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Träfflista för sökning "WFRF:(Jegenyes N.) "

Sökning: WFRF:(Jegenyes N.)

  • Resultat 1-7 av 7
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1.
  • Beshkova, Milena, et al. (författare)
  • Properties of 3C-SiC Grown by Sublimation Epitaxy on Different Type of Substrates
  • 2010
  • Ingår i: Materials Science Forum, Vols. 645-648. - : Transtec Publications; 1999. ; , s. 183-186
  • Konferensbidrag (refereegranskat)abstract
    • 3C-SiC layers have been grown by using sublimation epitaxy at a temperature of 2000 degrees C, on different types of on-axis 6H-SiC(0001) substrates. The influence of the type of substrate on the morphology of the layers investigated by Atomic Force Microscopy (AFM) is discussed. Stacking faults are studied by reciprocal space map (RSM) which shows that double positions domains exists.
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2.
  • Lorenzzi, J., et al. (författare)
  • Incorporation of group III, IV and V elements in 3C–SiC(1 1 1) layers grown by the vapour–liquid–solid mechanism
  • 2010
  • Ingår i: Journal of Crystal Growth. - : Elsevier BV. - 0022-0248 .- 1873-5002. ; 312:23, s. 3443-3450
  • Tidskriftsartikel (refereegranskat)abstract
    • We report on a comparative investigation of the incorporation of group III, IV and V impurities in 3C–SiC heteroepitaxial layers grown by the vapour–liquid–solid (VLS) mechanism on on-axis α-SiC substrates. To this end, various Si-based melts have been used with addition of Al, Ga, Ge and Sn species. Homoepitaxial α-SiC layers grown using Al-based melts were used for comparison purposed for Al incorporation. Nitrogen incorporation depth profile systematically displays an overshoot at the substrate/epilayer interface for all the layers. Ga and Al incorporations follow the same distribution shape as N whereas this is not the case for the isoelectronic impurities Ge and Sn. This suggests some interaction between Ga/Al and N coming from the high bonding energy between the group III and V elements, which does not exist with Ge and Sn. This is why both incorporate as a cluster. A model of incorporation is proposed taking into account metal-N and metal-C bonding energies together with the solid solubility of the corresponding nitrides.
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3.
  • Scajev, P., et al. (författare)
  • On applicability of time-resolved optical techniques for characterization of differently grown 3C-SiC crystals and heterostructures
  • 2012
  • Ingår i: HETEROSIC and WASMPE 2011. - : Trans Tech Publications Inc.. ; , s. 159-163
  • Konferensbidrag (refereegranskat)abstract
    • We applied a number of time-resolved optical techniques for investigation of optical and photoelectrical properties of cubic SiC grown by different technologies on different substrates. The excess carriers were injected by a short laser pulse and their dynamics was monitored by free-carrier absorption, light-induced transient grating, and photoluminescence techniques in a wide excitation range. Combining an optical and electrical probe beam delay, we found that free carrier lifetimes in differently grown layers vary from few ns up to 20 mu s. Temperature dependences of carrier diffusivity and lifetime revealed a pronounced carrier trapping in thin sublimation grown layers. In free-standing layers and thick sublimation layers, the ambipolar mobility was found the highest (120 cm(2)/Vs at room temperature). A linear correlation between the room-temperature band edge emission and carrier lifetime in differently grown layers was attributed to defect density, strongly dependent on the used growth conditions.
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4.
  • Sun, J. W., et al. (författare)
  • Combined effects of Ga, N, and Al codoping in solution grown 3C-€“SiC
  • 2010
  • Ingår i: Journal of Applied Physics. - : AIP Publishing. - 0021-8979 .- 1089-7550. ; 108:1, s. 013503-1-013503-10
  • Tidskriftsartikel (refereegranskat)abstract
