| 1. |
- Syväjärvi, Mikael, et al.
(författare)
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Fluorescent SiC as a new material for white LEDs
- 2012
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Ingår i: Physica scripta. T. - 0281-1847 .- 0031-8949 .- 1402-4896. ; T148, s. 014002-
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Tidskriftsartikel (refereegranskat)abstract
- Current III–V-based white light-emitting diodes (LEDs) are available. However, their yellow phosphor converter is not efficient at high currents and includes rare-earth metals, which are becoming scarce. In this paper, we present the growth of a fluorescent silicon carbide material that is obtained by nitrogen and boron doping and that acts as a converter using a semiconductor. The luminescence is obtained at room temperature, and shows a broad luminescence band characteristic of donor-to-acceptor pair recombination. Photoluminescence intensities and carrier lifetimes reflect a sensitivity to nitrogen and boron concentrations. For an LED device, the growth needs to apply low-off-axis substrates. We show by ultra-high-resolution analytical transmission electron microscopy using aberration-corrected electrons that the growth mechanism can be stable and that there is a perfect epitaxial relation from the low-off-axis substrate and the doped layer even when there is step-bunching.
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| 2. |
- Gulbinas, Karolis, et al.
(författare)
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Raman Scattering and Carrier Diffusion Study in Heavily Co-doped 6H-SiC Layers
- 2014
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Ingår i: IOP Conference Series. - : Institute of Physics Publishing (IOPP). - 1757-8981 .- 1757-899X. ; 56:1, s. 012005-
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Tidskriftsartikel (refereegranskat)abstract
- Thick 6H-SiC epilayers were grown using the fast sublimation method on low-off-axis substrates. They were co-doped with N and B impurities of ≈1019 cm−3 and (41016–51018) cm−3 concentration, respectively. The epilayers exhibited donor-acceptor pair (DAP) photoluminescence. The micro-Raman spectroscopic study exposed a compensated n-6H-SiC epilayer of common quality with some 3C-SiC inclusions. The compensation ratio of B through 200 μm thick epilayer varied in 20-30% range. The free carrier diffusivity was studied by transient grating technique at high injection level. The determined ambipolar diffusion coefficient at RT was found to decrease from 1.15 cm2/s to virtually 0 cm2/s with boron concentration increasing by two orders.
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| 3. |
- Kakanakova-Georgieva, Anelia, 1970-, et al.
(författare)
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Kinetics of residual doping in 4H-SiC epitaxial layers grown in vacuum
- 2002
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Ingår i: Journal of Crystal Growth. - 0022-0248 .- 1873-5002. ; 240:04-mar, s. 501-507
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Tidskriftsartikel (refereegranskat)abstract
- Investigation on residual Al, B, and N co-doping of 4H-SiC epitaxial layers is reported. The layers were produced by sublimation epitaxy in Ta growth cell environment at different growth temperatures and characterized by secondary ion mass spectrometry. The vapor interaction with Ta was considered through calculations of cohesive energies of several Si-, Al-, B-, and N-containing vapor molecules and also of diatomic Ta-X molecules. An analysis of kinetic mechanisms responsible for impurity incorporation is performed. Among residuals, B exhibits a stronger incorporation dependence on temperature and growth at lower temperatures can favor B decrease in the layers. Under the growth conditions in this study (Ta environment and presence of attendant Al and N), B incorporation is assisted by Si2C vapor molecule. Boron tends to occupy carbon sites at higher temperatures, i.e. higher growth rates.
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| 4. |
- Alfieri, G., et al.
