| 1. |
- Blanton, Michael R., et al.
(författare)
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Sloan Digital Sky Survey IV : Mapping the Milky Way, Nearby Galaxies, and the Distant Universe
- 2017
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Ingår i: Astronomical Journal. - : IOP Publishing Ltd. - 0004-6256 .- 1538-3881. ; 154:1
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Tidskriftsartikel (refereegranskat)abstract
- We describe the Sloan Digital Sky Survey IV (SDSS-IV), a project encompassing three major spectroscopic programs. The Apache Point Observatory Galactic Evolution Experiment 2 (APOGEE-2) is observing hundreds of thousands of Milky Way stars at high resolution and. high signal-to-noise ratios in the near-infrared. The Mapping Nearby Galaxies at Apache Point Observatory (MaNGA) survey is obtaining spatially resolved spectroscopy for thousands of nearby galaxies (median z similar to 0.03). The extended Baryon Oscillation Spectroscopic Survey (eBOSS) is mapping the galaxy, quasar, and neutral gas distributions between z similar to 0.6 and 3.5 to constrain cosmology using baryon acoustic oscillations, redshift space distortions, and the shape of the power spectrum. Within eBOSS, we are conducting two major subprograms: the SPectroscopic IDentification of eROSITA Sources (SPIDERS), investigating X-ray AGNs. and galaxies in X-ray clusters, and the Time Domain Spectroscopic Survey (TDSS), obtaining spectra of variable sources. All programs use the 2.5 m Sloan Foundation Telescope at the. Apache Point Observatory; observations there began in Summer 2014. APOGEE-2 also operates a second near-infrared spectrograph at the 2.5 m du Pont Telescope at Las Campanas Observatory, with observations beginning in early 2017. Observations at both facilities are scheduled to continue through 2020. In keeping with previous SDSS policy, SDSS-IV provides regularly scheduled public data releases; the first one, Data Release 13, was made available in 2016 July.
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| 2. |
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| 3. |
- Beck, Marc, et al.
(författare)
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Nanoelectrochemical transducers for (bio-) chemical sensor applications fabricated by nanoimprint lithography
- 2004
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Ingår i: Microelectronic Engineering. - 1873-5568. ; 73-74, s. 837-842
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Tidskriftsartikel (refereegranskat)abstract
- Nanometer-structured transducers for commercial use in pharmaceutical, medical or (bio-) chemical analysis have so far been hardly accessible since they could not be produced by parallel lithography techniques at reasonable costs. We introduce here a method on. how to fabricate nanometer-structured interdigitated array electrodes including interconnections and bond pads in the micrometer range in a single imprint step on 2-in. wafer scale. The method enables the mass production of those devices at lowest cost opening a new field for the commercial use of nanometer-structured sensor systems.
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| 4. |
- Bunk, Richard, et al.
(författare)
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Guiding molecular motors with nano-imprinted structures
- 2005
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Ingår i: Japanese Journal of Applied Physics. - 0021-4922. ; 44:5A, s. 3337-3340
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Tidskriftsartikel (refereegranskat)abstract
- This work, for the first time, demonstrates that nano-imprinted samples, with 100 nm wide polymer lines, can act as guides for molecular motors consisting of motor proteins actin and myosin. The motor protein function was characterized using fluorescence microscopy and compared to actomyosin motility on non-structured nitrocellulose surfaces. Our results open for further use of the nano-imprint technique in the production of disposable chips for bio-nanotechnological applications and miniaturized biological test systems. We discuss how the nano-imprinted motor protein assay system may be optimized and also how it compares to previously tested assay systems involving low-resolution UV-lithography and low throughput but high-resolution electron beam lithography.
