| 1. |
- Berrill, Mark, et al.
(författare)
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Improved beam characteristics of solid-target son x-ray laser amplifiers by injection seeding with high harmonic pulses
- 2010
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Ingår i: Optics Letters. - : Optical Society of America. - 0146-9592 .- 1539-4794. ; 35:14, s. 2317-2319
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Tidskriftsartikel (refereegranskat)abstract
- Injection seeding of solid-target soft x-ray laser amplifiers with high harmonic pulses is shown to dramatically improve the far-field laser beam profile and reduce the beam divergence. Measurements and two-dimensional simulations for a 13.9 nm nickel-like Ag amplifier show that the amplified beam divergence depends strongly on the seed and can therefore be controlled by selecting the divergence of the seed. The near-field beam size of both the seeded and unseeded lasers is shown to be determined by the size of the gain region and the divergence of the amplified beams.
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| 2. |
- Brewer, Courtney A., et al.
(författare)
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High spatial resolution full-field microscopy using a desktop-size soft x-ray laser
- 2007
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Ingår i: Proceedings of SPIE. - : SPIE.
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Konferensbidrag (refereegranskat)abstract
- Images with nanoscale resolution were obtained in both transmission and reflection modes using a full-field microscope that is illuminated by an extremely compact λ = 46.9 nm (hv = 26.4 eV) soft x-ray laser. The microscope was used to image the surface of partially processed silicon semiconductor chips containing periodic patterns of polysilicon and metal lines. To characterize the microscope, modulation transfer functions were experimentally built for three different objective zone plates, and images with near-wavelength resolution were obtained.
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| 3. |
- Brewer, Courtney A., et al.
(författare)
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Single-shot extreme ultraviolet laser imaging of nanostructures with wavelength resolution
- 2008
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Ingår i: Optics Letters. - : Optical Society of America. - 0146-9592 .- 1539-4794. ; 33:5, s. 518-520
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Tidskriftsartikel (refereegranskat)abstract
- We have demonstrated near-wavelength resolution microscopy in the extreme ultraviolet. Images of 50 nm diameter nanotubes were obtained with a single ~1 ns duration pulse from a desktop-size 46.9 nm laser. We measured the modulation transfer function of the microscope for three different numerical aperture zone plate objectives, demonstrating that 54 nm half-period structures can be resolved. The combination of near-wavelength spatial resolution and high temporal resolution opens myriad opportunities in imaging, such as the ability to directly investigate dynamics of nanoscale structures.
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| 4. |
- Brizuela, Fernando, et al.
(författare)
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Extreme ultraviolet laser-based table-top aerial image metrology of lithographic masks
- 2010
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Ingår i: Optics Express. - : Optical Society of America. - 1094-4087. ; 18:14, s. 14467-14473
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Tidskriftsartikel (refereegranskat)abstract
- We have realized the first demonstration of a table-top aerial imaging microscope capable of characterizing pattern and defect printability in extreme ultraviolet lithography masks. The microscope combines the output of a 13.2 nm wavelength, table-top, plasma-based, EUV laser with zone plate optics to mimic the imaging conditions of an EUV lithographic stepper. We have characterized the illumination of the system and performed line-edge roughness measurements on an EUVL mask. The results open a path for the development of a compact aerial imaging microscope for high-volume manufacturing.
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| 5. |
- Brizuela, Fernando, et al.
(författare)
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Imaging at the Nanoscale With Practical Table-Top EUV Laser-Based Full-Field Microscopes
- 2012
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Ingår i: IEEE Journal of Selected Topics in Quantum Electronics. - 1077-260X. ; 18:1, s. 434-442
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Tidskriftsartikel (refereegranskat)abstract
- The demonstration of table-top high average power extreme-ultraviolet (EUV) lasers combined with the engineering of specialized optics has enabled the demonstration of full-field microscopes that have achieved tens of nanometer spatial resolution. This paper describes the geometry of the EUV microscopes tailored to specific imaging applications. The microscope illumination characteristics are assessed and an analysis on the microscope's spatial resolution is presented. Examples of the capabilities of these table-top EUV aerial microscopes for imaging nanostructures and surfaces are presented.
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| 6. |
- Seres, J., et al.
(författare)
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Attosecond dynamics of parametric amplification at 11 nm
- 2016
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Ingår i: X-Ray Lasers 2014 - Proceedings of the 14th International Conference on X-Ray Lasers. - Cham : Springer International Publishing. - 1867-4941 .- 0930-8989. - 9783319195209 ; 169, s. 173-178
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Konferensbidrag (refereegranskat)abstract
- X-ray parametric amplification is a high order parametric process with the capability to amplify ultrashort laser pulses with broad spectrum ranging from the extreme ultraviolet to the soft x-ray. In this contribution, the dynamics of this broadband amplification schema is studied with sub-20-as temporal resolution by seeding the amplifier with a train of 200-as-long pulses at 11 nm central wavelength.
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