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- Chang, S, et al.
(författare)
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An electrowetting-based microfluidic platform for magnetic bioassays
- 2010
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Ingår i: The 14th International Conference on Miniaturized Systems for Chemistry and Life Sciences, MicroTAS 2010, 3-7 Oktober, Groningen, Neterlands. - 9781618390622 ; 2, s. 1331-1333
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Konferensbidrag (refereegranskat)abstract
- Here we present our recent work on a droplet-based microfluidic device for manipulating microliter-sized droplets. By replacing the formerly used common dielectric SiO2 with Si3N4 and applying a 33 nm thick Teflon top layer to create a hydrophobic surface, we successfully lowered the actuation voltage from 450 V to 50 Vdc/40 Vac. Sputtered HfO2 with high dielectric constant was also investigated as an insulator, which could reproducibly yield thin defect-free insulation layers and lower the actuation voltage to less than 40 V.
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- Engström, Olof, 1943, et al.
(författare)
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A generalised methodology for oxide leakage current metric
- 2008
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Ingår i: Proceeding of 9th European Workshop on Ultimate Integration of Silicon (ULIS), Udine, Italy. - 9781424417308 ; , s. 167-
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Konferensbidrag (refereegranskat)abstract
- From calculations of semiconductor interfacecharge, oxide voltage and tunneling currents for MOSsystems with equivalent oxide thickness (EOT) in therange of 1 nm, rules are suggested for making itpossible to compare leakage quality of different oxideswith an accuracy of a factor 2 – 3 if the EOT is known.The standard procedure suggested gives considerablybetter accuracy than the commonly used method todetermine leakage at VFB+1V for n-type and VFB-1V forp-type substrates.
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- Engström, Olof, 1943, et al.
(författare)
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Gate stacks
- 2013
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Ingår i: Nanoscale CMOS: Innovative Materials, Modeling and Characterization. - : Wiley. ; , s. 23 - 67
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Bokkapitel (övrigt vetenskapligt/konstnärligt)
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8. |
- Engström, Olof, 1943, et al.
(författare)
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Multiparameter admittance spectroscopy (Invited)
- 2010
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Ingår i: ECS Transactions. - : The Electrochemical Society. - 1938-5862 .- 1938-6737. - 9781566778220 ; 35:3, s. 257-265
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Konferensbidrag (refereegranskat)abstract
- Multiparameter admittance spectroscopy is described for investigating interface state properties of metal-oxide-semiconductor structures. In the conductance mode of this method, it allows for obtaining three-dimensional or contour plots of conductance data which reveal the mechanisms for capture of charge carriers into the interface states.
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