| 1. |
- Armakavicius, Nerijus, et al.
(författare)
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Electron effective mass in GaN revisited: New insights from terahertz and mid-infrared optical Hall effect
- 2024
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Ingår i: APL Materials. - : AIP Publishing. - 2166-532X. ; 12:2
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Tidskriftsartikel (refereegranskat)abstract
- Electron effective mass is a fundamental material parameter defining the free charge carrier transport properties, but it is very challenging to be experimentally determined at high temperatures relevant to device operation. In this work, we obtain the electron effective mass parameters in a Si-doped GaN bulk substrate and epitaxial layers from terahertz (THz) and mid-infrared (MIR) optical Hall effect (OHE) measurements in the temperature range of 38-340 K. The OHE data are analyzed using the well-accepted Drude model to account for the free charge carrier contributions. A strong temperature dependence of the electron effective mass parameter in both bulk and epitaxial GaN with values ranging from (0.18 +/- 0.02) m(0) to (0.34 +/- 0.01) m(0) at a low temperature (38 K) and room temperature, respectively, is obtained from the THz OHE analysis. The observed effective mass enhancement with temperature is evaluated and discussed in view of conduction band nonparabolicity, polaron effect, strain, and deviations from the classical Drude behavior. On the other hand, the electron effective mass parameter determined by MIR OHE is found to be temperature independent with a value of (0.200 +/- 0.002) m(0). A possible explanation for the different findings from THz OHE and MIR OHE is proposed. (c) 2024 Author(s). All article content, except where otherwise noted, is licensed under a Creative Commons Attribution (CC BY) license (http://creativecommons.org/licenses/by/4.0/)
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| 2. |
- Bittrich, Eva, et al.
(författare)
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Morphology of Thin Films of Aromatic Ellagic Acid and Its Hydrogen Bonding Interactions
- 2020
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Ingår i: The Journal of Physical Chemistry C. - : AMER CHEMICAL SOC. - 1932-7447 .- 1932-7455. ; 124:30, s. 16381-16390
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Tidskriftsartikel (refereegranskat)abstract
- Ellagic acid (EA), an antioxidant from fruits or other plants, has recently evoked interest in the field of organic electronics because of its weak electron donor properties. In this work, the preparation of uniaxial pi-stacked EA films by thermal evaporation on different surfaces is reported for the first time. The (102) lattice plane of the pi-electron system was confirmed as the contact plane for one monolayer equivalent on Ag(111) by low-electron energy diffraction. X-ray and atomic force microscopy measurements revealed nanocrystalline grains with an average inplane size of 50 nm and considerably smaller average out-of-plane crystallite sizes (16-25 nm) in films of 16-75 nm thickness. The influence of different substrates was minor compared to the effect of the film thickness. An increase in the in-plane density of grains at larger film thicknesses was deduced from the trend in their uniaxial optical properties. Weak and strong intermolecular H-bonding interactions were identified in the EA crystal lattice, while a surplus of weak H-bonding was observed for the nanocrystallites in thin films, as compared to bulk EA. Finally, EA was coevaporated with the semiconducting thiophene molecule DCV4T-Et-2 to demonstrate principle interactions with a guest molecule by H-bonding analysis. Our results illustrate the feasibility of applying EA films as alignment layers for templating other semiconducting organic films used in organic electronic devices.
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| 3. |
- Gogova, Daniela, et al.
(författare)
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Epitaxial growth of β -Ga 2 O 3 by hot-wall MOCVD
- 2022
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Ingår i: AIP Advances. - : AIP Publishing. - 2158-3226. ; 12:5, s. 055022-055022
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Tidskriftsartikel (refereegranskat)abstract
- The hot-wall metalorganic chemical vapor deposition (MOCVD) concept, previously shown to enable superior material quality and highperformance devices based on wide bandgap semiconductors, such as Ga(Al)N and SiC, has been applied to the epitaxial growth ofβ-Ga2O3. Epitaxial β-Ga2O3 layers at high growth rates (above 1 μm/h), at low reagent flows, and at reduced growth temperatures(740 ○C) are demonstrated. A high crystalline quality epitaxial material on a c-plane sapphire substrate is attained as corroborated by a combination of x-ray diffraction, high-resolution scanning transmission electron microscopy, and spectroscopic ellipsometry measurements. Thehot-wall MOCVD process is transferred to homoepitaxy, and single-crystalline homoepitaxial β-Ga2O3 layers are demonstrated with a 201 ¯rocking curve width of 118 arc sec, which is comparable to those of the edge-defined film-fed grown (201) ¯ β-Ga2O3 substrates, indicative ofsimilar dislocation densities for epilayers and substrates. Hence, hot-wall MOCVD is proposed as a prospective growth method to be furtherexplored for the fabrication of β-Ga2O3
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| 4. |
- Gogova, Daniela, 1967-, et al.
