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Sökning: WFRF:(Aspnes DE)

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1.
  • Edwards, NV, et al. (författare)
  • Real-time assessment of overlayer removal on 4H-SiC surfaces : Techniques and relevance to contact formation
  • 2000
  • Ingår i: Materials Science Forum. - 0255-5476 .- 1662-9752. ; 338-3, s. 1033-1036
  • Tidskriftsartikel (refereegranskat)abstract
    • We applied real-time spectroscopic ellipsometric (SE) measurements to assess the removal of overlayer material from 4H-SiC Si- and C-face surfaces in order to investigate the final step of an otherwise standard RCA cleaning regimen commonly used to prepare SiC surfaces for contact formation. The selected treatments (buffered hydrofluoric acid (HF), concentrated HF, dilute HF and 5% HF in Methanol) removed 4 to 40 Angstrom of effective SiO2 overlayer thickness from these surfaces. We also found that the concentrated HF treatment yielded the best surface, i.e. the most abrupt bulk-to-ambient transition region.
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2.
  • Edwards, NV, et al. (författare)
  • Real-time assessment of selected surface preparation regimens for 4H-SiC surfaces using spectroscopic ellipsometry
  • 2000
  • Ingår i: Surface Science. - : Elsevier. - 0039-6028 .- 1879-2758. ; 464:1, s. L703-L707
  • Tidskriftsartikel (refereegranskat)abstract
    • Spectroscopic ellipsometry (SE) was used to assess the removal of overlayer material from 4H-SiC (0001) and (0001) [Si- and C-face] surfaces in real time and, in particular, the critical final step of an otherwise standard RCA cleaning regimen commonly used to prepare SiC surfaces for contact formation. The treatments selected [buffered hydrofluoric acid (HF), concentrated HF, and dilute HF] removed 4-40 Angstrom of effective SiO2 overlayer thickness from these surfaces. The concentrated HF treatment yielded the best surface, i.e. that with the most abrupt transition region between bulk and surface and with the most oxide material removed. A fourth treatment regimen (sequential application of methanol, water, and 5% HF in methanol) was also developed for comparison with the full RCA clean. (C) 2000 Elsevier Science B.V. All rights reserved.
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  • Resultat 1-2 av 2
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refereegranskat (2)
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Järrendahl, Kenneth (2)
Madsen, LD (2)
Richter, W (2)
Cobet, C. (2)
Esser, N. (2)
Edwards, NV (2)
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Robbie, K (2)
Powell, GD (2)
Aspnes, DE (2)
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Linköpings universitet (2)
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Engelska (2)
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2000 (2)

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