| 1. |
- Booker, Ian Don, et al.
(författare)
-
Oxidation induced ON1, ON2a/b defects in 4H-SiC characterized by DLTS
- 2014
-
Ingår i: SILICON CARBIDE AND RELATED MATERIALS 2013, PTS 1 AND 2. - : Trans Tech Publications. ; , s. 281-284
-
Konferensbidrag (refereegranskat)abstract
- The deep levels ON1 and ON2a/b introduced by oxidation into 4H-SiC are characterized via standard DLTS and via filling pulse dependent DLTS measurements. Separation of the closely spaced ON2a/b defect is achieved by using a higher resolution correlation function (Gaver-Stehfest 4) and apparent energy level, apparent electron capture cross section and filling pulse measurement derived capture cross sections are given.
|
|
| 2. |
|
|
| 3. |
- Anderson, Christopher P., et al.
(författare)
-
Electrical and optical control of single spins integrated in scalable semiconductor devices
- 2019
-
Ingår i: Science. - : AMER ASSOC ADVANCEMENT SCIENCE. - 0036-8075 .- 1095-9203. ; 366:6470, s. 1225-
-
Tidskriftsartikel (refereegranskat)abstract
- Spin defects in silicon carbide have the advantage of exceptional electron spin coherence combined with a near-infrared spin-photon interface, all in a material amenable to modern semiconductor fabrication. Leveraging these advantages, we integrated highly coherent single neutral divacancy spins in commercially available p-i-n structures and fabricated diodes to modulate the local electrical environment of the defects. These devices enable deterministic charge-state control and broad Stark-shift tuning exceeding 850 gigahertz. We show that charge depletion results in a narrowing of the optical linewidths by more than 50-fold, approaching the lifetime limit. These results demonstrate a method for mitigating the ubiquitous problem of spectral diffusion in solid-state emitters by engineering the electrical environment while using classical semiconductor devices to control scalable, spin-based quantum systems.
|
|
| 4. |
- Anderson, Christopher P., et al.
(författare)
-
Five-second coherence of a single spin with single-shot readout in silicon carbide
- 2022
-
Ingår i: Science Advances. - : American Association for the Advancement of Science (AAAS). - 2375-2548. ; 8:5
-
Tidskriftsartikel (refereegranskat)abstract
- An outstanding hurdle for defect spin qubits in silicon carbide (SiC) is single-shot readout, a deterministic measurement of the quantum state. Here, we demonstrate single-shot readout of single defects in SiC via spin-to-charge conversion, whereby the defects spin state is mapped onto a long-lived charge state. With this technique, we achieve over 80% readout fidelity without pre- or postselection, resulting in a high signal-to-noise ratio that enables us to measure long spin coherence times. Combined with pulsed dynamical decoupling sequences in an isotopically purified host material, we report single-spin T-2 > 5 seconds, over two orders of magnitude greater than previously reported in this system. The mapping of these coherent spin states onto single charges unlocks both single-shot readout for scalable quantum nodes and opportunities for electrical readout via integration with semiconductor devices.
|
|
| 5. |
- Arslan, Engin, et al.
(författare)
-
SiC Substrate Effects on Electron Transport in the Epitaxial Graphene Layer
- 2014
-
Ingår i: ELECTRONIC MATERIALS LETTERS. - : Springer Science and Business Media. - 1738-8090 .- 2093-6788. ; 10:2, s. 387-391
-
Tidskriftsartikel (refereegranskat)abstract
- Hall effect measurements on epitaxial graphene (EG) on SiC substrate have been carried out as a function of temperature. The mobility and concentration of electrons within the two-dimensional electron gas (2DEG) at the EG layers and within the underlying SiC substrate are readily separated and characterized by the simple parallel conduction extraction method (SPCEM). Two electron carriers are identified in the EG/SiC sample: one high-mobility carrier (3493 cm(2)/Vs at 300 K) and one low-mobility carrier (1115 cm(2)/Vs at 300 K). The high mobility carrier can be assigned to the graphene layers. The second carrier has been assigned to the SiC substrate.
|
|
| 6. |
- Astner, Thomas, et al.
(författare)
-
Vanadium in silicon carbide: telecom-ready spin centres with long relaxation lifetimes and hyperfine-resolved optical transitions
- 2024
-
Ingår i: QUANTUM SCIENCE AND TECHNOLOGY. - : IOP Publishing Ltd. - 2058-9565. ; 9:3
-
Tidskriftsartikel (refereegranskat)abstract
- Vanadium in silicon carbide (SiC) is emerging as an important candidate system for quantum technology due to its optical transitions in the telecom wavelength range. However, several key characteristics of this defect family including their spin relaxation lifetime (T1), charge state dynamics, and level structure are not fully understood. In this work, we determine the T1 of an ensemble of vanadium defects, demonstrating that it can be greatly enhanced at low temperature. We observe a large spin contrast exceeding 90% and long spin-relaxation times of up to 25 s at 100 mK, and of order 1 s at 1.3 K. These measurements are complemented by a characterization of the ensemble charge state dynamics. The stable electron spin furthermore enables high-resolution characterization of the systems' hyperfine level structure via two-photon magneto-spectroscopy. The acquired insights point towards high-performance spin-photon interfaces based on vanadium in SiC.
|
|
| 7. |
- Ayedh, H. M., et al.
(författare)
-
Controlling the carbon vacancy in 4H-SiC by thermal processing
- 2018
-
Ingår i: ECS Transactions. - : Electrochemical Society Inc.. - 1938-6737 .- 1938-5862. ; , s. 91-97
-
Konferensbidrag (refereegranskat)abstract
- The carbon vacancy (Vc) is perhaps the most prominent point defect in silicon carbide (SiC) and it is an efficient charge carrier lifetime killer in high-purity epitaxial layers of 4H-SÌC. The Vc concentration needs to be controlled and minimized for optimum materials and device performance, and an approach based on post-growth thermal processing under C-rich ambient conditions is presented. It utilizes thermodynamic equilibration and after heat treatment at 1500 °C for 1 h, the Vc concentration is shown to be reduced by a factor-25 relative to that in as-grown state-of-the-art epi-layers. Concurrently, a considerable enhancement of the carrier lifetime occurs throughout the whole of >40 urn thick epi-layers.
|
|
| 8. |
- Babin, Charles, et al.
