SwePub
Sök i SwePub databas

  Utökad sökning

Träfflista för sökning "WFRF:(Schaff W J) "

Sökning: WFRF:(Schaff W J)

  • Resultat 1-10 av 23
Sortera/gruppera träfflistan
   
NumreringReferensOmslagsbildHitta
1.
  • Darakchieva, Vanya, et al. (författare)
  • Hydrogen in InN: A ubiquitous phenomenon in molecular beam epitaxy grown material
  • 2010
  • Ingår i: APPLIED PHYSICS LETTERS. - : AIP Publishing. - 0003-6951 .- 1077-3118. ; 96:8, s. 081907-
  • Tidskriftsartikel (refereegranskat)abstract
    • We study the unintentional H impurities in relation to the free electron properties of state-of-the-art InN films grown by molecular beam epitaxy (MBE). Enhanced concentrations of H are revealed in the near surface regions of the films, indicating postgrowth surface contamination by H. The near surface hydrogen could not be removed upon thermal annealing and may have significant implications for the surface and bulk free electron properties of InN. The bulk free electron concentrations were found to scale with the bulk H concentrations while no distinct correlation with dislocation density could be inferred, indicating a major role of hydrogen for the unintentional conductivity in MBE InN.
  •  
2.
  •  
3.
  • Darakchieva, Vanya, et al. (författare)
  • Role of impurities and dislocations for the unintentional n-type conductivity in InN
  • 2009
  • Ingår i: PHYSICA B-CONDENSED MATTER. - : Elsevier BV. - 0921-4526. ; 404:22, s. 4476-4481
  • Tidskriftsartikel (refereegranskat)abstract
    • We present a study on the role of dislocations and impurities for the unintentional n-type conductivity in high-quality InN grown by molecular beam epitaxy. The dislocation densities and H profiles in films with free electron concentrations in the low 10(17) cm(-1) and mid 10(18) cm(-3) range are measured, and analyzed in a comparative manner. It is shown that dislocations alone could not account for the free electron behavior in the InN films. On the other hand, large concentrations of H sufficient to explain, but exceeding substantially, the observed free electron densities are found. Furthermore, enhanced concentrations of H are revealed at the film surfaces, resembling the free electron behavior with surface electron accumulation. The low-conductive film was found to contain C and it is suggested that C passivates the H donors or acts as an acceptor, producing compensated material in this case. Therefore, it is concluded that the unintentional impurities play an important role for the unintentional n-type conductivity in InN. We suggest a scenario of H incorporation in InN that may reconcile the previously reported observations for the different role of impurities and dislocations for the unintentional n-type conductivity in InN.
  •  
4.
  • Darakchieva, Vanya, et al. (författare)
  • Unintentional incorporation of hydrogen in wurtzite InN with different surface orientations
  • 2011
  • Ingår i: Journal of Applied Physics. - : American Institute of Physics (AIP). - 0021-8979 .- 1089-7550. ; 110:6, s. 063535-
  • Tidskriftsartikel (refereegranskat)abstract
    • We have studied hydrogen impurities and related structural properties in state-of-the-art wurtzite InN films with polar, nonpolar, and semipolar surface orientations. The effects of thermal annealing and chemical treatment on the incorporation and stability of H are also discussed. The near-surface and bulk hydrogen concentrations in the as-grown films increase when changing the surface orientation from (0001) to (000 (1) over bar) to (1 (1) over bar 01) and to (11 (2) over bar0), which may be associated with a decrease in the grain size and change of the growth mode from 2D to 3D. Thermal annealing at 350 degrees C in N(2) leads to a reduction of H concentrations and the intrinsic levels of bulk H are found to correlate with the structural quality and defects in the annealed films.
  •  
5.
  • Lorenz, L, et al. (författare)
  • Hydrogen In Group‐III Nitrides: An Ion Beam Analysis Study
  • 2011
  • Ingår i: AIP Conference Proceedings, Volume 1336. - : AIP. - 9780735408913 ; , s. 310-313
  • Konferensbidrag (refereegranskat)abstract
