| 1. |
- Kasic, A., et al.
(författare)
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Phonons and free-carrier properties of binary, ternary, and quaternary group-III nitride layers measured by infrared Spectroscopic Ellipsometry
- 2003
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Ingår i: Physica Status Solidi. C, Current topics in solid state physics. - : Wiley. - 1610-1634 .- 1610-1642. ; 0:6 SPEC. ISS., s. 1750-1769
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Konferensbidrag (övrigt vetenskapligt/konstnärligt)abstract
- This work reviews recent ellipsometric investigations of the infrared dielectric functions of binary, ternary, and quaternary group-III nitride films. Spectroscopic Ellipsometry in the mid-infrared range is employed for the first time to determine phonon and free-carrier properties of individual group-III nitride heterostructure components, including layers of some ten nanometer thickness. Assuming the effective carrier mass, the free-carrier concentration and mobility parameters can be quantified upon model analysis of the infrared dielectric function. In combination with Hall-effect measurements, the effective carrier masses for wurtzite n- and p-type GaN and n-type InN are obtained. The mode behavior of both the E1(TO) and A1(LO) phonons are determined for ternary compounds. For strain-sensitive phonon modes, the composition and strain dependences of the phonon frequencies are differentiated and quantified. Information on the crystal quality and compositional homogeneity of the films can be extracted from the phonon mode broadening parameters. A comprehensive IR dielectric function database of group-III nitride materials has been established and can be used for the analysis of complex thin-film heterostructures designed for optoelectronic device applications. Information on concentration and mobility of free carriers, thickness, alloy composition, average strain state, and crystal quality of individual sample constituents can be derived. © 2003 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
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| 2. |
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| 3. |
- Ashkenov, N., et al.
(författare)
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Infrared dielectric functions and phonon modes of high-quality ZnO films
- 2003
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Ingår i: Journal of Applied Physics. - : AIP Publishing. - 0021-8979 .- 1089-7550. ; 93:1, s. 126-133
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Tidskriftsartikel (refereegranskat)abstract
- A study was performed on the phonon modes and infrared dielectric functions of high-quality ZnO thin films. The pulsed laser deposition technique was used to deposit the ZnO films on c-plane sapphire substrates and were investigated by high-resolution transmission electron microscopy, high-resolution x-ray diffraction and Rutherford backscattering experiments. The accurate long-wavelength dielectric constant limits of the films were also obtained and were compared with near-band-gap index-of-refraction data upon the Lyddane-Sachs-Teller relation for both film and bulk samples. It was found that the phonon modes of the film were highly consistent with those of the bulk sample.
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| 4. |
- Buyanova, Irina, 1960-, et al.
(författare)
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Analysis of band anticrossing in GaNxP1-x alloys
- 2004
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Ingår i: Physical Review B. Condensed Matter and Materials Physics. - 1098-0121 .- 1550-235X. ; 70, s. 085209-
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Tidskriftsartikel (refereegranskat)abstract
- Temperature-dependent absorption, photoluminescence excitation, and spectroscopic ellipsometry measurements are employed to accurately determine compositional and temperature dependences of the conduction band (CB) states in GaNP alloys. The CB edge and the higher lying Γc CB minimum (CBM) are shown to exhibit an apparently anticrossing behavior, i.e., the N-induced redshift of the bandgap energy is accompanied by a matching blueshift of the Γc CBM. The obtained data can be phenomenologically described by the band anticrossing model. By considering strong temperature dependence of the energy of the interacting N level, which has largely been overlooked in earlier studies of GaNP, the interacting N level can be attributed to the isolated substitutional NP and the coupling parameter is accurately determined.
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| 5. |
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| 6. |
- Darakchieva, Vanya, et al.
(författare)
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Generalized infrared ellipsometry study of thin epitaxial AlN layers with complex strain behavior
- 2003
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Konferensbidrag (refereegranskat)abstract
- The effect of film thickness on the strain and structural properties of thin epitaxial AlN films has been investigated, and a sub-layer model of the degree of strain and related defects for all films is suggested. The vibrational properties of the films have been studied by generalized infrared spectroscopic ellipsometry. The proposed sub-layer model has been successfully applied to the analysis of the ellipsometry data trough model calculations of the infrared dielectric function. © 2003 Elsevier B.V. All rights reserved.