(författare)
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Annealing behavior between room temperature and 2000 degrees C of deep level defects in electron-irradiated n-type 4H silicon carbide
- 2005
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Ingår i: Journal of Applied Physics. - : AIP Publishing. - 0021-8979 .- 1089-7550. ; 98:4
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Tidskriftsartikel (refereegranskat)abstract
- The annealing behavior of irradiation-induced defects in 4H-SiC epitaxial layers grown by chemical-vapor deposition has been systematically studied by means of deep level transient spectroscopy (DLTS). The nitrogen-doped epitaxial layers have been irradiated with 15-MeV electrons at room temperature and an isochronal annealing series from 100 to 2000 degrees C has been performed. The DLTS measurements, which have been carried out in the temperature range from 120 to 630 K after each annealing step, revealed the presence of six electron traps located in the energy range of 0.45-1.6 eV below the conduction-band edge (E-c). The most prominent and stable ones occur at E-c-0.70 eV (labeled Z(1/2)) and E-c-1.60 eV(EH6/7). After exhibiting a multistage annealing process over a wide temperature range, presumably caused by reactions with migrating defects, a significant fraction of both Z(1/2) and EH6/7 (25%) still persists at 2000 degrees C and activation energies for dissociation in excess of 8 and similar to 7.5 eV are estimated for Z(1/2) and EH6/7, respectively. On the basis of these results, the identity of Z(1/2) and EH6/7 is discussed and related to previous assignments in the literature.
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| 5. |
- Alfieri, G, et al.
(författare)
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Capacitance spectroscopy study of high energy electron irradiated and annealed 4H-SIC
- 2005
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Ingår i: SILICON CARBIDE AND RELATED MATERIALS 2004. - ZURICH-UETIKON : TRANS TECH PUBLICATIONS LTD. - 0878499636 ; , s. 365-368
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Konferensbidrag (refereegranskat)abstract
- Deep level transient spectroscopy (DLTS) was employed to investigate the annealing behaviour and thermal stability of radiation induced defects in nitrogen doped 4H-SiC epitaxial layers, grown by chemical vapor deposition (CVD). The epilayers have been irradiated with 15 MeV electrons and an isochronal annealing series has been carried out. The measurements have been performed after each annealing step and six electron traps located in the energy band gap range of 0.42-1.6 eV below the conduction band edge (E-c) have been detected.
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| 6. |
- Audren, A., et al.
(författare)
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Damage recovery in ZnO by post-implantation annealing
- 2010
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Ingår i: Nuclear Instruments and Methods in Physics Research Section B. - : Elsevier BV. - 0168-583X .- 1872-9584. ; 268:11-12, s. 1842-1846
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Tidskriftsartikel (övrigt vetenskapligt/konstnärligt)abstract
- ZnO bulk samples were implanted with 200 key-Co ions at room temperature with two fluences, 1 x 10(16) and 8 x 10(16) cm(-2), and then annealed in air for 30 min at different temperatures up to 900 degrees C. After the implantation and each annealing step, the samples were analyzed by Rutherford backscattering spectrometry (RBS) in random and channeling directions to follow the evolution of the disorder profile. The RBS spectra reveal that disorder is created during implantation in proportion to the Co fluence. The thermal treatments induce a disorder recovery, which is however, not complete after annealing at 900 degrees C, where about 15% of the damage remains. To study the Co profile evolution during annealing, the samples were, in addition to RBS, characterized by secondary ion mass spectrometry (SIMS). The results show that Co diffusion starts at 800 degrees C, but also that a very different behavior is seen for Co concentrations below and above the solubility limit. (C) 2010 Elsevier B.V. All rights reserved.
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| 7. |
- Bathen, M. E., et al.
(författare)
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Influence of carbon cap on self-diffusion in silicon carbide
- 2020
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Ingår i: Crystals. - : MDPI AG. - 2073-4352. ; 10:9, s. 1-11
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Tidskriftsartikel (refereegranskat)abstract
- Self-diffusion of carbon (12C and13C) and silicon (28Si and30Si) in 4H silicon carbide has been investigated by utilizing a structure containing an isotope purified 4H-28Si12C epitaxial layer grown on an n-type (0001) 4H-SiC substrate, and finally covered by a carbon capping layer (C-cap). The13C and30Si isotope profiles were monitored using secondary ion mass spectrometry (SIMS) following successive heat treatments performed at 2300–2450◦C in Ar atmosphere using an inductively heated furnace. The30Si profiles show little redistribution within the studied temperature range, with the extracted diffusion lengths for Si being within the error bar for surface roughening during annealing, as determined by profilometer measurements. On the other hand, a significant diffusion of13C was observed into the isotope purified layer from both the substrate and the C-cap. A diffusivity of D = 8.3 × 106 e−10.4/kBT cm2/s for13C was extracted, in contrast to previous findings that yielded lower both pre-factors and activation energies for C self-diffusion in SiC. The discrepancy between the present measurements and previous theoretical and experimental works is ascribed to the presence of the C-cap, which is responsible for continuous injection of C interstitials during annealing, and thereby suppressing the vacancy mediated diffusion.
