| 1. |
- Chen, W. H., et al.
(författare)
-
Nanophotonics-based low-temperature PECVD epitaxial crystalline silicon solar cells
- 2016
-
Ingår i: Journal of Physics D: Applied Physics. - : IOP Publishing. - 1361-6463 .- 0022-3727. ; 49:12
-
Tidskriftsartikel (refereegranskat)abstract
- The enhancement of light absorption via nanopatterning in crystalline silicon solar cells is becoming extremely important with the decrease of wafer thickness for the further reduction of solar cell fabrication cost. In order to study the influence of nanopatterning on crystalline silicon thin-film solar cells, we applied two lithography techniques (laser interference lithography and nanoimprint lithography) combined with two etching techniques (dry and wet) to epitaxial crystalline silicon thin films deposited via plasma-enhanced chemical vapor deposition at 175 degrees C. The influence of nanopatterning with different etching profiles on solar cell performance is studied. We found that the etching profiles (pitch, depth and diameter) have a stronger impact on the passivation quality (open circuit voltage and fill factor) than on the optical performance (short circuit current density) of the solar cells. We also show that nanopatterns obtained via wet-etching can improve solar cell performance; and in contrast, dry-etching leads to poor passivation related to the etching profile, surface damage, and/ or contamination introduced during the etching process.
|
|
| 2. |
- Trompoukis, C., et al.
(författare)
-
Photonic nanostructures for advanced light trapping in thin crystalline silicon solar cells
- 2015
-
Ingår i: Physica Status Solidi (A) Applications and Materials Science. - : Wiley. - 1862-6319 .- 1862-6300. ; 212:1, s. 140-155
-
Tidskriftsartikel (refereegranskat)abstract
- We report on the fabrication, integration, and simulation, both optical and optoelectrical, of two-dimensional photonic nanostructures for advanced light trapping in thin crystalline silicon (c-Si) solar cells. The photonic nanostructures are fabricated by the combination of various lithography (nanoimprint, laser interference, and hole mask colloidal) and etching (dry plasma and wet chemical) techniques. The nanopatterning possibilities thus range from periodic to random corrugations and from inverted nanopyramids to high aspect ratio profiles. Optically, the nanopatterning results in better performance than the standard pyramid texturing, showing a more robust behavior with respect to light incidence angle. Electrically, wet etching results in higher minority carrier lifetimes compared to dry etching. From the integration of the photonic nanostructures into a micron-thin c-Si solar cell certain factors limiting the efficiencies are identified. More precisely: (a) the parasitic absorption is limiting the short circuit current, (b) the conformality of thin-film coatings on the nanopatterned surface is limiting the fill factor, and (c) the material damage from dry etching is limiting the open circuit voltage. From optical simulations, the optimal pattern parameters are identified. From optoelectrical simulations, cell design considerations are discussed, suggesting to position the junction on the opposite side of the nanopattern.
|
|
