2. |
- Engström, Olof, 1943, et al.
(författare)
-
Navigation aids in the search for future high-k dielectrics: physical and electrical trends
- 2006
-
Ingår i: Proceeding of 7th European Workshop on Ultimate Integration of Silicon (ULIS 2006), p.115-118, April 20-21, Grenoble, France (2006).. ; , s. 115-118
-
Tidskriftsartikel (refereegranskat)abstract
- From experimental literature data on metal oxides combinedwith theoretical estimates, we present empirical relations for k-values and energy band offset values, that can be used in the search for gate dielectric materials fulfilling the needs of future CMOS generations. Only a few materials investigated so far have properties meeting the demands for k and energy band offset values in the development of CMOS down to 22 nm.
|
|