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| 2. |
- Forsen, E, et al.
(författare)
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Fabrication of cantilever based mass sensors integrated with CMOS using direct write laser lithography on resist
- 2004
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Ingår i: Nanotechnology. - : IOP Publishing. - 0957-4484 .- 1361-6528. ; 15:10, s. 628-633
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Tidskriftsartikel (refereegranskat)abstract
- A CMOS compatible direct write laser lithography technique has been developed for cantilever fabrication on pre-fabricated standard CMOS. We have developed cantilever based sensors for mass measurements in vacuum and air. The cantilever is actuated into lateral vibration by electrostatic excitation and the resonant frequency is detected by capacitive readout. The device is integrated on standard CMOS circuitry. In the work a new direct write laser lithography (DWL) technique is introduced. This laser lithography technique is based on direct laser writing on substrates coated with a resist bi-layer consisting of poly(methyl methacrylate) (PMMA) on lift-off resist (LOR). Laser writing evaporates the PMMA, exposing the LOR. A resist solvent is used to transfer the pattern down to the substrate. Metal lift-off followed by reactive ion etching is used for patterning the structural poly-Si layer in the CMOS. The developed laser lithography technique is compatible with resist exposure techniques such as electron beam lithography. We demonstrate the fabrication of sub-micrometre wide suspended cantilevers as well as metal lift-off with feature line widths down to approximately 500 nm.
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| 3. |
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| 4. |
- Forsen, E, et al.
(författare)
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Ultrasensitive mass sensor fully integrated with complementary metal-oxide-semiconductor circuitry
- 2005
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Ingår i: Applied Physics Letters. - : AIP Publishing. - 0003-6951 .- 1077-3118. ; 87:4
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Tidskriftsartikel (refereegranskat)abstract
- Nanomechanical resonators have been monolithically integrated on preprocessed complementary metal-oxide-semiconductor (CMOS) chips. Fabricated resonator systems have been designed to have resonance frequencies up to 1.5 MHz. The systems have been characterized in ambient air and vacuum conditions and display ultrasensitive mass detection in air. A mass sensitivity of 4 ag/Hz has been determined in air by placing a single glycerine drop, having a measured weight of 57 fg, at the apex of a cantilever and subsequently measuring a frequency shift of 14.8 kHz. CMOS integration enables electrostatic excitation, capacitive detection, and amplification of the resonance signal directly on the chip.
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| 5. |
- Amnell, Johannes J., 1718-1789
(författare)
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Dissertatio philologica, Barnabam et Paulum, Dia kai Ermēn Lystris adpellatos, (Actor. XIIII, v. XII.) leviter adumbrans; quam, consensu ... Facult. Philos Upsal., præside ... Johanne J. Amnell ... publice, in audit. Carol. maj. d. XVIII Apr. ... defendere conabitur Ericus Montelius, Uplandus.
- 1750
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Doktorsavhandling (övrigt vetenskapligt/konstnärligt)
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| 6. |
- Bunk, Richard, et al.
(författare)
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Towards a 'nano-traffic' system powered by molecular motors
- 2003
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Ingår i: Microelectronic Engineering. - 1873-5568. ; 67-8, s. 899-904
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Tidskriftsartikel (refereegranskat)abstract
- In this work, we reconstructed in vitro the behavior of two motor proteins-myosin and actin-responsible for the mechanical action of muscle cells. By transferring this in vivo system to an artificial environment, we were able to study the interaction between the proteins in more detail, as well as investigating the central mechanism of force production. Nm-patterning by e-beam lithography (EBL) could restore parts of the in vivo protein order, essential for potential nanotechnological applications. Much work was put into establishing the necessary compatibility between the biological and nano-lithographical processes. A range of EBL-resists were tested for protein compatibility. One particular kind (MRL-6000.1XP) supported good actin filament motility, while another (PMMA-950) behaved in the opposite way. Taking advantage of these findings, nm-sized lines were created in a double-layer structure of the two resists. The lines were found to act as binding sites for myosin, and as rectifying guides for the linearized motion of actin filaments. Velocities around 5 mum/s were measured. (C) 2003 Elsevier Science B.V. All rights reserved.
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| 7. |
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| 8. |
- Finder, C, et al.
(författare)
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Fluorescence microscopy for quality control in nanoimprint lithography
- 2003
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Ingår i: Microelectronic Engineering (Proceedings of the 28th International Conference on Micro- and Nano-Engineering). - 0167-9317 .- 1873-5568. ; 67-8, s. 623-628
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Konferensbidrag (refereegranskat)abstract
- Fluorescence microscopy is introduced as a low cost quality control process for nanoimprint lithography. To depict imprinted structures down to 1 mum lateral size and to detect residues down to 100 nm lateral size, the standard printable polymer mr-18000 is labelled with less than 0.1 wt.% fluorescent dye. Three different types of stamps are used to determine the dependence of the shape and size of stamp features in a series of imprints. The quality of a stamp is given by the sticking polymer residues per unit area. Fluorescence light images as well as visible light images are analysed. Changes in the area of the stamp covered with polymer as a function of the number of imprints is summarised in a statistical process chart. Adhesion was artificially induced in order to observe self cleaning of virgin stamps. They were detected and monitored, suggesting that this method is a suitable technique for quality control and that it could be easily adapted to the nanoimprint process. (C) 2003 Elsevier Science B.V. All rights reserved.
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| 9. |
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| 10. |
- Ghatnekar-Nilsson, Sara, et al.
(författare)
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Resonators with integrated CMOS circuitry for mass sensing applications, fabricated by electron beam lithography
- 2005
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Ingår i: Nanotechnology. - : IOP Publishing. - 0957-4484 .- 1361-6528. ; 16:1, s. 98-102
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Tidskriftsartikel (refereegranskat)abstract
- A resonator system has been fabricated directly on a pre-processed CMOS chip. The system is to be used for high sensitivity mass sensing applications in air and vacuum. The resonator system, corresponding of a cantilever and structures for electrostatic actuation and capacitive read-out, have been defined by electron beam lithography on top of a charge and radiation sensitive CMOS layer in predefined areas as a post-process step. This has been accomplished without affecting the electronic properties of the pre-processed CMOS circuits. The subsequent etching steps to fully release the cantilevers have been obtained without stiction of the cantilevers to the substrate. Cantilevers are driven at their mechanical resonance in a lateral mode, and the frequency is monitored by capacitive read-out on the chip. CMOS integration enables signal detection directly on the chip, which radically decreases the parasitic capacitances. Consequently, low-noise electrical measurements with a very high mass sensitivity are obtained. Fabricated resonator systems were characterized to have resonance frequencies of approximately 1.49 MHz, which is in good agreement with a theoretical estimation of 1.41 MHz. The theoretical mass resolution, partial derivativem/partial derivativef, is approximately 17 ag Hz(-1) using a Young modulus value of 160 GPa.
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