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| 5. |
- Carlberg, Patrick
(författare)
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Development of Nanoimprint Lithography for Applications in Electronics, Photonics and Life-sciences
- 2007
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Doktorsavhandling (övrigt vetenskapligt/konstnärligt)abstract
- This thesis describes different aspects of nanotechnology manufacturing with nanoimprint lithography (NIL), a relatively new nanofabrication tool capable of high resolution and high throughput. Surface structure creation with NIL is based on mechanical deformation of the patterning material. This is radically different from the two main established methods, ultra violet lithography (UVL) and electron beam lithography (EBL), which rely on chemical modification of the patterning media. The thesis is divided into two main parts, the first of which discusses process related issues and the second describes applications. Thus the initial discussion concerns production of stamps, perhaps the most important part of a working imprint technology. Aspects such as choice of materials, patterning methods, implications of structure layout and anti-sticking that have been used or developed in my work are described. The chapter on process outlines details concerning imprint related issues for different substrate materials and polymers and how these impact imprint parameters. The chapters on applications give a short introduction to each of them, and cover life-science, sensors, electronic devices and material research. However, the emphasis is on imprint related issues of the work, since this was my part of the projects. In the biological applications it is shown that nanoimprint patterned polymers are biocompatible and can be used to guide axon growth or create directional movement of motor proteins. In the following chapter imprint and a lift-off process is used to make interdigitated array electrodes for electrochemistry and cantilever sensors. It is shown that NIL can pattern both large area structures (contact pads) and nanometer structures in one single-step process. The electronic devices are made in III-V material and imprint is used to create an etch mask for a wet etch process. We show that the imprinted structures have properties similar to those made by EBL and thus that the electronic properties are not affected by the high pressure and temperature of the imprint process. In the last chapter we show using nanoimprint and a lift-off process that imprint can be used to position metal particles on a surface, which in turn may function as catalytic particles for growing nanowires.
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| 6. |
- Carlberg, Patrick, et al.
(författare)
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Lift-off process for nanoimprint lithography
- 2003
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Ingår i: Microelectronic Engineering. - 0167-9317 .- 1873-5568. ; 67-8, s. 203-207
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Konferensbidrag (refereegranskat)abstract
- We report a novel a lift-off method for nanoimprint lithography. This is a bi-layer method, using a polymethyl methacrylate (PMMA) on lift-off layer (LOL) resist scheme. For the imprint step, direct evidence for good pattern transfer down to 20 nm is shown. Oxygen plasma ashing is required to remove residual PMMA. A liquid solvent, MF 319, is used to transfer the pattern down to the silicon. The LOL is dissolved isotropically while the PMMA is unaffected. Ashing time can kept to a minimum through the wet etch method. This reduces the line widening effect. After metal evaporation a two-step lift-off process prevents metal flakes from adhering to the surface electrostatically. At first warm acetone breakes apart the metal layer and dissolves the PMMA, then warm Remover S-1165 removes the LOL and remaining metal. Structures of lines down to 50 nm and dots with a diameter of sub 20 nm are presented.
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| 7. |
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| 8. |
- Carlberg, Patrick, et al.
(författare)
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Nanoimprint - a tool for realizing nano-bio research
- 2004
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Ingår i: 2004 4th IEEE Conference on Nanotechnology. - 0780385365 ; , s. 199-200
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Konferensbidrag (refereegranskat)abstract
- In this paper, we present a status report on how implementation of nanoimprint lithography has advanced our research. Contact guidance nerve growth experiments have so far primarily been done on micrometer-structured surfaces. We have made a stamp with 17 areas of different, submicron, line width and spacing covering a total 2.6 mm
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| 9. |
- Carlberg, Patrick, et al.
(författare)
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Nanoimprint in mr-L 6000.1 XP/PMMA resist system
- 2002
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Ingår i: 7th International Conference on Nanometer-Scale Science and Technology and 21st European Conference on Surface Science.