(författare)
-
Fabrication and nanophotonic waveguide integration of silicon carbide colour centres with preserved spin-optical coherence
- 2022
-
Ingår i: Nature Materials. - : NATURE PORTFOLIO. - 1476-1122 .- 1476-4660. ; 21, s. 67-73
-
Tidskriftsartikel (refereegranskat)abstract
- Colour centres are a promising quantum information platform, but coherence degradation after integration in nanostructures has hindered scalability. Here, the authors show that waveguide-integrated V-Si centres in SiC maintain spin-optical coherences, enabling nuclear high-fidelity spin qubit operations. Optically addressable spin defects in silicon carbide (SiC) are an emerging platform for quantum information processing compatible with nanofabrication processes and device control used by the semiconductor industry. System scalability towards large-scale quantum networks demands integration into nanophotonic structures with efficient spin-photon interfaces. However, degradation of the spin-optical coherence after integration in nanophotonic structures has hindered the potential of most colour centre platforms. Here, we demonstrate the implantation of silicon vacancy centres (V-Si) in SiC without deterioration of their intrinsic spin-optical properties. In particular, we show nearly lifetime-limited photon emission and high spin-coherence times for single defects implanted in bulk as well as in nanophotonic waveguides created by reactive ion etching. Furthermore, we take advantage of the high spin-optical coherences of V-Si centres in waveguides to demonstrate controlled operations on nearby nuclear spin qubits, which is a crucial step towards fault-tolerant quantum information distribution based on cavity quantum electrodynamics.
|
|
| 9. |
- Bathen, M. E., et al.
(författare)
-
Anisotropic and plane-selective migration of the carbon vacancy in SiC : Theory and experiment
- 2019
-
Ingår i: Physical Review B. - : American Physical Society. - 2469-9950 .- 2469-9969. ; 100:1
-
Tidskriftsartikel (refereegranskat)abstract
- We investigate the migration mechanism of the carbon vacancy (VC) in silicon carbide (SiC) using a combination of theoretical and experimental methodologies. The VC, commonly present even in state-of-the-art epitaxial SiC material, is known to be a carrier lifetime killer and therefore strongly detrimental to device performance. The desire for VC removal has prompted extensive investigations involving its stability and reactivity. Despite suggestions from theory that VC migrates exclusively on the C sublattice via vacancy-atom exchange, experimental support for such a picture is still unavailable. Moreover, the existence of two inequivalent locations for the vacancy in 4H-SiC [hexagonal, VC(h), and pseudocubic, VC(k)] and their consequences for VC migration have not been considered so far. The first part of the paper presents a theoretical study of VC migration in 3C- and 4H-SiC. We employ a combination of nudged elastic band (NEB) and dimer methods to identify the migration mechanisms, transition state geometries, and respective energy barriers for VC migration. In 3C-SiC, VC is found to migrate with an activation energy of EA=4.0 eV. In 4H-SiC, on the other hand, we anticipate that VC migration is both anisotropic and basal-plane selective. The consequence of these effects is a slower diffusivity along the axial direction, with a predicted activation energy of EA=4.2 eV, and a striking preference for basal migration within the h plane with a barrier of EA=3.7 eV, to the detriment of the k-basal plane. Both effects are rationalized in terms of coordination and bond angle changes near the transition state. In the second part, we provide experimental data that corroborates the above theoretical picture. Anisotropic migration of VC in 4H-SiC is demonstrated by deep level transient spectroscopy (DLTS) depth profiling of the Z1/2 electron trap in annealed samples that were subject to ion implantation. Activation energies of EA=(4.4±0.3) eV and EA=(3.6±0.3) eV were found for VC migration along the c and a directions, respectively, in excellent agreement with the analogous theoretical values. The corresponding prefactors of D0=0.54cm2/s and 0.017cm2/s are in line with a simple jump process, as expected for a primary vacancy point defect.
|
|
| 10. |
- Bathen, Marianne Etzelmueller, et al.
(författare)
-
Dual configuration of shallow acceptor levels in 4H-SiC
- 2024
-
Ingår i: Materials Science in Semiconductor Processing. - : ELSEVIER SCI LTD. - 1369-8001 .- 1873-4081. ; 177
-
Tidskriftsartikel (refereegranskat)abstract
- Acceptor dopants in 4H-SiC exhibit energy levels that are located deeper in the band gap than the thermal energy at room temperature (RT), resulting in incomplete ionization at RT. Therefore, a comprehensive understanding of the defect energetics and how the impurities are introduced into the material is imperative. Herein, we study impurity related defect levels in 4H-SiC epitaxial layers (epi-layers) grown by chemical vapor deposition (CVD) under various conditions using minority carrier transient spectroscopy (MCTS). We find two trap levels assigned to boron impurities, B and D, which are introduced to varying degrees depending on the growth conditions. A second acceptor level that was labeled X in the literature and attributed to impurity related defects is also observed. Importantly, both the B and X levels exhibit fine structure revealed by MCTS measurements. We attribute the fine structure to acceptor impurities at hexagonal and pseudo -cubic lattice sites in 4H-SiC, and tentatively assign the X peak to Al based on experimental findings and density functional theory calculations.
|
|
| 11. |
- Bathen, M. E., et al.
