Ireland, 2016, presents a recommended reading list of early ALD publications, created collectively by the VPHA participants through voting. The list contains 22 publications from Finland, Japan, Soviet Union, United Kingdom, and United States. Up to now, a balanced overview regarding the early history of ALD has been missing; the current list is an attempt to remedy this deficiency.
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| 3. |
- Wäckelgård, Ewa, 1957-, et al.
(författare)
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Development of W–SiO2 and Nb–TiO2 solar absorber coatings for combined heat and power systems at intermediate operation temperatures
- 2015
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Ingår i: Solar Energy Materials and Solar Cells. - : Elsevier BV. - 0927-0248 .- 1879-3398. ; 133, s. 180-193
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Tidskriftsartikel (refereegranskat)abstract
- Two new absorber coatings for mid-temperature operation (300–350 1C) in collectors for solar thermal electricity plants are presented in this study. The absorbers consist of two cermet layers of either W–SiO2 or Nb–TiO2, deposited on a molybdenum infrared reflector and coated with an antireflection layer of silicon oxide. The optimization of the optical performance was made in two steps. First, the layer structure was optimized in model calculations. The optical constants used in this modelling were derived directly from sputtered films of the cermet constituents using reflectance and transmittance measure- ments. The absorber coatings were then sputter-deposited using parameters from the modelling. The results show good agreement between modelled and sputtered optical performance evaluated as solar absorptance and thermal emittance at 350 1C. The optimal values reached for W–SiO2 was 0.91 in combination with 0.08 and 0.93 in combination with 0.09 for Nb–TiO2. The materials characterization from XRD, AES and TEM shows that the composite coatings contain nano-metal inclusions, meaning that they are cermet coatings. Scratch tests show that the coatings adhere well to the substrate of stainless steel. Temperature testing at 350 1C in vacuum for up to 1500 h shows that both coatings are stable under such conditions. Only a slight change occurs during the first 72 h that decreases the emittance but does not change the solar absorptance. ERDA confirms that there is no detectable level of ion migration between layers, only a small decrease in hydrogen content was observed, which indicates outgassing.
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