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Konferensbidrag (refereegranskat)abstract
- Use of the new resist system mr-L 6000.1 XP in combination with PMMA is demonstrated to give sub-100 nm resolution in nanoimprint lithography. Low glass transition temperature in combination with high plasma stability makes this resist suitable for achieving desirable resist profiles after the imprint process. Imprint conditions for mr-L 6000.1 XP/PMMA resist system as well as imprint results are described and discussed
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| 10. |
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| 11. |
- Carlberg, Patrick
(författare)
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Nanoimprint lithography
- 2004
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Ingår i: NSF/SSF Workshop on Nanoscience and Nanotechnology, Lund, Sweden (2004).
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Konferensbidrag (refereegranskat)
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| 12. |
- Fantin, Nicholas J., et al.
(författare)
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The Canada-France Imaging Survey : Reconstructing the Milky Way Star Formation History from Its White Dwarf Population
- 2019
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Ingår i: Astrophysical Journal. - : American Astronomical Society. - 0004-637X .- 1538-4357. ; 887:2
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Tidskriftsartikel (refereegranskat)abstract
- As the remnants of stars with initial masses less than or similar to 8M(circle dot), white dwarfs contain valuable information on the formation histories of stellar populations. In this paper, we use deep, high-quality, u-band photometry from the Canada-France Imaging Survey, griz photometry from Pan-STARRS1, as well as proper motions from Gaia DR2, to select 25,156 white dwarf candidates over similar to 4500 deg(2) using a reduced proper motion diagram. We develop a new white dwarf population synthesis code that returns mock observations of the Galactic field white dwarf population for a given star formation history, while simultaneously taking into account the geometry of the Milky Way (MW), survey parameters, and selection effects. We use this model to derive the star formation histories of the thin disk, thick disk, and stellar halo. Our results show that the MW disk began forming stars (11.3 +/- 0.5) Gyr ago, with a peak rate of (8.8 +/- 1.4) M-circle dot yr(-1) at (9.8 +/- 0.4) Gyr, before a slow decline to a constant rate until the present day-consistent with recent results suggesting a merging event with a satellite galaxy. Studying the residuals between the data and best-fit model shows evidence for a slight increase in star formation over the past 3 Gyr. We fit the local fraction of helium-atmosphere white dwarfs to be (21 +/- 3)%. Incorporating this methodology with data from future wide-field surveys such as the Large Synoptic Survey Telescope, Euclid, The Cosmological Advanced Survey Telescope for Optical and ultraviolet Research, and the Wide Field Infrared Survey Telescope should provide an unprecedented view into the formation of the MW at its earliest epoch through its white dwarfs.
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| 13. |
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| 14. |
- Forsen, E, et al.
(författare)
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Fabrication of cantilever based mass sensors integrated with CMOS using direct write laser lithography on resist
- 2004
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Ingår i: Nanotechnology. - : IOP Publishing. - 0957-4484 .- 1361-6528. ; 15:10, s. 628-633
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Tidskriftsartikel (refereegranskat)abstract
- A CMOS compatible direct write laser lithography technique has been developed for cantilever fabrication on pre-fabricated standard CMOS. We have developed cantilever based sensors for mass measurements in vacuum and air. The cantilever is actuated into lateral vibration by electrostatic excitation and the resonant frequency is detected by capacitive readout. The device is integrated on standard CMOS circuitry. In the work a new direct write laser lithography (DWL) technique is introduced. This laser lithography technique is based on direct laser writing on substrates coated with a resist bi-layer consisting of poly(methyl methacrylate) (PMMA) on lift-off resist (LOR). Laser writing evaporates the PMMA, exposing the LOR. A resist solvent is used to transfer the pattern down to the substrate. Metal lift-off followed by reactive ion etching is used for patterning the structural poly-Si layer in the CMOS. The developed laser lithography technique is compatible with resist exposure techniques such as electron beam lithography. We demonstrate the fabrication of sub-micrometre wide suspended cantilevers as well as metal lift-off with feature line widths down to approximately 500 nm.
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| 15. |
- Forsen, E, et al.