(författare)
-
Influence of carbon cap on self-diffusion in silicon carbide
- 2020
-
Ingår i: Crystals. - : MDPI AG. - 2073-4352. ; 10:9, s. 1-11
-
Tidskriftsartikel (refereegranskat)abstract
- Self-diffusion of carbon (12C and13C) and silicon (28Si and30Si) in 4H silicon carbide has been investigated by utilizing a structure containing an isotope purified 4H-28Si12C epitaxial layer grown on an n-type (0001) 4H-SiC substrate, and finally covered by a carbon capping layer (C-cap). The13C and30Si isotope profiles were monitored using secondary ion mass spectrometry (SIMS) following successive heat treatments performed at 2300–2450◦C in Ar atmosphere using an inductively heated furnace. The30Si profiles show little redistribution within the studied temperature range, with the extracted diffusion lengths for Si being within the error bar for surface roughening during annealing, as determined by profilometer measurements. On the other hand, a significant diffusion of13C was observed into the isotope purified layer from both the substrate and the C-cap. A diffusivity of D = 8.3 × 106 e−10.4/kBT cm2/s for13C was extracted, in contrast to previous findings that yielded lower both pre-factors and activation energies for C self-diffusion in SiC. The discrepancy between the present measurements and previous theoretical and experimental works is ascribed to the presence of the C-cap, which is responsible for continuous injection of C interstitials during annealing, and thereby suppressing the vacancy mediated diffusion.
|
|
| 12. |
- Bergman, Peder, 1961-, et al.
(författare)
-
Improved SiC Epitaxial Material for Bipolar Applications
- 2008
-
Ingår i: Proc. of MRS Spring Meeting 2008. ; , s. D05-
-
Konferensbidrag (refereegranskat)abstract
- Epitaxial growth on Si-face nominally on-axis 4H-SiC substrates has been performed using horizontal Hot-wall chemical vapor deposition system. The formation of 3C inclusions is one of the main problem with growth on on-axis Si-face substrates. In situ surface preparation, starting growth parameters and growth temperature are found to play a vital role in the epilayer polytype stability. High quality epilayers with 100% 4H-SiC were obtained on full 2″ substrates. Different optical and structural techniques were used to characterize the material and to understand the growth mechanisms. It was found that the replication of the basal plane dislocation from the substrate into the epilayer can be eliminated through growth on on-axis substrates. Also, no other kind of structural defects were found in the grown epilayers. These layers have also been processed for simple PiN structures to observe any bipolar degradation. More than 70% of the diodes showed no forward voltage drift during 30 min operation at 100 A/cm2.
|
|
| 13. |
- Bernardin, Evans, et al.
(författare)
-
Development of an all-SiC neuronal interface device
- 2016
-
Ingår i: MRS Advances. - : Cambridge University Press. - 2059-8521. ; 1:55, s. 3679-3684
-
Tidskriftsartikel (refereegranskat)abstract
- The intracortical neural interface (INI) is a key component of brain machine interfaces (BMI) which offer the possibility to restore functions lost by patients due to severe trauma to the central or peripheral nervous system. Unfortunately today’s neural electrodes suffer from a variety of design flaws, mainly the use of non-biocompatible materials based on Si or W with polymer coatings to mask the underlying material. Silicon carbide (SiC) is a semiconductor that has been proven to be highly biocompatible, and this chemically inert, physically robust material system may provide the longevity and reliability needed for the INI community. The design, fabrication, and preliminary testing of a prototype all-SiC planar microelectrode array based on 4H-SiC with an amorphous silicon carbide (a-SiC) insulator is described. The fabrication of the planar microelectrode was performed utilizing a series of conventional micromachining steps. Preliminary data is presented which shows a proof of concept for an all-SiC microelectrode device.
|
|
| 14. |
|
|
| 15. |
- Bernardin, Evans K., et al.
(författare)
-
Demonstration of a Robust All-Silicon-Carbide Intracortical Neural Interface
- 2018
-
Ingår i: Micromachines. - : MDPI. - 2072-666X. ; 9:8
-
Tidskriftsartikel (refereegranskat)abstract
- Intracortical neural interfaces (INI) have made impressive progress in recent years but still display questionable long-term reliability. Here, we report on the development and characterization of highly resilient monolithic silicon carbide (SiC) neural devices. SiC is a physically robust, biocompatible, and chemically inert semiconductor. The device support was micromachined from p-type SiC with conductors created from n-type SiC, simultaneously providing electrical isolation through the resulting p-n junction. Electrodes possessed geometric surface area (GSA) varying from 496 to 500 K m(2). Electrical characterization showed high-performance p-n diode behavior, with typical turn-on voltages of 2.3 V and reverse bias leakage below 1 nArms. Current leakage between adjacent electrodes was 7.5 nArms over a voltage range of -50 V to 50 V. The devices interacted electrochemically with a purely capacitive relationship at frequencies less than 10 kHz. Electrode impedance ranged from 675 +/- 130 k (GSA = 496 mu m(2)) to 46.5 +/- 4.80 k (GSA = 500 K mu m(2)). Since the all-SiC devices rely on the integration of only robust and highly compatible SiC material, they offer a promising solution to probe delamination and biological rejection associated with the use of multiple materials used in many current INI devices.
|
|
| 16. |
- Booker, Ian Don, et al.
(författare)
-
Carrier Lifetime Controlling Defects Z(1/2) and RB1 in Standard and Chlorinated Chemistry Grown 4H-SiC
- 2014
-
Ingår i: Crystal Growth & Design. - : American Chemical Society (ACS). - 1528-7483 .- 1528-7505. ; 14:8, s. 4104-4110
-
Tidskriftsartikel (refereegranskat)abstract
- 4H-SiC epilayers grown by standard and chlorinated chemistry were analyzed for their minority carrier lifetime and deep level recombination centers using time-resolved photoluminescence (TRPL) and standard deep level transient spectroscopy (DLTS). Next to the well-known Z(1/2) deep level a second effective lifetime killer, RB1 (activation energy 1.05 eV, electron capture cross section 2 x 10(-16) cm(2), suggested hole capture cross section (5 +/- 2) x 10(-15) cm(2)), is detected in chloride chemistry grown epilayers. Junction-DLTS and bulk recombination simulations are used to confirm the lifetime killing properties of this level. The measured RB1 concentration appears to be a function of the iron-related Fe1 level concentration, which is unintentionally introduced via the corrosion of reactor steel parts by the chlorinated chemistry. Reactor design and the growth zone temperature profile are thought to enable the formation of RB1 in the presence of iron contamination under conditions otherwise optimal for growth of material with very low Z(1/2) concentrations. The RB1 defect is either an intrinsic defect similar to RD1/2 or EH5 or a complex involving iron. Control of these corrosion issues allows the growth of material at a high growth rate and with high minority carrier lifetime based on Z(1/2) as the only bulk recombination center.
|
|
| 17. |
- Booker, Ian D., et al.
