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- Riazanova, Anastasia, et al.
(författare)
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Gas-assisted electron-beam-induced nanopatterning of high-quality Si-based insulator
- 2014
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Ingår i: Nanotechnology. - : IOP Publishing. - 0957-4484 .- 1361-6528. ; 25:15, s. 155301-
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Tidskriftsartikel (refereegranskat)abstract
- An oxygen-assisted electron-beam-induced deposition (EBID) process, in which an oxygen flow and the vapor phase of the precursor, tetraethyl orthosilicate (TEOS), are both mixed and delivered through a single needle, is described. The optical properties of the SiO(2+delta) (-0.04 <= delta <= +0.28) are comparable to fused silica. The electrical resistivity of both single-needle and double-needle SiO(2+delta) are comparable (greater than 7 G Omega cm) and a measured breakdown field is greater than 400 V mu m(-1). Compared to the double-needle process the advantage of the single-needle technique is the ease of alignment and the proximity to the deposition location, which facilitates fabrication of complex 3D structures for nanophotonics, photovoltaics, micro- and nano-electronics applications.
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| 3. |
- Riazanova, Anastasia, et al.
(författare)
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Pattern Shape Control for Heat Treatment Purification of Electron-Beam-Induced Deposition of Gold from the Me2Au(acac) Precursor
- 2012
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Ingår i: Langmuir. - : American Chemical Society (ACS). - 0743-7463 .- 1520-5827. ; 28:14, s. 6185-6191
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Tidskriftsartikel (refereegranskat)abstract
- Gold structures can be created in a scanning electron microscope (SEM) from the Me2Au(acac) precursor by direct writing with the electron beam. The as-deposited purity is usually poor, and a common purification approach is a post-annealing step that indeed is effective but also induces a volume reduction because of carbon loss and an undesirable reconfiguration of the gold structure, resulting in the loss of the original shape. We studied the shape change as a result of such purification, and to minimize this effect, the application of a tantalum and chromium buffer layer was investigated. These buffer materials are well-known for their good adhesion properties. We confirm by dedicated SEM, atomic force microscopy (AFM), and transmission electron microscopy (TEM) analysis that, for the creation of a uniform Au structure, tantalum is a better buffer layer material than chromium. Post-annealing of the Au electron-beam-induced deposition (EBID) patterns for 1 h at 600 degrees C in air resulted in a dramatic purity increase (from 8-12 atomic % Au to above 92 atomic % Au). The uncovered part of the tantalum layer can be easily etched away, resulting in a well-defined, high-purity, gold structure.
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