(författare)
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Laser lithography on resist bi-layer for nanoelectromechanical systems prototyping
- 2004
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Ingår i: Microelectronic Engineering. - 1873-5568. ; 73-74, s. 491-495
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Tidskriftsartikel (refereegranskat)abstract
- We present a laser lithography technique based on lift-off, for fast and flexible prototyping of micro and nanoelectromechanical systems (MEMS/NEMS). The technique is based on direct laser writing on substrates coated with a resist bi-layer consisting of polymethyl methacrylate (PMMA) on lift-off resist (LOR). Laser writing melts and evaporates the PMMA exposing the LOR. Oxygen ashing removes PMMA residues within the lithography pattern. A resist solvent is used to transfer the pattern down to the substrate. The LOR is dissolved isotropically while the PMMA is unaffected by the solvent, hence creating an undercut profile. After metal evaporation a two-step lift-off process prevents metal flakes from adhering to the surface. First, warm acetone dissolves the PMMA and lifts off the metal layer, then warm Remover PG removes the LOR and any remaining metal. Metal structures with line widths down to 600 nm and dots with 600 mn diameters are presented. (C) 2004 Elsevier B.V. All rights reserved.
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| 16. |
- Hinkel, Natalie R., et al.
(författare)
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A Comparison Of Stellar Elemental Abundance Techniques And Measurements
- 2016
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Ingår i: Astrophysical Journal Supplement Series. - : American Astronomical Society. - 0067-0049 .- 1538-4365. ; 226:1
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Tidskriftsartikel (refereegranskat)abstract
- Stellar elemental abundances are important for understanding the fundamental properties of a star or stellar group, such as age and evolutionary history, as well as the composition of an orbiting planet. However, as abundance measurement techniques have progressed, there has been little standardization between individual methods and their comparisons. As a result, different stellar abundance procedures determine measurements that vary beyond the quoted error for the same elements within the same stars. The purpose of this paper is to better understand the systematic variations between methods and offer recommendations for producing more accurate results in the future. We invited a number of participants from around the world (Australia, Portugal, Sweden, Switzerland, and the United States) to calculate 10 element abundances (C, O, Na, Mg, Al, Si, Fe, Ni, Ba, and Eu) using the same stellar spectra for four stars (HD 361, HD 10700, HD 121504, and HD 202206). Each group produced measurements for each star using (1) their own autonomous techniques, (2) standardized stellar parameters, (3) a standardized line list, and (4) both standardized parameters and a line list. We present the resulting stellar parameters, absolute abundances, and a metric of data similarity that quantifies the homogeneity of the data. We conclude that standardization of some kind, particularly stellar parameters, improves the consistency between methods. However, because results did not converge as more free parameters were standardized, it is clear there are inherent issues within the techniques that need to be reconciled. Therefore, we encourage more conversation and transparency within the community such that stellar abundance determinations can be reproducible as well as accurate and precise.
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| 17. |
- Johansson, Fredrik I, et al.
(författare)
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Axonal outgrowth on nano-imprinted patterns
- 2006
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Ingår i: Biomaterials. - : Elsevier BV. - 1878-5905 .- 0142-9612. ; 27:8, s. 1251-1258
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Tidskriftsartikel (refereegranskat)abstract
- Nanotechnology has provided methods to fabricate surface patterns with features down to a few rim. If cells or cell processes exhibit contact guidance in response to such small patterns is an interesting question and could be pertinent for many applications. In the present study we investigated if axonal outgrowth was affected by nano-printed patterns in polymethylmethacrylate (PMMA)-covered silicon chips. To this end adult mouse sympathetic and sensory ganglia were mounted in Matrigel (R) on the chips close to the nano-patterns. The patterns consisted of parallel grooves with depths of 300 nm and varying widths of 100-400 nm. The distance between two adjacent grooves was 100-1600 nm. The chips were cultured in medium containing 25 ng/ml of nerve growth factor to stimulate axonal outgrowth. After 1 week of incubation. axonal outgrowth was investigated by immunocytochemistry or scanning electron microscopy. Axons displayed contact guidance on all patterns. Furthermore, we found that the nerve cell processes preferred to grow on ridge edges and elevations in the patterns rather than in grooves, a seemingly claustrophobic behavior. We conclude that axons of peripheral neurons might be guided by nanopatterns on PMMA when the lateral features are 100 nm or larger. The present results can be utilized for nerve regenerating scaffolds or the construction of a stable, high-resolution electronic interface to neurons, which is required for future brain machine interfaces. (c) 2005 Elsevier Ltd. All rights reserved.