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| 8. |
- Doyle, J. P., et al.
(författare)
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Characterization of deep level defects in 4H and 6H SiC via DLTS, SIMS and MeV e-beam irradiation
- 1996
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Ingår i: III-nitride, SiC and diamond materials for electronic devices. ; , s. 519-524
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Konferensbidrag (refereegranskat)abstract
- Electrically active defects in both 4H and 6H polytypes of SiC have been observed through the use of deep level transient spectroscopy (DLTS). Schottky contacts were grown by VPE with doping concentrations, the epitaxial layer having a doping concentration in the range of 10 exp 14/cu cm to 10 exp 17/cu cm. Numerous levels have been found in the as-grown n-type 6H-SiC samples, and SIMS and MeV electron irradiation have been employed to correlate the defect levels to impurities or structural defects. In contrast, only a single level is observed in the as-grown 4H-SiC samples.
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| 9. |
- Doyle, J. P., et al.
(författare)
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Electrically active point defects in n-type 4H–SiC
- 1998
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Ingår i: Journal of Applied Physics. - : AIP Publishing. - 0021-8979 .- 1089-7550. ; 84:3, s. 61-68
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Tidskriftsartikel (refereegranskat)abstract
- An electrically active defect has been observed at a level position of ∼ 0.70 eV below the conduction band edge (Ec) with an extrapolated capture cross section of ∼ 5×10−14 cm2 in epitaxial layers of 4H–SiC grown by vapor phase epitaxy with a concentration of approximately 1×1013 cm−3. Secondary ion mass spectrometry revealed no evidence of the transition metals Ti, V, and Cr. Furthermore, after electron irradiation with 2 MeV electrons, the 0.70 eV level is not observed to increase in concentration although three new levels are observed at approximately 0.32, 0.62, and 0.68 eV below Ec with extrapolated capture cross sections of 4×10−14, 4×10−14, and 5×10−15 cm2, respectively. However, the defects causing these levels are unstable and decay after a period of time at room temperature, resulting in the formation of the 0.70 eV level. Our results suggest strongly that the 0.70 eV level originates from a defect of intrinsic nature. The unstable behavior of the electron irradiation-induced defects at room temperature has not been observed in the 6H–SiC polytype.
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| 10. |
- Forsberg, U., et al.
(författare)
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Aluminum doping of epitaxial silicon carbide
- 2003
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Ingår i: Journal of Crystal Growth. - : Elsevier BV. - 0022-0248 .- 1873-5002. ; 253:04-jan, s. 340-350
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Tidskriftsartikel (refereegranskat)abstract
- Intentional doping of aluminum in 4H and 6H SiC has been performed using a hot-wall CVD reactor. The dependence of aluminum incorporation on temperature, pressure, C/Si ratio, growth rate, and TMA flow has been investigated. The aluminum incorporation showed to be polarity dependent. The high aluminum incorporation on the Si-face is closely related to the carbon coverage on the SiC surface. Changes in process parameters changes the effective C/Si ratio close to the SiC surface. Increased growth rate and C/Si ratio increases the aluminum incorporation on the Si-face. Diffusion limited incorporation occurs at high growth rate. Reduced pressure increases the effective C/Si ratio, and at low growth rate, the aluminum incorporation increases initially, levels off at a critical pressure, and continues to decrease below the critical pressure. The aluminum incorporation showed to be constant in a temperature range of 50degreesC. The highest atomic concentration of aluminum observed in this study was 3 x 10(17) and 8 x 10(18) cm(-3) in Si and C-face, respectively.
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