(författare)
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Epitaxial growth of β-Ga2O3 by hot-wall MOCVD
- 2022
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Ingår i: AIP Advances. - : AIP Publishing. - 2158-3226. ; 12:5
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Tidskriftsartikel (refereegranskat)abstract
- The hot-wall metalorganic chemical vapor deposition (MOCVD) concept, previously shown to enable superior material quality and high performance devices based on wide bandgap semiconductors, such as Ga(Al)N and SiC, has been applied to the epitaxial growth of beta-Ga2O3. Epitaxial beta-Ga2O3 layers at high growth rates (above 1 mu m/h), at low reagent flows, and at reduced growth temperatures (740 degrees C) are demonstrated. A high crystalline quality epitaxial material on a c-plane sapphire substrate is attained as corroborated by a combination of x-ray diffraction, high-resolution scanning transmission electron microscopy, and spectroscopic ellipsometry measurements. The hot-wall MOCVD process is transferred to homoepitaxy, and single-crystalline homoepitaxial beta-Ga2O3 layers are demonstrated with a 201 rocking curve width of 118 arc sec, which is comparable to those of the edge-defined film-fed grown (201) beta-Ga2O3 substrates, indicative of similar dislocation densities for epilayers and substrates. Hence, hot-wall MOCVD is proposed as a prospective growth method to be further explored for the fabrication of beta-Ga2O3.
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| 5. |
- Kakanakova-Georgieva, Anelia, 1970-, et al.
(författare)
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Incorporation of Magnesium into GaN Regulated by Intentionally Large Amounts of Hydrogen during Growth by MOCVD
- 2022
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Ingår i: Physica Status Solidi (B) Basic Research. - : Wiley. - 0370-1972 .- 1521-3951. ; 259:10
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Tidskriftsartikel (refereegranskat)abstract
- Herein, metal–organic chemical vapor deposition (MOCVD) of GaN layers doped with Mg atoms to the recognized optimum level of [Mg] ≈2 × 1019 cm−3 is performed. In a sequence of MOCVD runs, operational conditions, including temperature and flow rate of precursors, are maintained except for intentionally larger flows of hydrogen carrier gas fed into the reactor. By employing the largest hydrogen flow of 25 slm in this study, the performance of the as-grown Mg-doped GaN layers is certified by a room-temperature hole concentration of p ≈2 × 1017 cm−3 in the absence of any thermal activation treatment. Experimental evidence is delivered that the large amounts of hydrogen during the MOCVD growth can regulate the incorporation of the Mg atoms into GaN in a significant way so that MgH complex can coexist with a dominant and evidently electrically active isolated MgGa acceptor.
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| 6. |
- Knight, Sean Robert, et al.
(författare)
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Room temperature two-dimensional electron gas scattering time, effective mass, and mobility parameters in AlxGa1−xN/GaN heterostructures (0.07 ≤ x ≤ 0.42)
- 2023
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Ingår i: Journal of Applied Physics. - : American Institute of Physics Inc.. - 0021-8979 .- 1089-7550. ; 134:18
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Tidskriftsartikel (refereegranskat)abstract
- Al xGa 1−xN/GaN high-electron-mobility transistor (HEMT) structures are key components in electronic devices operating at gigahertz or higher frequencies. In order to optimize such HEMT structures, understanding their electronic response at high frequencies and room temperature is required. Here, we present a study of the room temperature free charge carrier properties of the two-dimensional electron gas (2DEG) in HEMT structures with varying Al content in the Al xGa 1−xN barrier layers between x=0.07 and x=0.42. We discuss and compare 2DEG sheet density, mobility, effective mass, sheet resistance, and scattering times, which are determined by theoretical calculations, contactless Hall effect, capacitance-voltage, Eddy current, and cavity-enhanced terahertz optical Hall effect (THz-OHE) measurements using a low-field permanent magnet (0.6 T). From our THz-OHE results, we observe that the measured mobility reduction from x=0.13 to x=0.42 is driven by the decrease in 2DEG scattering time, and not the change in effective mass. For x<0.42, the 2DEG effective mass is found to be larger than for electrons in bulk GaN, which in turn, contributes to a decrease in the principally achievable mobility. From our theoretical calculations, we find that values close to 0.3 m0 can be explained by the combined effects of conduction band nonparabolicity, polarons, and hybridization of the electron wavefunction through penetration into the barrier layer.