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| 18. |
- Koksharov, Yu.A., et al.
(författare)
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Magnetostatic interactions in planar ring-like nanoparticle structures
- 2006
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Ingår i: Thin Solid Films. - : Elsevier BV. - 0040-6090. ; 515, s. 731-734
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Tidskriftsartikel (refereegranskat)abstract
- Numerical calculations of equilibrium state energies and local magnetic fields in planar ring-like nanoparticle structures were performed. The dipole–dipole, Zeeman and magnetic anisotropy interactions were included into the model. The result of their competition depends on the value of the external magnetic field, magnetic parameters of an individual nanoparticle, size and shape of the structures. Flux-closed vortexes, single domain, two- domain ‘‘onion’’-like, ‘‘hedgehog’’-like and more complex spin structures can be realized. The critical field, providing a sharp transition from the flux-closed vortex to the ‘‘onion’’-like state, can be regulated by a variation of the particle magnetization and anisotropy constant, their easy directions, and particle space arrangement.
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| 19. |
- Longeard, Nicolas, et al.
(författare)
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The pristine dwarf-galaxy survey - III. Revealing the nature of the Milky Way globular cluster Sagittarius II
- 2021
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Ingår i: Monthly notices of the Royal Astronomical Society. - : Oxford University Press (OUP). - 0035-8711 .- 1365-2966. ; 503:2, s. 2754-2762
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Tidskriftsartikel (refereegranskat)abstract
- We present a new spectroscopic study of the faint Milky Way satellite Sagittarius II. Using multiobject spectroscopy from the Fibre Large Array Multi-Element Spectrograph, we supplement the data set of Longeard et al. with 47 newly observed stars, 19 of which are identified as members of the satellite. These additional member stars are used to put tighter constraints on the dynamics and the metallicity properties of the system. We find a low velocity dispersion of sigma(SgrII)(v) = 1.7 +/- 0.5 km s(-1), in agreement with the dispersion of Milky Way globular clusters of similar luminosity. We confirm the very metal-poor nature of the satellite ([Fe/H](spectro)(SgrII) = -2.23 +/- 0.07) and find that the metallicity dispersion of Sgr II is not resolved, reaching only 0.20 at the 95 per cent confidence limit. No star with a metallicity below -2.5 is confidently detected. Therefore, despite the unusually large size of the system (r(h) = 35.5(-1.2)(-1.4) pc), we conclude that Sgr II is an old and metal-poor globular cluster of the Milky Way.
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| 20. |
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| 21. |
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| 22. |
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| 23. |
- Luo, Gang, et al.
(författare)
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Nanoimprint lithography for the fabrication of interdigitated cantilever arrays
- 2006
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Ingår i: Nanotechnology. - : IOP Publishing. - 0957-4484 .- 1361-6528. ; 17:8, s. 1906-1910
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Tidskriftsartikel (refereegranskat)abstract
- We report on the realization of a novel interdigitated cantilever array with electrostatic control of the shape of the interdigitated array. It consists of an array of SiO2/metal double-finger cantilevers in a grating configuration together with an electrical connection part. The complete grating structure is fabricated with nanoimprint lithography, UV lithography and reactive ion etching. The patterns of the cantilever arrays are defined by nanoimprint lithography. The electrical contact pads are defined and aligned with the imprinted grating pattern by UV lithography. The two steps of reactive ion etching are optimized to get vertical sidewalls of the SiO2 cantilevers and finally to release them from the Si substrate. By applying a bias, the shape of the cantilever array can be altered due to the electrostatic force. The dimensions of the cantilevers and the spacing between them are optimized to achieve the desired functional operating characteristics of the structures. Since the fabrication scheme is based on nanoimprint lithography, such electrostatically controlled periodic structures may be relatively easily and non-expensively realized in various configurations, allowing them to function as optical switching elements, electrical filters, mass sensors, etc.