(författare)
-
Chloride-based SiC growth on a-axis 4H-€“SiC substrates
- 2016
-
Ingår i: Physica. B, Condensed matter. - : Elsevier. - 0921-4526 .- 1873-2135. ; 480, s. 23-25
-
Tidskriftsartikel (refereegranskat)abstract
- Abstract SiC has, during the last few years, become increasingly important as a power-device material for high voltage applications. The thick, low-doped voltage-supporting epitaxial layer is normally grown by CVD on 4° off-cut 4H–SiC substrates at a growth rate of 5 – 10 Ό m / h using silane (SiH4) and propane (C3H8) or ethylene (C2H4) as precursors. The concentrations of epitaxial defects and dislocations depend to a large extent on the underlying substrate but can also be influenced by the actual epitaxial growth process. Here we will present a study on the properties of the epitaxial layers grown by a Cl-based technique on an a-axis (90° off-cut from c-direction) 4H–SiC substrate.
|
|
| 18. |
- Bosma, Tom, et al.
(författare)
-
Broadband single-mode planar waveguides in monolithic 4H-SiC
- 2022
-
Ingår i: Journal of Applied Physics. - : AIP Publishing. - 0021-8979 .- 1089-7550. ; 131:2
-
Tidskriftsartikel (refereegranskat)abstract
- Color-center defects in silicon carbide promise opto-electronic quantum applications in several fields, such as computing, sensing, and communication. In order to scale down and combine these functionalities with the existing silicon device platforms, it is crucial to consider SiC integrated optics. In recent years, many examples of SiC photonic platforms have been shown, like photonic crystal cavities, film-on-insulator waveguides, and micro-ring resonators. However, all these examples rely on separating thin films of SiC from substrate wafers. This introduces significant surface roughness, strain, and defects in the material, which greatly affects the homogeneity of the optical properties of color centers. Here, we present and test a method for fabricating monolithic single-crystal integrated-photonic devices in SiC: tuning optical properties via charge carrier concentration. We fabricated monolithic SiC n-i-n and p-i-n junctions where the intrinsic layer acts as waveguide core, and demonstrate the waveguide functionality for these samples. The propagation losses are below 14 dB/cm. These waveguide types allow for addressing color centers over a broad wavelength range with low strain-induced inhomogeneity of the optical-transition frequencies. Furthermore, we expect that our findings open the road to fabricating waveguides and devices based on p-i-n junctions, which will allow for integrated electrostatic and radio frequency control together with high-intensity optical control of defects in silicon carbide.
|
|
| 19. |
- Bourassa, Alexandre, et al.
(författare)
-
Entanglement and control of single nuclear spins in isotopically engineered silicon carbide
- 2020
-
Ingår i: Nature Materials. - : NATURE RESEARCH. - 1476-1122 .- 1476-4660. ; 19:12, s. 1319-1325
-
Tidskriftsartikel (refereegranskat)abstract
- Isotope engineering of silicon carbide leads to control of nuclear spins associated with single divacancy centres and extended electron spin coherence. Nuclear spins in the solid state are both a cause of decoherence and a valuable resource for spin qubits. In this work, we demonstrate control of isolated(29)Si nuclear spins in silicon carbide (SiC) to create an entangled state between an optically active divacancy spin and a strongly coupled nuclear register. We then show how isotopic engineering of SiC unlocks control of single weakly coupled nuclear spins and present an ab initio method to predict the optimal isotopic fraction that maximizes the number of usable nuclear memories. We bolster these results by reporting high-fidelity electron spin control (F = 99.984(1)%), alongside extended coherence times (Hahn-echoT(2) = 2.3 ms, dynamical decouplingT(2)(DD) > 14.5 ms), and a >40-fold increase in Ramsey spin dephasing time (T-2*) from isotopic purification. Overall, this work underlines the importance of controlling the nuclear environment in solid-state systems and links single photon emitters with nuclear registers in an industrially scalable material.
|
|
| 20. |
- Brosselard, P., et al.
(författare)
-
3.3 kV-10A 4H-SiC PiN diodes
- 2009
-
Ingår i: Materials Science Forum, Vols. 600-603. - : Trans Tech Publ.. ; , s. 991-994
-
Konferensbidrag (refereegranskat)abstract
- An innovative process has been developed by Linköping University to prepare the 4HSiC substrate surface before epitaxial growth. The processed PiN diodes have been characterized in forward and reverse mode at different temperature. The larger diodes (2.56 mm2) have a very low leakage current around 20 nA @ 500V for temperatures up to 300°C. A performant yield (68%) was obtained on these larger diodes have a breakdown voltage superior to 500V. Electroluminescence characteristics have been done on these devices and they show that there is no generation of Stacking Faults during the bipolar conduction.
|
|
| 21. |
- Brosselard, P, et al.
(författare)
-
Low loss, large area 4.5 kV 4H-SiC PIN diodes with reduced forward voltage drift
- 2009
-
Ingår i: SEMICONDUCTOR SCIENCE AND TECHNOLOGY. - : IOP Publishing. - 0268-1242 .- 1361-6641. ; 24:9, s. 095004-
-
Tidskriftsartikel (refereegranskat)abstract
- 4H-SiC PIN diodes have been fabricated on a Norstel P+/N/N+ substrate with a combination of Mesa and JTE as edge termination. A breakdown voltage of 4.5 kV has been measured at 1 mu A for devices with an active area of 2.6 mm(2). The differential on-resistance at 15 A (600 A cm(-2)) was of only 1.7 m Omega cm(2) (25 degrees C) and 1.9 m Omega cm(2) at 300 degrees C. The reduced recovery charge was of 300 nC for a switched current of 15 A (500 V) at 300 degrees C. 20% of the diodes showed no degradation at all after 60 h of dc stress (25-225 degrees C). Other 30% of the diodes exhibit a reduced voltage shift below 1 V. For those diodes, the leakage current remains unaffected after the dc stress. Electroluminescence investigations reveal a very low density of stacking faults after the dc stress. The manufacturing yield evidences the efficiency of the substrate surface preparation and our technological process.
|
|
| 22. |
|
|
| 23. |
- Christle, David J., et al.