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| 7. |
- Knight, Sean Robert, et al.
(författare)
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Terahertz permittivity parameters of monoclinic single crystal lutetium oxyorthosilicate
- 2024
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Ingår i: Applied Physics Letters. - : AIP Publishing. - 0003-6951 .- 1077-3118. ; 124:3
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Tidskriftsartikel (refereegranskat)abstract
- The anisotropic permittivity parameters of monoclinic single crystal lutetium oxyorthosilicate, Lu2SiO5 (LSO), have been determined in the terahertz spectral range. Using terahertz generalized spectroscopic ellipsometry (THz-GSE), we obtained the THz permittivities along the a, b, and c? crystal directions, which correspond to the ea; eb, and ec? on-diagonal tensor elements. The associated off diagonal tensor element eac? was also determined experimentally, which is required to describe LSO's optical response in the monoclinic a-c crystallographic plane. From the four tensor elements obtained in the model fit, we calculate the direction of the principal dielectric axes in the a-c plane. We find good agreementwhen comparing THz-GSE permittivities to the static permittivity tensors from previous infrared and density functional theory studies.
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| 8. |
- Korlacki, R., et al.
(författare)
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Strain and stress relationships for optical phonon modes in monoclinic crystals with beta-Ga2O3 as an example
- 2020
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Ingår i: Physical Review B. - : AMER PHYSICAL SOC. - 2469-9950 .- 2469-9969. ; 102:18
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Tidskriftsartikel (refereegranskat)abstract
- Strain-stress relationships for physical properties are of interest for heteroepitaxial material systems, where strain and stress are inherent due to thermal expansion and lattice mismatch. We report linear perturbation theory strain and stress relationships for optical phonon modes in monoclinic crystals for strain and stress situations which maintain the monoclinic symmetry of the crystal. By using symmetry group analysis and phonon frequencies obtained under various deformation scenarios from density-functional perturbation theory calculations on beta-Ga2O3, we obtain four strain and four stress potential parameters for each phonon mode. We demonstrate that these parameters are sufficient to describe the frequency shift of the modes regardless of the stress or strain pattern which maintain the monoclinic symmetry of the crystal. The deformation potentials can be used together with experimentally determined phonon frequency parameters from Raman or infrared spectroscopy to evaluate the state of strain or stress of beta-Ga2O3, for example, in epitaxial heterostructures.
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| 9. |
- Kuhne, Philipp, et al.
(författare)
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Enhancement of 2DEG effective mass in AlN/Al0.78Ga0.22N high electron mobility transistor structure determined by THz optical Hall effect
- 2022
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Ingår i: Applied Physics Letters. - : AIP Publishing. - 0003-6951 .- 1077-3118. ; 120:25
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Tidskriftsartikel (refereegranskat)abstract
- We report on the free charge carrier properties of a two-dimensional electron gas (2DEG) in an AlN/AlxGa1-xN high electron mobility transistor structure with a high aluminum content (x = 0.78). The 2DEG sheet density N s = ( 7.3 +/- 0.7 ) x 10 12 cm(-2), sheet mobility mu s = ( 270 +/- 40 ) cm(2)/(Vs), sheet resistance R- s = ( 3200 +/- 500 ) omega/ ?, and effective mass m( eff) = ( 0.63 +/- 0.04 ) m( 0) at low temperatures ( T = 5 K ) are determined by terahertz (THz) optical Hall effect measurements. The experimental 2DEG mobility in the channel is found within the expected range, and the sheet carrier density is in good agreement with self-consistent Poisson-Schrodinger calculations. However, a significant increase in the effective mass of 2DEG electrons at low temperatures is found in comparison with the respective value in bulk Al0.78Ga22N ( m( eff) = 0.334 m( 0)). Possible mechanisms for the enhanced 2DEG effective mass parameter are discussed and quantified using self-consistent Poisson-Schrodinger calculations .Published under an exclusive license by AIP Publishing.