    • The doping mechanisms of InN, a promising material for novel optoelectronic and electronic devices, are still not well understood. Unintentional hydrogen doping is one possibility that could explain the unintentional n‐type conductivity in high‐quality nominally undoped InN films. We measured a series of state‐of‐the‐art InN samples grown by molecular beam epitaxy with 2 MeV 4He‐ERDA and RBS, showing the presence of relatively high amounts of hydrogen not only at the surface, but also in a deeper layer. Strong depletion of hydrogen due to the analysing beam was observed and taken into account in the analysis. Here, we report on the details of the analysis and show how the results correlate with the free‐electron concentrations of the samples.
  •  
6.
  •  
7.
  • Shubina, Tatiana, 1950-, et al. (författare)
  • Optical properties of InN related to surface plasmons
  • 2005
  • Ingår i: Physica Status Solidi (a) applications and materials science. - : Wiley. - 1862-6300 .- 1862-6319. ; 202:14, s. 2633-2641
  • Tidskriftsartikel (refereegranskat)abstract
    • We report on the complex nature of infrared luminescence and absorption in InN films, which cannot be entirely explained by the concept of a conventional narrow-gap semiconductor. In particular, it concerns the detection of peaks near absorption edges by both thermally detected optical absorption and photoluminescence excitation spectroscopy and the observation of extraordinarily strong resonant enhancement of emission. To describe the experimental data a model is proposed, which takes into account surface plasmons in metal-like inclusions, modifying the optical properties of InN. © 2005 WILEY-VCH Verlag GmbH & Co. KGaA,.
  •  
8.
  •  
9.
  • Shubina, Tatiana, et al. (författare)
  • Surface-plasmon resonances in indium nitride with metal-enriched nano-particles
  • 2006
  • Ingår i: Journal of Crystal Growth. - : Elsevier BV. - 0022-0248 .- 1873-5002. ; 288:2, s. 230-235
  • Tidskriftsartikel (refereegranskat)abstract
    • Plasmonic resonances in In-enriched nano-particles, spontaneously formed during growth, can dramatically modify optical properties of InN. Experimental support for this is provided from detailed studies of absorption and infrared emission in InN. In particular, thermally detected optical absorption and photoluminescence excitation spectroscopy reveal a peak below the region of strong absorption in InN. A higher-energy part of the infrared emission having a noticeable p-polarization is markedly enhanced with excitation along the surface. These peculiarities are discussed in terms of the Mie resonances, arising in metallic spheroids with different aspect ratio, and their coupling with recombining states, whose strength depends on energy separation between the states and the resonances. © 2005 Elsevier B.V. All rights reserved.
  •  
10.
  • Arnaudov, B., et al. (författare)
  • Free-to-bound radiative recombination in highly conducting InN epitaxial layers
  • 2004
  • Ingår i: Superlattices and Microstructures. - : Elsevier BV. - 0749-6036 .- 1096-3677. ; 36:4-6, s. 563-571
  • Tidskriftsartikel (refereegranskat)abstract
    • We present a theoretical simulation of near-band-edge emission spectra of highly conducting n-InN assuming the model of 'free-to-bound' radiative recombination (FBRR) of degenerate electrons from the conduction band with nonequilibrium holes located in the valence band tails. We also study experimental photoluminescence (PL) spectra of highly conducting InN epitaxial layers grown by MBE and MOVPE with electron concentrations in the range (7.7 × 1017-6 × 1018) cm-3 and find that the energy positions and shape of the spectra depend on the impurity concentration. By modeling the experimental PL spectra of the InN layers we show that spectra can be nicely interpreted in the framework of the FBRR model with specific peculiarities for different doping levels. Analyzing simultaneously the shape and energy position of the InN emission spectra we determine the fundamental bandgap energy of InN to vary between Eg = 692 meV for effective mass mn0 = 0.042m0 and Eg =710 meV for mn0 = 0.1m0. © 2004 Elsevier Ltd. All rights reserved.
  •  
Skapa referenser, mejla, bekava och länka
  • Resultat 1-10 av 23

Kungliga biblioteket hanterar dina personuppgifter i enlighet med EU:s dataskyddsförordning (2018), GDPR. Läs mer om hur det funkar här.
Så här hanterar KB dina uppgifter vid användning av denna tjänst.

 
pil uppåt Stäng

Kopiera och spara länken för att återkomma till aktuell vy