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| 7. |
- Darakchieva, Vanya, 1971-, et al.
(författare)
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Strain-related structural and vibrational properties of thin epitaxial AIN layers
- 2004
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Ingår i: Physical Review B. Condensed Matter and Materials Physics. - 1098-0121 .- 1550-235X. ; 70:4, s. 045411-
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Tidskriftsartikel (refereegranskat)abstract
- The effect of film thickness on the strain and structural properties of thin epitaxial AIN films has been investigated by high resolution x-ray diffraction techniques and transmission electron microscopy. As a result a sublayer model of the degree of strain and related defects for all films is proposed. A sublayer with low defect density and a strain gradient is found to be present in all films and it reaches a maximum thickness of 65 nm. The films are compressively strained and the strain relaxation after a thickness of 65 nm is shown to be accompanied by misfit dislocation generation and increase of the mosaic tilt. The vibrational properties of the films have been studied by generalized infrared spectroscopic ellipsometry. The proposed sublayer model has been successfully applied to the analysis of the ellipsometry data through model calculations of the infrared dielectric function which confirm the sublayer model. It is found that the strain gradient results in a gradient of the phonon mode frequencies and broadening parameter. The initial strain relaxation in the films leads to narrowing of the observable infrared modes, while further strain relaxation broadens the modes when substantial defect generation occurs.
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| 8. |
- Gogova, Daniela, et al.
(författare)
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Characterization of high-quality free-standing GaN grown by HVPE
- 2004
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Ingår i: Physica Scripta. - 0031-8949 .- 1402-4896. ; T114, s. 18-21
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Tidskriftsartikel (refereegranskat)abstract
- Single-crystalline 330µm thick GaN has been grown on 2'' Al2O3 (0 0 0 1) by hydride vapour phase epitaxy (HVPE). Upon laser-induced lift-off the GaN was delaminated from the sapphire substrate, and bulk-like free-standing GaN was achieved. Various characterization methods were utilized to assess the structural and optical quality of the freestanding material. The X-ray rocking curves of the (1 0–1 4) and (0 0 0 2) diffraction peaks revealed full width at half maximum (FWHM) values of 96 and 129arcsec, respectively. These data compare well with the smallest corresponding values published so far for bulk-like HVPE-GaN. The dislocation density determined by plan-view transmission electron microscopy studies is 1–2 × 107cm–2. The low-temperature near-band-gap photoluminescence spectrum shows the main donor bound exciton (DBE) peak at 3.4718eV with a FWHM of 1.4meV, verifying the high crystalline quality of the bulk-like GaN. The DBE peak position suggests complete stress relief. The phonon spectra measured by infrared spectroscopic ellipsometry confirm as well, that the free-standing material is of high crystalline quality and virtually stress-free.
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| 9. |
- Gogova, Daniela, et al.
(författare)
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Optical and structural characteristics of virtually unstrained bulk-like GaN
- 2004
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Ingår i: Japanese Journal of Applied Physics. - 0021-4922 .- 1347-4065. ; 43:4A, s. 1264-1268
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Tidskriftsartikel (refereegranskat)abstract
- Bulk-like GaN with high structural and optical quality has been attained by hydride vapor-phase exitapy (HVPE). The as-grown 330 mum-thick GaN layer was separated from the sapphire substrate by a laser-induced lift-off process. The full width at half maximum values of the X-ray diffraction (XRD) omega-scans of the free-standing material are 96 and 129 arcsec for the (1 0 -1 4) and (0 0 0 2) reflection, respectively, which rank among the smallest values published so far for free-standing HVPE-GaN. The dislocation density determined by plan-view TEM images is 1-2 x 10(7) cm(-2). Positron annihilation spectroscopy studies show that the concentration of Ga vacancy related defects is about 1.5 x 10(16) cm(-3). The high-resolution XRD, photoluminescence, mu-Raman, and infrared spectroscopic ellipsometry measurements consistently prove that the free-standing material is of high crystalline quality and virtually strain-free. Therefore it is suitable to serve as a substrate for stress-free growth of high-quality III-nitrides based device heterostructures.
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| 10. |
- Gogova, Daniela, 1967-, et al.