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| 24. |
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| 25. |
- Luo, Gang, et al.
(författare)
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Scanning probe lithography for nanoimprinting mould fabrication
- 2006
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Ingår i: Nanotechnology. - : IOP Publishing. - 0957-4484 .- 1361-6528. ; 17:12, s. 3018-3022
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Tidskriftsartikel (refereegranskat)abstract
- We propose a rational fabrication method for nanoimprinting moulds by scanning probe lithography. By wet chemical etching, different kinds of moulds are realized on Si( 110) and Si( 100) surfaces according to the Si crystalline orientation. The structures have line widths of about 200 nm with a high aspect ratio. By reactive ion etching, moulds with patterns free from the limitation of Si crystalline orientation are also obtained. With closed-loop scan control of a scanning probe microscope, the length of patterned lines is more than 100 mu m by integrating several steps of patterning. The fabrication process is optimized in order to produce a mould pattern with a line width about 10 nm. The structures on the mould are further duplicated into PMMA resists through the nanoimprinting process. The method of combining scanning probe lithography with wet chemical etching or reactive ion etching (RIE) provides a resistless route for the fabrication of nanoimprinting moulds.
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| 26. |
- Maximov, Ivan, et al.
(författare)
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Nanoimprint lithography for fabrication of three-terminal ballistic junctions in InP/GaInAs
- 2002
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Ingår i: Nanotechnology. - : IOP Publishing. - 0957-4484. ; 13:5, s. 666-668
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Tidskriftsartikel (refereegranskat)abstract
- We present processing technology and characterization results for InP/GaInAs two-dimensional electron gas (2DEG) three-terminal ballistic junction (TBJ) devices manufactured using nanoimprint lithography (NIL). To transfer sub-100 nm features into a high-mobility InP-based 2DEG material, we used SiO2/Si stamps made using electron beam lithography and reactive ion etching. After NIL, the resist residues are removed in oxygen plasma; this is followed by wet etching of InP/GaInAs to define the TBJ structures. Fabricated TBJ devices are characterized using scanning electron microscopy and electron transport measurements. Highly non-linear electrical characteristics as predicted by the theory (Xu H Q 2001 APPI. Phys. Lett. 78 2064) are demonstrated.
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| 27. |
- Maximov, Ivan, et al.
(författare)
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Nanoimprint technology for fabrication of three-terminal ballistic junction devices in GaInAs/InP
- 2003
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Ingår i: Microelectronic Engineering. - 1873-5568. ; 67-8, s. 196-202
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Tidskriftsartikel (refereegranskat)abstract
- We present processing technology based on nanoimprint lithography (NIL) and wet etching for fabrication of GaInAs/InP three-terminal ballistic junction (TBJ) devices. To transfer sub-100 nm features into a high-mobility InP-based 2DEG material, we used SiO2/Si stamps made with electron beam lithography and reactive ion etching. After the NIL, the resist residues are removed in oxygen plasma followed by wet etching of GaInAs/InP to define the M-structures. Fabricated TBJ-devices are characterized using scanning electron microscopy and electron transport measurements. Highly non-linear electrical characteristics of the TBJ structures are demonstrated and compared with E-beam defined devices. (C) 2003 Elsevier Science B.V. All rights reserved.
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| 28. |
- Maximov, Ivan, et al.
(författare)
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New high resolution negative resist mr-L 6000.1 XP for electron beam and nanoimprint lithography
- 2002
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Ingår i: 7th International Conference on Nanometer-Scale Science and Technology and 21st European Conference on Surface Science.