(författare)
-
Isolated electron spins in silicon carbide with millisecond coherence times
- 2015
-
Ingår i: Nature Materials. - : Nature Publishing Group. - 1476-1122 .- 1476-4660. ; 14:2, s. 160-163
-
Tidskriftsartikel (refereegranskat)abstract
- The elimination of defects from SiC has facilitated its move to the forefront of the optoelectronics and power-electronics industries(1). Nonetheless, because certain SiC defects have electronic states with sharp optical and spin transitions, they are increasingly recognized as a platform for quantum information and nanoscale sensing(2-16). Here, we show that individual electron spins in high-purity monocrystalline 4H-SiC can be isolated and coherently controlled. Bound to neutral divacancy defects(2,3), these states exhibit exceptionally long ensemble Hahn-echo spin coherence times, exceeding 1 ms. Coherent control of single spins in a material amenable to advanced growth and microfabrication techniques is an exciting route towards wafer-scale quantum technologies.
|
|
| 24. |
- Christle, David J., et al.
(författare)
-
Isolated Spin Qubits in SiC with a High-Fidelity Infrared Spin-to-Photon Interface
- 2017
-
Ingår i: Physical Review X. - : AMER PHYSICAL SOC. - 2160-3308. ; 7:2
-
Tidskriftsartikel (refereegranskat)abstract
- The divacancies in SiC are a family of paramagnetic defects that show promise for quantum communication technologies due to their long-lived electron spin coherence and their optical addressability at near-telecom wavelengths. Nonetheless, a high-fidelity spin-photon interface, which is a crucial prerequisite for such technologies, has not yet been demonstrated. Here, we demonstrate that such an interface exists in isolated divacancies in epitaxial films of 3C-SiC and 4H-SiC. Our data show that divacancies in 4H-SiC have minimal undesirable spin mixing, and that the optical linewidths in our current sample are already similar to those of recent remote entanglement demonstrations in other systems. Moreover, we find that 3C-SiC divacancies have a millisecond Hahn-echo spin coherence time, which is among the longest measured in a naturally isotopic solid. The presence of defects with these properties in a commercial semiconductor that can be heteroepitaxially grown as a thin film on Si shows promise for future quantum networks based on SiC defects.
|
|
| 25. |
- Ciechonski, Rafal, et al.
(författare)
-
Structural instabilities in growth of SiC crystals
- 2005
-
Ingår i: Journal of Crystal Growth. - : Elsevier BV. - 0022-0248. ; 275:1-2, s. e461-e466
-
Tidskriftsartikel (refereegranskat)abstract
- Misoriented grains, which may occur on the growth front of 6H–SiC boules have been studied in relation to their appearance during sublimation growth. The effect was obtained by applying growth conditions at which the source powder was gradually approaching graphitisation and the vapour becoming C-rich. The high off-orientation of the grains is demonstrated through etching in molten KOH and transmission light optical microscopy. Micropipes propagating in the single crystal area and facing the misoriented grain have been studied, and it is shown that they may either be terminated at the grain or their propagation is altered to be parallel with the grain boundary. It has been found that the polytype of the grains may switch from 6H to 4H, which is explained by the change of the Si/C ratio in the vapour.
|
|
| 26. |
- Cilibrizzi, Pasquale, et al.
(författare)
-
Ultra-narrow inhomogeneous spectral distribution of telecom-wavelength vanadium centres in isotopically-enriched silicon carbide
- 2023
-
Ingår i: Nature Communications. - : NATURE PORTFOLIO. - 2041-1723. ; 14:1
-
Tidskriftsartikel (refereegranskat)abstract
- Spin-active quantum emitters have emerged as a leading platform for quantum technologies. However, one of their major limitations is the large spread in optical emission frequencies, which typically extends over tens of GHz. Here, we investigate single V4+ vanadium centres in 4H-SiC, which feature telecom-wavelength emission and a coherent S = 1/2 spin state. We perform spectroscopy on single emitters and report the observation of spin-dependent optical transitions, a key requirement for spin-photon interfaces. By engineering the isotopic composition of the SiC matrix, we reduce the inhomogeneous spectral distribution of different emitters down to 100 MHz, significantly smaller than any other single quantum emitter. Additionally, we tailor the dopant concentration to stabilise the telecom-wavelength V4+ charge state, thereby extending its lifetime by at least two orders of magnitude. These results bolster the prospects for single V emitters in SiC as material nodes in scalable telecom quantum networks. Several solid-state defect platforms have been proposed for application as a spin-photon interface in quantum communication networks. Here the authors report spin-selective optical transitions and narrow inhomogeneous spectral distribution of V centers in isotopically-enriched SiC emitting in the telecom O-band.
|
|
| 27. |
- Civrac, Gabriel, et al.
(författare)
-
600 V PiN diodes fabricated using on-axis 4H silicon carbide
- 2012
-
Ingår i: Materials Science Forum Vol 717 - 720. - : Trans Tech Publications Inc.. ; , s. 969-972
-
Konferensbidrag (refereegranskat)abstract
- This paper reports the fabrication and electrical characterization of PiN diodes on an on-axis grown epitaxial layer. TCAD simulations have been performed in order to design their architecture. Some of these diodes have a breakdown voltage around 600 V. A comparison is made with similar diodes fabricated on off-cut grown layers. Computer simulations are used to explain lower breakdown voltages than those expected.
|
|
| 28. |
- de las Casas, Charles F., et al.