(författare)
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Strain-free bulk-like GaN grown by hydride-vapor-phase-epitaxy on two-step epitaxial lateral overgrown GaN template
- 2004
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Ingår i: Journal of Applied Physics. - : AIP Publishing. - 0021-8979 .- 1089-7550. ; 96:1, s. 799-806
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Tidskriftsartikel (refereegranskat)abstract
- Crack-free bulk-like GaN with high crystalline quality has been obtained by hydride-vapor-phase-epitaxy (HVPE) growth on a two-step epitaxial lateral overgrown GaN template on sapphire. During the cooling down stage, the as-grown 270-μm-thick GaN layer was self-separated from the sapphire substrate. Plan-view transmission electron microscopy images show the dislocation density of the free-standing HVPE-GaN to be ∼2.5×107 cm−2 on the Ga-polar face. A low Ga vacancy related defect concentration of about 8×1015 cm−3 is extracted from positron annihilation spectroscopy data. The residual stress and the crystalline quality of the material are studied by two complementary techniques. Low-temperature photoluminescence spectra show the main neutral donor bound exciton line to be composed of a doublet structure at 3.4715 (3.4712) eV and 3.4721 (3.4718) eV for the Ga- (N-) polar face with the higher-energy component dominating. These line positions suggest virtually strain-free material on both surfaces with high crystalline quality as indicated by the small full width at half maximum values of the donor bound exciton lines. The E1(TO) phonon mode position measured at 558.52 cm−1 (Ga face) by infrared spectroscopic ellipsometry confirms the small residual stress in the material, which is hence well suited to act as a lattice-constant and thermal-expansion-coefficient matched substrate for further homoepitaxy, as needed for high-quality III-nitride device applications. © 2004 American Institute of Physics.
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| 11. |
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| 12. |
- Kakanakova-Georgieva, Anelia, 1970-, et al.
(författare)
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Superior material properties of AlN on vicinal 4H-SiC
- 2006
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Ingår i: Journal of Applied Physics. - : AIP Publishing. - 0021-8979 .- 1089-7550. ; 100:3
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Tidskriftsartikel (refereegranskat)abstract
- The crystal structure and optical properties of thick (>100 nm) AlN layers grown by hot-wall metalorganic chemical vapor deposition are characterized by infrared spectroscopic ellipsometry, cathodoluminescence, and transmission electron microscopy. The choice of substrates among the available SiC wafer polytype modifications (4H/6H) and misorientations (on-/off-axis cut) is found to determine the AlN defect interaction, stress homogeneity, and luminescence. The growth of thick AlN layers benefits by performing the epitaxy on off-axis substrates because, due to stacking faults, the propagation of threading defects in AlN layers is stopped in a narrow interface region. © 2006 American Institute of Physics.
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| 13. |
- Kasic, A., et al.
(författare)
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Characterization of crack-free relaxed GaN grown on 2″ sapphire
- 2005
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Ingår i: Journal of Applied Physics. - : AIP Publishing. - 0021-8979 .- 1089-7550. ; 98:7, s. 73525-
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Tidskriftsartikel (refereegranskat)abstract
- We demonstrate the growth of high-quality and virtually strain-free bulklike GaN by hydride vapor-phase epitaxy in a vertical atmospheric-pressure reactor with a bottom-fed design. The 300‐μm-thick GaN layer was grown on a 2″ (0 0 0 1) sapphire substrate buffered with a ∼ 2‐μm-thick GaN layer grown by metal-organic chemical-vapor deposition. During the cool down process to room temperature, cracking was induced in the sapphire substrate, thereby allowing the bulklike GaN layer to relax without provoking cracking of itself. The crystalline quality and the residual strain in the 2″ GaN wafer were investigated by various characterization techniques. The lateral homogeneity of the wafer was monitored by low-temperature photoluminescence mapping. High-resolution x-ray diffraction and photoluminescence measurements proved the high crystalline quality of the material grown. The position of the main near-band-gap photoluminescence line and the phonon spectra obtained from infrared spectroscopic ellipsometry show consistently that the 2″ crack-free GaN is virtually strain-free over a diameter of approximately 4 cm.
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| 14. |
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| 15. |
- Kasic, A., et al.