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| 10. |
- Papamichail, Alexis, 1990-
(författare)
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Hot-wall MOCVD for advanced GaN HEMT structures and improved p-type doping
- 2023
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Doktorsavhandling (övrigt vetenskapligt/konstnärligt)abstract
- The transition to energy efficient smart grid and wireless communication with improved capacity require the development and optimization of next generation semiconductor technologies and electronic device components. Indium nitride (InN), gallium nitride (GaN) and aluminum nitride (AlN) compounds and their alloys are direct bandgap semiconductors with bandgap energies ranging from 0.7 to 6.0 eV, facilitating their utilization in optoelectronics and photonics. The GaN-based blue light-emitting diodes (LEDs) have enabled efficient and energy saving lighting, for which the Nobel Prize in Physics 2014 was awarded. GaN and AlN have high critical electric fields, high saturation carrier velocities and high thermal conductivities, which make them promising candidates for replacing silicon (Si) in next-generation power devices. The polarization-induced two-dimensional electron gas (2DEG), formed at the interface of AlGaN and GaN has enabled GaN-based high electron mobility transistors (HEMTs). These devices are suitable for high-power (HP) switching, power amplification and high-frequency (HF) applications in the millimeter-wave range up to THz frequencies. As such, HEMTs are suitable for next-generation 5G and 6G communication systems, radars, satellites, and a plethora of other related applications.Despite the immense efforts in the field, several material related issues still hinder the full exploitation of the unique properties of GaN-based semiconductors in HF and HP electronic applications. These limitations and challenges are related among others to: i) poor efficiency of p-type doping in GaN, ii) lack of linearity in AlGaN/GaN HEMTs used in low-noise RF amplifiers and, iii) MOCVD growth related difficulties in achieving ultra-thin and high Alcontent AlGaN barrier layers with compositionally sharp Al profiles in AlGaN/GaN HEMTs for HF applications.In this PhD thesis, we address the abovementioned issues by exploiting the hot-wall MOCVD combined with extensive material characterization. Main results can be grouped as follows:i) state-of-art p-GaN with room-temperature free-hole concentrations in the low 1018 cm-3 range and mobilities of ~10 cm2/Vs has been developed via in-situ doping. A comprehensive understanding of the growth process and its limiting factors, as related to magnesium (Mg), hydrogen (H) and carbon (C) incorporation in GaN is established. Further improvement of p-type doping in as-grown GaN:Mg is achieved by using GaN/AlN/4H-SiC templates and/or by modifying the gas environment in the growth reactor through the introduction of high amounts of hydrogen (H2) in the process. Using advanced scanning transmission electron microscopy (STEM) in combination with electron energy loss spectroscopy (EELS) we have established an improved comprehensive model of the pyramidal inversion domain defects (PIDs) in relation to the ambient matrix. First experimental evidence that Mg is present at all interfaces between PID and matrix allows for more accurate evaluation of Mg segregated at the PID, necessary for understanding the main limiting factor for p-type conductivity in GaN against alternative compensating donor or passivation sources.ii) Compositionally graded AlGaN channel layers in AlGaN/(Al)GaN HEMTs with various types of compositional grading have been developed, and graded channel devices were compared with conventional AlGaN/GaN HEMT indicating improved linearity. The first large signal measurements in Europe of a graded channel AlGaN/GaN HEMT has been carried out demonstrating improved linearity figure of merit IM3 by 10 dB compared to conventional Fe-doped GaN buffer devices. These results are showing state-of-the-art performance and pave the way for novel highly linear GaN receivers.iii) Ultrathin (sub-10nm) and high Al-content (>50%) AlGaN barrier GaN HEMT structures have been developed with 2DEG carrier densities ~1.1×1013 cm-2 and mobilities ~1700 cm2/Vs. Advanced characterization with atomic precision involving STEM and energy dispersive X-ray spectroscopy (EDS), has allowed experimental determination of the Al profiles and has revealed deviations from the nominally intended structures. Such deviations are found also in different source materials including commercial HEMT epistructures grown by MOCVD. The implications of the Al-profile deviations are critically analyzed in terms of 2DEG properties and device fabrication and performance. The capabilities and the limitations of MOCVD processes, related to growth of compositionally sharp and ultrathin high-Al-content AlGaN layers on GaN have been evaluated and their prospects in HF have been assessed.
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