    • We report on Ga-doped 3C–SiC epitaxial layers grown on on-axis (0001) 6H–SiC substrates using the vapor-liquid-solid technique and different melts. The resulting samples have been investigated using secondary ion mass spectroscopy(SIMS), micro-Raman spectroscopy and, finally, low temperature photoluminescence (LTPL) spectroscopy. From SIMS measurements we find Ga concentrations in the range of , systematically accompanied by high nitrogen content. In good agreement with these findings, the spectra show that the Ga-doped samples are -type, with electron concentrations close to . As expected, the LTPL spectra are dominated by strong N–Ga donor-acceptor pair (DAP) transitions. In one sample, a weak additional N–Al DAP recombination spectrum is also observed, showing the possibility to have accidental codoping with Ga and Al simultaneously. This was confirmed on a non-intentionally doped 3C–SiC (witness) sample on which, apart of the usual N and Al bound exciton lines, a small feature resolved at 2.35 eV comings from neutral Ga bound excitons. Quantitative analyses of the DAP transition energies in the Ga-doped and witness sample gave 346 meV for the optical binding energy of Ga acceptors in 3C–SiC against 251 meV for the Al one. The conditions for the relative observa-tion of Ga and Al related LTPL features are discussed and the demonstration of room temperature luminescence using Ga doping is done.
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5.
  • Sun, J. W., et al. (författare)
  • LTPL Investigation of N-Ga and N-Al Donor-Acceptor Pair Spectra in 3C-SiC Layers Grown by VLS on 6H-SiC Substrates
  • 2010
  • Ingår i: Silicon Carbide and Related Materials 2009. ; , s. 415-418
  • Konferensbidrag (refereegranskat)abstract
    • Ga-doped 3C-SiC layers have been grown on on-axis 6H-SiC (0001) substrates by the VLS technique and investigated by low temperature photoluminescence (LTPL) measurements. On these Ga-doped samples, all experimental spectra collected at 5K were found dominated by strong N-Ga donor-acceptor pair (DAP) transitions and phonon replicas. As expected, the N-Ga DAP zero-phonon line (ZPL) was located at lower energy ( 86 meV) below the N-Al one. Fitting the transition energies for the N-Al close DAP lines gave 251 meV for the Al acceptor binding energy in 3C-SiC and, by comparison, 337 meV for the Ga acceptor one.
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6.
  • Sun, J. W., et al. (författare)
  • Splitting of close N-€Al donor-€acceptor-€pair spectra in 3C-€SiC
  • 2010
  • Konferensbidrag (refereegranskat)abstract
    • Discrete series of lines have been observed for many years in N‐Al DAP (Donor Acceptor Pair) spectra in 3C‐SiC. Unfortunately, up to now, there has been no quantitative analysis for the splitting of lines in a given shell. This is done in this work for N‐Al DAP spectra in 3C‐SiC. The samples were non‐intentionally doped 3C‐SiC layers grown by CVD on a VLS seeding layer grown on a 6H‐SiC substrate. From low temperature photoluminescence measurements, strong N‐Al DAP emission bands were observed and, on the high energy side of the zero‐phonon line, we could resolve a series of discrete lines coming from close pairs. Comparing with literature data, we show that the splitting energy for a given shell is constant and, to explain this shell substructure, we consider the non equivalent sets of sites for a given shell. Results are discussed in terms of the ion‐ion interaction containing third and forth multipole terms.
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7.
  • Zoulis, G., et al. (författare)
  • Effects of Growth Conditions on the Low Temperature Photoluminescence Spectra of (111) 3C-€SiC Layers Grown by Chemical Vapor Deposition on 3C-€SiC Seeds grown by the Vapor-€Liquid-Solid Technique
  • 2010
  • Ingår i: AIP Conference Proceedings. - : AIP. - 0094-243X.
  • Konferensbidrag (refereegranskat)abstract
    • We report the results of a low temperature photoluminescence investigation of 3C‐SiC samples grown by chemical vapor deposition on vapor‐liquid‐solid seeds. The main parameters tested in this series of samples were i°) the effects of changing the C/Si ratio and ii°) the growth temperature on the final growth product. On the first series the C/Si ratio varied from 1 to 14 for a constant growth temperature of 1550° C. For the second series, the growth temperature varied from 1450 to 1650° C by steps of 50° C with a constant C/Si ratio equal to 3. According to this work, the best results (minimum incorporation of impurities and best crystal quality) were obtained when using a C/Si ratio of 3 at 1650° C.
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  • Resultat 1-7 av 7

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