(författare)
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Micro-Raman scattering profiling studies on HVPE-grown free-standing GaN
- 2004
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Ingår i: Physica status solidi. A, Applied research. - : Wiley. - 0031-8965 .- 1521-396X. ; 201:12, s. 2773-2776
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Tidskriftsartikel (refereegranskat)abstract
- Free-standing GaN of ∼330 μm thickness with low defect density was prepared by hydride vapor-phase epitaxy (HVPE) on sapphire in a vertical atmospheric-pressure reactor and a subsequent laser-induced lift-off process. The structural and optical properties of the material were assessed by various characterization techniques, like X-ray diffraction, photo- and cathodoluminescence, spectroscopic ellipsometry, positron annihilation spectroscopy, and transmission electron microscopy. Here, we focus on μ-Raman scattering profiling studies providing the vertical strain distribution and the evolution of the crystalline quality with increasing layer thickness. Profiles of the free-carrier concentration are obtained from monitoring the LO-phonon plasmon coupled mode. Comparative investigations are performed on the material before and after separation of the sapphire substrate. The GaN material presented here is well capable of serving as a substrate for further homoepitaxial strain-relaxed and crack-free growth needed for fabrication of high-quality III-nitride device heterostructures.
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| 16. |
- Larsson, Henrik, et al.
(författare)
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Free-standing HVPE-GaN Layers
- 2003
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Ingår i: Physica Status Solidi. C, Current topics in solid state physics. - : Wiley. - 1610-1634 .- 1610-1642. ; 0:7, s. 1985-1988
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Tidskriftsartikel (refereegranskat)abstract
- We have grown GaN layers with a thickness up to 340 μm in an rf-heated vertical HVPE reactor with a bottom-fed design. The GaN layers were separated from the sapphire substrate by a LLO process. The free-standing GaN was investigated by HRXRD, AFM and low temperature CL. The FWHM values of the ω-scans are 96 and 129 arcsec for the (104) and (002) reflection, respectively, which indicates high crystalline quality. The c and a lattice parameters are determined as c = 0.51850 ± 0.00004 nm and a = 0.31890 ± 0.00004 nm, indicating stress free material. The etch pit density was estimated to be 1 × 107 cm−2. The used HVPE growth procedure together with the subsequent LLO are obviously capable to provide high-quality free-standing GaN material for further epitaxial overgrowth.
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| 17. |
- Monemar, Bo, 1942-, et al.
(författare)
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Optical properties of InN - The bandgap question
- 2005
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Ingår i: Superlattices and Microstructures. - : Elsevier BV. - 0749-6036 .- 1096-3677. ; 38:1, s. 38-56
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Tidskriftsartikel (refereegranskat)abstract
- The bandgap value of InN was analyzed, with reference to optical data on single crystalline thin films samples grown on sapphire. It was found that the line shape of the photoluminescence spectra could be quite well reproduced in a model for the optical transitions from the conduction band states to localized states above the valence band. It was also found that the conduction band transition requires the presence of deep donor at a concentration close to 1020 cm∓3. The results show that the bandgap of pure InN should be about 0.69 eV at 2 K.
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| 18. |
- Paskova, Tanja, et al.
(författare)
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Polar and nonpolar GaN grown by HVPE : Preferable substrates for nitride-based emitting devices
- 2004
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Ingår i: Physica status solidi. A, Applied research. - : Wiley. - 0031-8965 .- 1521-396X. ; 201:10, s. 2265-2270
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Tidskriftsartikel (refereegranskat)abstract
- We report on hydride vapor phase epitaxial growth of thick nonpolar GaN films on r-plane sapphire in comparison with polar GaN films on c-plane sapphire substrates with AlN buffer layers, aiming at developing of their quasi-substrate application. Both the thick films and the buffers were identified to have single crystalline structures. The microstructure of the films was studied by transmission electron microscopy. High resolution X-ray diffraction mapping and photoluminescence measurements were employed to characterize the strain present in both polar and nonpolar GaN films. In contrast to c-plane GaN, which is always characterised by isotropic in-plane properties, the a-plane GaN shows a strong in-plane anisotropy of the growth rate, morphology and strain distribution. Different defect, impurity and free carrier concentrations were observed in the polar and nonpolar material.
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