| 1. |
- Ahvenniemi, Esko, et al.
(författare)
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Recommended reading list of early publications on atomic layer deposition-Outcome of the "Virtual Project on the History of ALD"
- 2017
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Ingår i: Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films. - : American Vacuum Society. - 0734-2101 .- 1520-8559. ; 35:1
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Forskningsöversikt (refereegranskat)abstract
- Atomic layer deposition (ALD), a gas-phase thin film deposition technique based on repeated, self-terminating gas-solid reactions, has become the method of choice in semiconductor manufacturing and many other technological areas for depositing thin conformal inorganic material layers for various applications. ALD has been discovered and developed independently, at least twice, under different names: atomic layer epitaxy (ALE) and molecular layering. ALE, dating back to 1974 in Finland, has been commonly known as the origin of ALD, while work done since the 1960s in the Soviet Union under the name "molecular layering" (and sometimes other names) has remained much less known. The virtual project on the history of ALD (VPHA) is a volunteer-based effort with open participation, set up to make the early days of ALD more transparent. In VPHA, started in July 2013, the target is to list, read and comment on all early ALD academic and patent literature up to 1986. VPHA has resulted in two essays and several presentations at international conferences. This paper, based on a poster presentation at the 16th International Conference on Atomic Layer Deposition in Dublin, Ireland, 2016, presents a recommended reading list of early ALD publications, created collectively by the VPHA participants through voting. The list contains 22 publications from Finland, Japan, Soviet Union, United Kingdom, and United States. Up to now, a balanced overview regarding the early history of ALD has been missing; the current list is an attempt to remedy this deficiency.
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| 2. |
- González Escobedo, José Luis, et al.
(författare)
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Hydrodeoxygenation Model Compounds γ-Heptalactone and γ-Nonalactone : Density from 293 to 473 K and H2 Solubility from 479 to 582 K
- 2020
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Ingår i: Journal of Chemical and Engineering Data. - : American Chemical Society (ACS). - 0021-9568 .- 1520-5134. ; 65:5, s. 2764-2773
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Tidskriftsartikel (refereegranskat)abstract
- Determining the H2 solubility in model compounds that represent lignocellulose derivatives is valuable for the study of upgrading processes such as hydrodeoxygenation. In this work, γ-heptalactone and γ-nonalactone are studied as model compounds at conditions relevant to hydrodeoxygenation. The solubility of H2 in the lactones was determined in the range of 479 to 582 K and 3 to 10 MPa. The solubility measurements were performed in a continuous flow setup based on the visual observation of the bubble point. Furthermore, the densities of the lactones were measured in order to provide the necessary data for the solubility calculations. The density measurements were performed from 293 to 373 K and from 0.16 to 9.9 MPa in a vibrating tube density meter. Using the measurements, a model of the density as a function of temperature and pressure was developed, obtaining average relative deviations on the order of 0.1%. Similarly, the Peng-Robinson equation of state with the Boston-Mathias modification was used to predict the H2 solubility in the lactones. A temperature-dependent model of the symmetric binary parameter of the equation of state was regressed from the data in order to improve the predictions.
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