| 1. |
- Dong, Yibo, et al.
(författare)
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Transfer-free, lithography-free and fast growth of patterned CVD graphene directly on insulators by using sacrificial metal catalyst
- 2018
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Ingår i: Nanotechnology. - : IOP Publishing. - 1361-6528 .- 0957-4484. ; 29:36
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Tidskriftsartikel (refereegranskat)abstract
- Chemical vapor deposited graphene suffers from two problems: transfer from metal catalysts to insulators, and photoresist induced degradation during patterning. Both result in macroscopic and microscopic damages such as holes, tears, doping, and contamination, translated into property and yield dropping. We attempt to solve the problems simultaneously. A nickel thin film is evaporated on SiO2 as a sacrificial catalyst, on which surface graphene is grown. A polymer (PMMA) support is spin-coated on the graphene. During the Ni wet etching process, the etchant can permeate the polymer, making the etching efficient. The PMMA/graphene layer is fixed on the substrate by controlling the surface morphology of Ni film during the graphene growth. After etching, the graphene naturally adheres to the insulating substrate. By using this method, transfer-free, lithography-free and fast growth of graphene realized. The whole experiment has good repeatability and controllability. Compared with graphene transfer between substrates, here, no mechanical manipulation is required, leading to minimal damage. Due to the presence of Ni, the graphene quality is intrinsically better than catalyst-free growth. The Ni thickness and growth temperature are controlled to limit the number of layers of graphene. The technology can be extended to grow other two-dimensional materials with other catalysts.
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| 2. |
- Dong, Y. B., et al.
(författare)
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Transfer-free, lithography-free, and micrometer-precision patterning of CVD graphene on SiO 2 toward all-carbon electronics
- 2018
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Ingår i: APL Materials. - : AIP Publishing. - 2166-532X. ; 6:2
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Tidskriftsartikel (refereegranskat)abstract
- A method of producing large area continuous graphene directly on SiO 2 by chemical vapor deposition is systematically developed. Cu thin film catalysts are sputtered onto the SiO 2 and pre-patterned. During graphene deposition, high temperature induces evaporation and balling of the Cu, and the graphene "lands onto" SiO 2 . Due to the high heating and growth rate, continuous graphene is largely completed before the Cu evaporation and balling. 60 nm is identified as the optimal thickness of the Cu for a successful graphene growth and μm-large feature size in the graphene. An all-carbon device is demonstrated based on this technique.
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| 3. |
- Yang, Haibo, et al.
(författare)
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Coupling Downscaling and Calibrating Methods for Generating High-Quality Precipitation Data with Multisource Satellite Data in the Yellow River Basin
- 2024
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Ingår i: Remote Sensing. - 2072-4292. ; 16:8
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Tidskriftsartikel (refereegranskat)abstract
- Remote sensing precipitation data have the characteristics of wide coverage and revealing spatiotemporal information, but their spatial resolution is low. The accuracy of the data is obviously different in different study areas and hydrometeorological conditions. This study evaluated four precipitation products in the Yellow River basin from 2001 to 2019, constructed the optimal combined product, conducted downscaling with various machine algorithms, and performed corrections using meteorological station precipitation data to analyze the spatiotemporal trends of precipitation. The results showed that (1) GPM and MSWEP had the best four evaluation indicators, with R2 values of 0.93 and 0.90, respectively, and the smallest FSE and RMSE, with a BIAS close to 0. A high-precision mixed precipitation dataset, GPM-MSWEP, was constructed. (2) Among the three methods, the downscaling results of DFNN showed higher accuracy. (3) The results, after correction with GWR, could more effectively enhance the accuracy of the data. (4) Precipitation in the Yellow River Basin showed a decreasing trend in January, September, and December, while it exhibited an increasing trend in other months and seasons, with 2002 and 2016 being points of abrupt change. This study provides a reference for the production of high-precision satellite precipitation products in the Yellow River basin.
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| 4. |
- Yao, Xingang, et al.
(författare)
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Q63, a novel DENV2 RdRp non-nucleoside inhibitor, inhibited DENV2 replication and infection
- 2018
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Ingår i: Journal of Pharmacological Sciences. - Amsterdam : Elsevier. - 1347-8613 .- 1347-8648. ; 138:4, s. 247-256
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Tidskriftsartikel (refereegranskat)abstract
- Dengue virus (DENV) annually infects 400 million people worldwide. Unfortunately, there is lack ofwidely protective vaccine or drugs against DENV. The viral RNA-dependent RNA polymerase (RdRp) ofNS5 protein is highly conserved among different DENV subtypes, thus presenting itself as an attractivetarget for drug design. In the current research, SPRi was performed to screen compounds against DENV2RdRp and 5(1H)-Quinazolinone,2-(4-bromophenyl)-2,3,4,6,7,8-hexahydro-7,7-dimethyl-1,3-diphenyl(Q63) was successfully screened out with a KD of 0.9 mM. Then, ITC and molecular docking assay wasperformed to access the binding mechanism between Q63 and DENV2 RdRp. Meanwhile, Q63 alsodecreased the intermediate dsRNA production, which was the product of RdRp. Further the antiviraleffects of Q63 were evaluated on mosquito C6/36 cells and mammalian BHK-21 cells. Q63 reduced CPEand cell toxicity effect after DENV2 infection on C6/36 and BHK-21 cells, with an EC50 of 2.08 mM. Time ofaddition assay revealed that Q63 affected the early genome RNA replication stage, including genome RNAreplication. In addition, Q63 down-regulated STAT1 phosphorylation, ISG15 and ISG54 after DENV2infection. In summary, Q63 was found to be a novel RdRp non-nucleoside inhibitor and a potential leadcompound for coping with DENV infectious disease in the future. © 2018 The Authors.
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