| 1. |
- Roder, C., et al.
(author)
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Strain in a-plane GaN layers grown on r-plane sapphire substrates
- 2006
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In: Physica Status Solidi (A) Applications and Materials. - : Wiley. - 1862-6300. ; 203:7, s. 1672-1675
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Journal article (peer-reviewed)abstract
- The strain in a-plane GaN layers of different thickness grown on r-plane sapphire substrates by hydride vapor phase epitaxy was studied by X-ray diffraction. The layers are found to be under compression in the growth plane and under tension in the growth direction. Therefore, the symmetry of the GaN unit cell is no longer hexagonal but orthorhombic. With increasing layer thickness the strain relaxes and the curvature of the wafer increases. Wafer bending is proposed to be the major strain relaxation mechanism. The anisotropic in-plane strain relaxation is attributed to the elastic and thermal anisotropy of GaN and sapphire. © 2006 WILEY-VCH Verlag GmbH & Co. KGaA.
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| 2. |
- Roder, C., et al.
(author)
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Stress and wafer bending of a -plane GaN layers on r -plane sapphire substrates
- 2006
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In: Journal of Applied Physics. - : AIP Publishing. - 0021-8979 .- 1089-7550. ; 100:10
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Journal article (peer-reviewed)abstract
- The stress and wafer bending of (11 2- 0) a -plane GaN layers of different thicknesses grown on (1 1- 02) r -plane sapphire substrates by hydride vapor phase epitaxy were studied by high-resolution x-ray diffraction and photoluminescence and photoreflectance spectroscopies. The layers are found to be under compression in the growth plane and under tension in the growth direction. The elastic and thermal anisotropies of the GaN and the sapphire crystal result in an in-plane stress and a wafer curvature, both of which are different in the two in-plane directions parallel and perpendicular to the GaN c axis. The GaN unit cell is no longer hexagonal but orthorhombic. The stress relaxes with increasing GaN layer thickness while the curvature of the wafer increases. Different stress relief mechanisms are considered, and the stresses in the layer and the curvature of the wafer are calculated using standard models on wafer bending. The results suggest that the wafer bending is the dominant stress relief mechanism. In addition, the redshift of the near-band-edge photoluminescence and the free exciton photoreflectance peaks with increasing layer thickness is correlated with the strain data determined by x-ray diffraction. © 2006 American Institute of Physics.
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| 3. |
- Darakchieva, Vanya, 1971-, et al.
(author)
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Phonons in strained AlGaN/GaN superlattices
- 2007
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In: 6th International Symposium on Blue Laser and Light Emitting Diodes,2006. - Physica Status Solidi, vol C4 : WILEYVCH Verlag GmbH & Co. KGaA. ; , s. 170-
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Conference paper (peer-reviewed)
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| 4. |
- Kasic, A., et al.
(author)
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Phonons and free-carrier properties of binary, ternary, and quaternary group-III nitride layers measured by infrared Spectroscopic Ellipsometry
- 2003
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In: Physica Status Solidi. C, Current topics in solid state physics. - : Wiley. - 1610-1634 .- 1610-1642. ; 0:6 SPEC. ISS., s. 1750-1769
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Conference paper (other academic/artistic)abstract
- This work reviews recent ellipsometric investigations of the infrared dielectric functions of binary, ternary, and quaternary group-III nitride films. Spectroscopic Ellipsometry in the mid-infrared range is employed for the first time to determine phonon and free-carrier properties of individual group-III nitride heterostructure components, including layers of some ten nanometer thickness. Assuming the effective carrier mass, the free-carrier concentration and mobility parameters can be quantified upon model analysis of the infrared dielectric function. In combination with Hall-effect measurements, the effective carrier masses for wurtzite n- and p-type GaN and n-type InN are obtained. The mode behavior of both the E1(TO) and A1(LO) phonons are determined for ternary compounds. For strain-sensitive phonon modes, the composition and strain dependences of the phonon frequencies are differentiated and quantified. Information on the crystal quality and compositional homogeneity of the films can be extracted from the phonon mode broadening parameters. A comprehensive IR dielectric function database of group-III nitride materials has been established and can be used for the analysis of complex thin-film heterostructures designed for optoelectronic device applications. Information on concentration and mobility of free carriers, thickness, alloy composition, average strain state, and crystal quality of individual sample constituents can be derived. © 2003 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
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| 5. |
- Darakchieva, V., et al.
(author)
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Phonons in strained AlGaN/GaN superlattices
- 2007
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In: Physica Status Solidi. C, Current topics in solid state physics. - : Wiley. - 1610-1634 .- 1610-1642. ; 4:1, s. 170-174
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Journal article (peer-reviewed)abstract
- Phonons in strained AlGaN/GaN superlattices (SLs) with constant periods but different Al composition have been studied using a combination of infrared spectroscopic ellipsometry and Raman scattering spectroscopy. The following SL modes were identified: i) AlGaN localized E1(TO) modes identified for the first time and AlGaN localized A1 (LO) phonons; ii) GaN localized E2, E1(TO) and A1(LO) phonons; iii) delocalized E1(LO) phonons; iv) A1(TO) phonon; v) two modes around 660 cm-1 and 594-625 cm-1, respectively, not predicted by theory. The effects of strain and composition on the phonon frequencies were established and discussed.
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