(författare)
-
Stark tuning and electrical charge state control of single divacancies in silicon carbide
- 2017
-
Ingår i: Applied Physics Letters. - : AMER INST PHYSICS. - 0003-6951 .- 1077-3118. ; 111:26
-
Tidskriftsartikel (refereegranskat)abstract
- Neutrally charged divacancies in silicon carbide (SiC) are paramagnetic color centers whose long coherence times and near-telecom operating wavelengths make them promising for scalable quantum communication technologies compatible with existing fiber optic networks. However, local strain inhomogeneity can randomly perturb their optical transition frequencies, which degrades the indistinguishability of photons emitted from separate defects and hinders their coupling to optical cavities. Here, we show that electric fields can be used to tune the optical transition frequencies of single neutral divacancy defects in 4H-SiC over a range of several GHz via the DC Stark effect. The same technique can also control the charge state of the defect on microsecond timescales, which we use to stabilize unstable or non-neutral divacancies into their neutral charge state. Using fluorescence-based charge state detection, we show that both 975 nm and 1130 nm excitation can prepare their neutral charge state with near unity efficiency. (C) 2017 Author(s). All article content, except where otherwise noted, is licensed under a Creative Commons Attribution (CC BY) license (http://creativecommons. org/licenses/by/4.0/).
|
|
| 29. |
- Frewin, Christopher L., et al.
(författare)
-
Silicon Carbide As a Robust Neural Interface (Invited)
- 2016
-
Ingår i: GALLIUM NITRIDE AND SILICON CARBIDE POWER TECHNOLOGIES 6. - : ELECTROCHEMICAL SOC INC. - 9781607687290 ; , s. 39-45
-
Konferensbidrag (refereegranskat)abstract
- The intracortical neural interface (INI) could be a key component of brain machine interfaces (BMI), devices which offer the possibility of restored physiological neurological functionality for patients suffering from severe trauma to the central or peripheral nervous system. Unfortunately the main components of the INI, microelectrodes, have not shown appropriate long-term reliability due to multiple biological, material, and mechanical issues. Silicon carbide (SiC) is a semiconductor that is completely chemically inert within the physiological environment and can be micromachined using the same methods as with Si microdevices. We are proposing that a SiC material system may provide the improved longevity and reliability for INI devices. The design, fabrication, and preliminary electrical and electrochemical testing of an all-SiC prototype microelectrode array based on 4H-SiC, with an amorphous silicon carbide (a-SiC) insulator, is described. The fabrication of the planar microelectrode was performed utilizing a series of conventional micromachining steps. Preliminary electrochemical data are presented which show that these prototype electrodes display suitable performance.
|
|
| 30. |
- Ghezellou, Misagh, 1988-, et al.
(författare)
-
Influence of Different Hydrocarbons on Chemical Vapor Deposition Growth and Surface Morphological Defects in 4H‐SiC Epitaxial Layers
- 2024
-
Ingår i: Physica status solidi. B, Basic research. - : WILEY-V C H VERLAG GMBH. - 0370-1972 .- 1521-3951.
-
Tidskriftsartikel (refereegranskat)abstract
- Controlled epitaxial growth of 4H-SiC is essential for advancing both power electronics and quantum technologies. This study explores how different carbon sources—methane and propane—affect the surface morphology of these epitaxial layers. By varying C/Si ratios and using the two mentioned hydrocarbons as the carbon source in chloride-based epitaxial growth of 4H-SiC layers, it is unveiled that methane results in an exceptionally smooth surface. However, it pronounces surface irregularities such as short step bunching and dislocation-related etch pits. Moreover, methane amplifies the overgrowth of triangular defects with the 4H polytype. In contrast, the introduction of propane causes a step-bunched surface together with inclined line-like surface morphological defects. Notably, a majority of the triangular defects exhibit a pure 3C character without an overgrown 4H polytype. It is shown that these outcomes could be attributed to different sticking coefficients and diffusivity of the molecular species resulting from different carbon sources on the 4H-SiC surface during the epitaxial growth. This research also uncovers the underlying origins and mechanisms responsible for various surface morphological defects.
|
|
| 31. |
- Ghezellou, Misagh, 1988-, et al.
(författare)
-
The role of boron related defects in limiting charge carrier lifetime in 4H–SiC epitaxial layers
- 2023
-
Ingår i: APL Materials. - : American Institute of Physics (AIP). - 2166-532X. ; 11:3
-
Tidskriftsartikel (refereegranskat)abstract
- One of the main challenges in realizing 4H–SiC (silicon carbide)-based bipolar devices is the improvement of minority carrier lifetime in as-grown epitaxial layers. Although Z1/2 has been identified as the dominant carrier lifetime limiting defect, we report on B-related centers being another dominant source of recombination and acting as lifetime limiting defects in 4H–SiC epitaxial layers. Combining time-resolved photoluminescence (TRPL) measurement in near band edge emission and 530 nm, deep level transient spectroscopy, and minority carrier transient spectroscopy (MCTS), it was found that B related deep levels in the lower half of the bandgap are responsible for killing the minority carriers in n-type, 4H–SiC epitaxial layers when the concentration of Z1/2 is already low. The impact of these centers on the charge carrier dynamics is investigated by correlating the MCTS results with temperature-dependent TRPL decay measurements. It is shown that the influence of shallow B acceptors on the minority carrier lifetime becomes neutralized at temperatures above ∼422 K. Instead, the deep B related acceptor level, known as the D-center, remains active until temperatures above ∼570 K. Moreover, a correlation between the deep level concentrations, minority carrier lifetimes, and growth parameters indicates that intentional nitrogen doping hinders the formation of deep B acceptor levels. Furthermore, tuning growth parameters, including growth temperature and C/Si ratio, is shown to be crucial for improving the minority carrier lifetime in as-grown 4H–SiC epitaxial layers.
|
|
| 32. |
- Gogova, Daniela, et al.