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Konferensbidrag (refereegranskat)abstract
- We present the characterization results of a new high resolution negative electron beam resist mr-L 6000.1 XP. The resist can also be used as imprintable polymer in nanoimprint lithography with sub-100 nm resolution. The feature size achieved after e-beam exposure was about 50 nm with sensitivity of 2-4 μC/cm2. Studies of the resist properties as a function of chemical composition and development conditions are also presented
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| 29. |
- Meng, Fantao, et al.
(författare)
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Efficient methods of nanoimprint stamp cleaning based on imprint self-cleaning effect.
- 2011
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Ingår i: Nanotechnology. - : IOP Publishing. - 0957-4484 .- 1361-6528. ; 22:18
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Tidskriftsartikel (refereegranskat)abstract
- Nanoimprint lithography (NIL) is a nonconventional lithographic technique that promises low-cost, high-throughput patterning of structures with sub-10 nm resolution. Contamination of nanoimprint stamps is one of the key obstacles to industrialize the NIL technology. Here, we report two efficient approaches for removal of typical contamination of particles and residual resist from stamps: thermal and ultraviolet (UV) imprinting cleaning-both based on the self-cleaning effect of imprinting process. The contaminated stamps were imprinted onto polymer substrates and after demolding, they were treated with an organic solvent. The images of the stamp before and after the cleaning processes show that the two cleaning approaches can effectively remove contamination from stamps without destroying the stamp structures. The contact angles of the stamp before and after the cleaning processes indicate that the cleaning methods do not significantly degrade the anti-sticking layer. The cleaning processes reported in this work could also be used for substrate cleaning.
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| 30. |
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| 31. |
- Montelius, Lars, et al.
(författare)
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Next generation nanotechnologies for sensor array fabrication
- 2002
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Ingår i: 7th International Conference on Nanometer-Scale Science and Technology and 21st European Conference on Surface Science.
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Konferensbidrag (refereegranskat)abstract
- New emerging technologies such as nanoimprint lithography (NIL) offers the biosensor research community the possibility to fabricate low-cost biodevices having nanometer dimensions. Such nanosized devices can be applied as biosensors where new functions might emerge due to the nanoscale dimensions. In this paper we will discuss various nanolithography methods as well as the benefits of going to the nanoscale for biosensor applications. We will also show results from mixed NIL and UV-lithography for fabrication of interdigitated nanobiosensor electrodes on up to 6'' large Si wafers. The electrode and inter-electrode distances were 100 nm wide over a total area of 200 μm×200 μm. We will also show the obtained enhanced efficiency of redox-recycling when utilizing such nanoscaled biosensors
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| 32. |
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| 33. |
- Mårtensson, Thomas, et al.
(författare)
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Nanowire arrays - a toolbox for the future
- 2004
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Ingår i: Book of extended abstracts: 8th Intl Conf Nanoscale Sci Technol, Venice, Italy (2004).
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Konferensbidrag (refereegranskat)
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| 34. |
- Mårtensson, Thomas, et al.
(författare)
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Nanowire arrays defined by nanoimprint lithography
- 2004
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Ingår i: Nano Letters. - : American Chemical Society (ACS). - 1530-6992 .- 1530-6984. ; 4:4, s. 699-702
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Tidskriftsartikel (refereegranskat)abstract
- We demonstrate the use of nanoimprint lithography to define arrays of vertical InP nanowires. Each nanowire is individually seeded from a catalyzing gold particle and then grown via vapor-liquid-solid growth in a metal-organic vapor phase epitaxy system. The diameter and position of each nanowire can be controlled to create engineered arrays, demonstrated with a hexagonal photonic crystal pattern. This combination of nanoimprint and self-assembly of nanostructures is attractive for photonics and electronics, as well as in life sciences.
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| 35. |
- Pfeiffer, K, et al.
