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- Bahr, A., et al.
(författare)
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Non-reactive HiPIMS deposition of NbCx thin films : Effect of the target power density on structure-mechanical properties
- 2022
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Ingår i: Surface & Coatings Technology. - : Elsevier. - 0257-8972 .- 1879-3347. ; 444
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Tidskriftsartikel (refereegranskat)abstract
- The exceptional mechanical properties of transition metal carbide coatings are known to be governed by the carbon content and its morphological distribution. Here, we verify the influence of the target peak power density on the chemical composition, microstructure, and mechanical properties of NbCx coatings grown by non-reactive high-power impulse magnetron sputtering (HiPIMS). By tuning the pulse parameters, the power density can be increased from 0.11 to 1.48 kW/cm2 leading to a decrease in the C/Nb ratio from 1.52 to 0.99 within the films - proven by combined elastic backscattering and time-of-flight elastic recoil detection analysis. This decrease in the C/Nb ratio is accompanied by microstructural changes from nanocomposite morphologies with an average grain size of 6.6 +/- 2.5 nm at 0.13 kW/cm2 into more columnar structures with an average column width of 65.2 +/- 18.7 nm at 1.48 kW/cm2. Independent from the C/Nb ratio, all films exhibit a single face-centered cubic structure. The mechanical properties correlate with the enhanced growth behavior dominated by ions at higher peak power densities and the varied C/Nb ratios. A maximum in hardness and fracture toughness of H = 38.7 +/- 3.6 GPa and KIc = 2.78 +/- 0.13 MPa center dot m1/2 (at 3.2 GPa residual compressive stress), is obtained for the nearly stoichiometric NbC coating exhibiting C/Nb ratio of 1.06.
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- Kirnbauer, A., et al.
(författare)
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Mechanical properties and thermal stability of reactively sputtered multi-principal-metal Hf-Ta-Ti-V-Zr nitrides
- 2020
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Ingår i: Surface & Coatings Technology. - : ELSEVIER SCIENCE SA. - 0257-8972 .- 1879-3347. ; 389
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Tidskriftsartikel (refereegranskat)abstract
- Crystalline (Hf,Ta,Ti,V,Zr)N nitride thin films, with a high-entropy metal-sublattice, were synthesized at 440 degrees C by reactive magnetron sputtering using an equimolar Hf-Ta-Ti-V-Zr-compound target. The coatings are single-phase fcc structured mono-nitrides for N-2/(Ar + N-2) flow-rate-ratios (f(N2)) between 30 and 45%. For higher f(N2) a small fraction of a second phase (next to the fcc matrix) can be detected by X-ray diffraction (XRD) and selected area electron diffraction (SAED). All coatings studied (prepared with f(N2) between 30 and 60%) show similar chemical compositions and hardness (H) values between 30.0 and 34.0 GPa with indentation moduli of similar to 460 GPa. Atom probe tomography (APT) indicates a homogenous distribution of all elements within our fcc-(Hf,Ta,Ti,V,Zr)N even after vacuum-annealing at 1300 degrees C. While H decreased from 32.5 to 28.1 GPa by this annealing treatment, the coating is still single-phase fcc structured with a defect density (expressed by XRD and SAED features, transmission electron microscopy contrast, and grain sizes) comparable to the as-deposited state. Only after vacuum-annealing at 1500 degrees C, XRD and APT reveal the formation of hexagonal structured (Ta,V)(2)N. The onset of nitrogen-loss - detected by thermogravimetric analysis - is similar to 1350 degrees C. Based on our results we can conclude that the sluggish diffusion within our fcc-(Hf,Ta,Ti,V,Zr)N warrants the single-phase fcc structure up to 1300 degrees C, although ab initio based calculations would suggest the lower-entropy products [fcc-(Hf,Zr)N, fcc-(Ta,V)N, and fcc-TiN] and [fcc-(Hf,Zr)N and fcc-(Ta,Ti,V)N] to be energetically more stable up to 1302 K.
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- Kirnbauer, A., et al.
(författare)
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Thermal stability and mechanical properties of sputtered (Hf,Ta,V,W,Zr)-diborides
- 2020
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Ingår i: Acta Materialia. - : PERGAMON-ELSEVIER SCIENCE LTD. - 1359-6454 .- 1873-2453. ; 200, s. 559-569
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Tidskriftsartikel (refereegranskat)abstract
- Non-reactive magnetron sputtering of a diboride target composed of HfB2, TaB2, VB2, W2B5, and ZrB2 with equimolar composition leads to the formation of crystalline single-phase solid solution diboride thin films, (Hf,Ta,V,W,Zr)B2, with a high-entropy metal-sublattice. Their growth morphology (dense and fine- fibrous), crystal structure (AlB2-type), as well as mechanical properties (indentation modulus E of ~580 GPa and hardness H of ~45 GPa), and chemical compositions are basically independent of the substrate bias potential applied (varied between -40 and -100 V) during the deposition at 450 °C. Detailed X-ray diffraction (XRD) and atom probe tomography (APT) studies indicate that the (Hf,Ta,V,W,Zr)B2 thin films remain single-phase AlB2-structured (with randomly distributed elements at the metal-sublattice) during vacuum-annealing at temperatures up to 1200 °C. Only when increasing the annealing temperature to 1400 °C, the formation of small orthorhombic structured (V,W)B-based regions can be detected, indicating the onset of decomposition of (Hf,Ta,V,W,Zr)B2 thin films into (Hf,Ta,Zr)B2 and (V,W)B, accompanied by the formation of confined B-rich boundary regions between these phases. After annealing at 1400 °C the hardness is still very high with ~44 GPa, as the volume fraction of the newly formed (V,W)B-rich domains is small and the majority of the coating is still solid-solution (Hf,Ta,V,W,Zr)B2 with severe lattice distortions. Only at even higher Ta of 1500 and 1600 °C, H decreased to ~39 GPa.
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