(författare)
-
Epitaxial growth of β -Ga 2 O 3 by hot-wall MOCVD
- 2022
-
Ingår i: AIP Advances. - : AIP Publishing. - 2158-3226. ; 12:5, s. 055022-055022
-
Tidskriftsartikel (refereegranskat)abstract
- The hot-wall metalorganic chemical vapor deposition (MOCVD) concept, previously shown to enable superior material quality and highperformance devices based on wide bandgap semiconductors, such as Ga(Al)N and SiC, has been applied to the epitaxial growth ofβ-Ga2O3. Epitaxial β-Ga2O3 layers at high growth rates (above 1 μm/h), at low reagent flows, and at reduced growth temperatures(740 ○C) are demonstrated. A high crystalline quality epitaxial material on a c-plane sapphire substrate is attained as corroborated by a combination of x-ray diffraction, high-resolution scanning transmission electron microscopy, and spectroscopic ellipsometry measurements. Thehot-wall MOCVD process is transferred to homoepitaxy, and single-crystalline homoepitaxial β-Ga2O3 layers are demonstrated with a 201 ¯rocking curve width of 118 arc sec, which is comparable to those of the edge-defined film-fed grown (201) ¯ β-Ga2O3 substrates, indicative ofsimilar dislocation densities for epilayers and substrates. Hence, hot-wall MOCVD is proposed as a prospective growth method to be furtherexplored for the fabrication of β-Ga2O3
|
|
| 33. |
- Gogova, Daniela, 1967-, et al.
(författare)
-
Epitaxial growth of β-Ga2O3 by hot-wall MOCVD
- 2022
-
Ingår i: AIP Advances. - : AIP Publishing. - 2158-3226. ; 12:5
-
Tidskriftsartikel (refereegranskat)abstract
- The hot-wall metalorganic chemical vapor deposition (MOCVD) concept, previously shown to enable superior material quality and high performance devices based on wide bandgap semiconductors, such as Ga(Al)N and SiC, has been applied to the epitaxial growth of beta-Ga2O3. Epitaxial beta-Ga2O3 layers at high growth rates (above 1 mu m/h), at low reagent flows, and at reduced growth temperatures (740 degrees C) are demonstrated. A high crystalline quality epitaxial material on a c-plane sapphire substrate is attained as corroborated by a combination of x-ray diffraction, high-resolution scanning transmission electron microscopy, and spectroscopic ellipsometry measurements. The hot-wall MOCVD process is transferred to homoepitaxy, and single-crystalline homoepitaxial beta-Ga2O3 layers are demonstrated with a 201 rocking curve width of 118 arc sec, which is comparable to those of the edge-defined film-fed grown (201) beta-Ga2O3 substrates, indicative of similar dislocation densities for epilayers and substrates. Hence, hot-wall MOCVD is proposed as a prospective growth method to be further explored for the fabrication of beta-Ga2O3.
|
|
| 34. |
|
|
| 35. |
- Heiler, Jonah, et al.
(författare)
-
Spectral stability of V2 centres in sub-micron 4H-SiC membranes
- 2024
-
Ingår i: NPJ QUANTUM MATERIALS. - : NATURE PORTFOLIO. - 2397-4648. ; 9:1
-
Tidskriftsartikel (refereegranskat)abstract
- Colour centres in silicon carbide emerge as a promising semiconductor quantum technology platform with excellent spin-optical coherences. However, recent efforts towards maximising the photonic efficiency via integration into nanophotonic structures proved to be challenging due to reduced spectral stabilities. Here, we provide a large-scale systematic investigation on silicon vacancy centres in thin silicon carbide membranes with thicknesses down to 0.25 mu m. Our membrane fabrication process involves a combination of chemical mechanical polishing, reactive ion etching, and subsequent annealing. This leads to highly reproducible membranes with roughness values of 3-4 A, as well as negligible surface fluorescence. We find that silicon vacancy centres show close-to lifetime limited optical linewidths with almost no signs of spectral wandering down to membrane thicknesses of similar to 0.7 mu m. For silicon vacancy centres in thinner membranes down to 0.25 mu m, we observe spectral wandering, however, optical linewidths remain below 200 MHz, which is compatible with spin-selective excitation schemes. Our work clearly shows that silicon vacancy centres can be integrated into sub-micron silicon carbide membranes, which opens the avenue towards obtaining the necessary improvements in photon extraction efficiency based on nanophotonic structuring.
|
|
| 36. |
- Henry, Anne, et al.
(författare)
-
Epitaxial growth on on-axis substrates
- 2012
-
Ingår i: Silicon Carbide Epitaxy. - Kerala, India : Research Signpost. - 9788130805009 ; , s. 97-119
-
Bokkapitel (refereegranskat)abstract
- SiC epitaxial growth using the Chemical Vapour Deposition (CVD) technique on nominally on-axis substrate is presented. Both standard and chloride-based chemistry have been used with the aim to obtain high quality layers suitable for device fabrication. Both homoepitaxy (4H on 4H) and heteroepitaxy (3C on hexag onal substrate) are addressed.
|
|
| 37. |
- Henry, Anne, 1959-, et al.
(författare)
-
Thick epilayers for power devices
- 2007
-
Ingår i: Materials Science Forum, vol. 556-557. - : Trans Tech Publications. ; , s. 47-
-
Konferensbidrag (refereegranskat)abstract
- Growth of thick epitaxial SiC layers needed for high power devices is presented for horizontal hot-wall CVD (HWCVD) reactors. We demonstrate thickness of epilayer of 100 μm and more with good morphology, low-doping with no doping variation through the whole thick layer and reasonable carrier lifetime which mainly depends on the substrate quality. Typical epidefects are described and their density can dramatically be reduced when choosing correctly the growth conditions as well as the polishing of the surface prior to the growth. The control of the doping and thickness uniformities as well as the run-to-run reproducibility is also presented. Various characterization techniques such as optical microscopy, AFM, reflectance, CV, PL and minority carrier lifetime have been used. Results of high-voltage SiC Schottky power devices are presented.
|
|
| 38. |
|
|
| 39. |
- Hesselmeier, Erik, et al.
(författare)
-
Qudit-Based Spectroscopy for Measurement and Control of Nuclear-Spin Qubits in Silicon Carbide
- 2024
-
Ingår i: Physical Review Letters. - : American Physical Society. - 0031-9007 .- 1079-7114. ; 132:9
-
Tidskriftsartikel (refereegranskat)abstract
- Nuclear spins with hyperfine coupling to single electron spins are highly valuable quantum bits. Here we probe and characterize the particularly rich nuclear-spin environment around single silicon vacancy color centers (V2) in 4H-SiC. By using the electron spin-3/2 qudit as a four level sensor, we identify several sets of Si29 and C13 nuclear spins through their hyperfine interaction. We extract the major components of their hyperfine coupling via optical detected nuclear magnetic resonance, and assign them to shells in the crystal via the density function theory simulations. We utilize the ground-state level anticrossing of the electron spin for dynamic nuclear polarization and achieve a nuclear-spin polarization of up to 98±6%. We show that this scheme can be used to detect the nuclear magnetic resonance signal of individual spins and demonstrate their coherent control. Our work provides a detailed set of parameters and first steps for future use of SiC as a multiqubit memory and quantum computing platform.
|
|
| 40. |
- Ivanov, Ivan Gueorguiev, et al.