(författare)
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A comparison of thermally and photochemically cross-linked polymers for nanoimprinting
- 2003
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Ingår i: Microelectronic Engineering. - 1873-5568. ; 67-8, s. 266-273
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Tidskriftsartikel (refereegranskat)abstract
- The characteristics and benefits of two types of cross-linking prepolymers with low glass transition temperature (T-g) for nanoimprinting are reported. They are soluble in organic solvents and their solutions can be processed like those of common thermoplastics. The imprinted patterns receive high thermal and mechanical stability through cross-linking polymerization. The course of the polymerization was investigated to determine the appropriate conditions for the imprint process. In thermally cross-linked polymers mr-I 9000, the cross-linking occurs during imprinting. Process time and temperature depend on the polymerization rate. Volume shrinkage during the polymerization does not adversely affect imprinting. Photochemically cross-linked polymers mr-L 6000 make possible imprint temperatures below 100 T and short imprint times. The T-g of the prepolymer determines the imprint temperature. The cross-linking reaction and structural stabilization is performed after imprinting. 50-nm trenches and sub-50-nm dots confirm the successful application of the polymers.
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| 36. |
- Sestito, Federico, et al.
(författare)
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The Pristine survey – X. A large population of low-metallicity stars permeates the Galactic disc
- 2020
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Ingår i: Monthly notices of the Royal Astronomical Society. - : Oxford University Press (OUP). - 0035-8711 .- 1365-2966 .- 1745-3925 .- 1745-3933. ; 497:1, s. L7-L12
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Tidskriftsartikel (refereegranskat)abstract
- The orbits of the least chemically enriched stars open a window on the formation of our Galaxy when it was still in its infancy. The common picture is that these low-metallicity stars are distributed as an isotropic, pressure-supported component since these stars were either accreted from the early building blocks of the assembling Milky Way (MW), or were later brought by the accretion of faint dwarf galaxies. Combining the metallicities and radial velocities from the Pristine and LAMOST surveys and Gaia DR2 parallaxes and proper motions for an unprecedented large and unbiased sample of 1027 very metal poor stars at [Fe/H] ≤ −2.5 dex, we show that this picture is incomplete. We find that 31 per cent of the stars that currently reside spatially in the disc (|Z|≤3kpc) do not venture outside of the disc plane throughout their orbit. Moreover, this sample shows strong statistical evidence (at the 5.0σ level) of asymmetry in their kinematics, favouring prograde motion. The discovery of this population implies that a significant fraction of stars with iron abundances [Fe/H] ≤ −2.5 dex merged into, formed within, or formed concurrently with the MW disc and that the history of the disc was quiet enough to allow them to retain their disc-like orbital properties, challenging theoretical and cosmological models.
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| 37. |
- Thomas, Guillaume F., et al.
(författare)
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The Hidden Past of M92 : Detection and Characterization of a Newly Formed 17 degrees Long Stellar Stream Using the Canada-France Imaging Survey
- 2020
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Ingår i: Astrophysical Journal. - : American Astronomical Society. - 0004-637X .- 1538-4357. ; 902:2
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Tidskriftsartikel (refereegranskat)abstract
- We present an analysis of the structure, kinematics, and orbit of a newly found stellar stream emanating from the globular cluster M92 (NGC 6341). This stream was discovered in an improved matched-filter map of the outer Galaxy, based on a color-color-magnitude diagram, created using photometry from the Canada-France Imaging Survey and the Pan-STARRS 1 3 pi survey. We find the stream to have a length of 17 degrees (2.5 kpc at the distance of M92), a width dispersion of 029(42 pc), and a stellar mass of [3.17 0.89] x 10(4)M(10% of the stellar mass of the current main body of M92). We examine the kinematics of main-sequence, red giant, and blue horizontal branch stars belonging to the stream and that have proper motion measurements from the second data release of Gaia.N-body simulations suggest that the stream was likely formed very recently (during the last similar to 500 Myr) forcing us to question the orbital origin of this ancient, metal-poor globular cluster.
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