(författare)
-
High-Resolution Raman and Luminescence Spectroscopy of Isotope-Pure (SiC)-Si-28-C-12, Natural and C-13 - Enriched 4H-SIC
- 2014
-
Ingår i: Silicon Carbide and Related Materials 2013, PTS 1 AND 2. - : Trans Tech Publications Inc.. ; , s. 471-474
-
Konferensbidrag (refereegranskat)abstract
- The optical properties of isotope-pure (SiC)-Si-28-C-12, natural SiC and enriched with C-13 isotope samples of the 4H polytype are studied by means of Raman and photoluminescence spectroscopies. The phonon energies of the Raman active phonons at the Gamma point and the phonons at the M point of the Brillouin zone are experimentally determined. The excitonic bandgaps of the samples are accurately derived using tunable laser excitation and the phonon energies obtained from the photoluminescence spectra. Qualitative comparison with previously reported results on isotope-controlled Si is presented.
|
|
| 41. |
- Ivanov, Ivan Gueorguiev, et al.
(författare)
-
Layer-number determination in graphene on SiC by reflectance mapping
- 2014
-
Ingår i: Carbon. - : Elsevier BV. - 0008-6223 .- 1873-3891. ; 77, s. 492-500
-
Tidskriftsartikel (refereegranskat)abstract
- We report a simple, handy and affordable optical approach for precise number-of-layers determination of graphene on SiC based on monitoring the power of the laser beam reflected from the sample (reflectance mapping) in a slightly modified micro-Raman setup. Reflectance mapping is compatible with simultaneous Raman mapping. We find experimentally that the reflectance of graphene on SiC normalized to the reflectivity of bare substrate (the contrast) increases linearly with similar to 1.7% per layer for up to 12 layers, in agreement with theory The wavelength dependence of the contrast in the visible is investigated using the concept of ideal fermions and compared with existing experimental data for the optical constants of graphene. We argue also that the observed contrast is insensitive to the doping condition of the sample, as well as to the type of sample (graphene on C- or Si-face of 4H or 6H SiC, hydrogen-intercalated graphene). The possibility to extend the precise layer counting to similar to 50 layers makes reflectivity mapping superior to low-energy electron microscopy (limited to similar to 10 layers) in quantitative evaluation of graphene on the C-face of SiC. The method is applicable for graphene on other insulating or semiconducting substrates. (C) 2014 Elsevier Ltd. All rights reserved.
|
|
| 42. |
- Ivanov, Ivan Gueorguiev, 1955-, et al.
(författare)
-
Temperature Dependence and Selective Excitation of the Phosphorus Related Photoluminescence in 4H-SiC
- 2009
-
Ingår i: Materials Science Forum, Vols. 615-617. - : Trans Tech Publications. - 9780878493340 ; , s. 263-266
-
Konferensbidrag (refereegranskat)abstract
- The paper presents experimental data on the temperature dependence and the excitation properties of the phosphorus-related photoluminescence in 4H SiC. Two main sets of phonon replicas can be observed with selective excitation, which are attributed to two of the no-phonon lines observed in the spectrum. Some of the excited states are also attributed to one of the no-phonon lines on the ground of the selectively excited spectra. A tentative explanation of the observed features in terms of multiple bound excitons is proposed.
|
|
| 43. |
- Johansson, Leif, et al.
(författare)
-
Is the Registry Between Adjacent Graphene Layers Grown on C-Face SiC Different Compared to That on Si-Face SiC
- 2013
-
Ingår i: Crystals. - : MDPI AG. - 2073-4352. ; 3:1, s. 1-13
-
Tidskriftsartikel (refereegranskat)abstract
- Graphene grown on C-face SiC substrates using two procedures, high and low growth temperature and different ambients, was investigated using Low Energy Electron Microscopy (LEEM), X-ray Photo Electron Electron Microscopy (XPEEM), selected area Low Energy Electron Diffraction (μ-LEED) and selected area Photo Electron Spectroscopy (μ-PES). Both types of samples showed formation of μm-sized grains of graphene. The sharp (1 × 1) μ-LEED pattern and six Dirac cones observed in constant energy photoelectron angular distribution patterns from a grain showed that adjacent layers are not rotated relative to each other, but that adjacent grains in general have different azimuthal orientations. Diffraction spots from the SiC substrate appeared in μ-LEED patterns collected at higher energies, showing that the rotation angle between graphene and SiC varied. C 1s spectra collected did not show any hint of a carbon interface layer. A hydrogen treatment applied was found to have a detrimental effect on the graphene quality for both types of samples, since the graphene domain/grain size was drastically reduced. From hydrogen treated samples, μ-LEED showed at first a clear (1 × 1) pattern, but within minutes, a pattern containing strong superstructure spots, indicating the presence of twisted graphene layers. The LEED electron beam was found to induce local desorption of hydrogen. Heating a hydrogenated C-face graphene sample did not restore the quality of the original as-grown sample.
|
|
| 44. |
- Kallinger, B., et al.
(författare)
-
Comparison of carrier lifetime measurements and mapping in 4H SIC using time resolved photoluminescence and μ-PCD
- 2014
-
Ingår i: SILICON CARBIDE AND RELATED MATERIALS 2013, PTS 1 AND 2. - Stafa-Zurich, Switzerland : Trans Tech Publications. - 9783038350101 ; , s. 301-304
-
Konferensbidrag (refereegranskat)abstract
- Carrier lifetime measurements and wafer mappings have been done on several different 4H SiC epiwafers to compare two different measurement techniques, time-resolved photoluminescence and microwave induced photoconductivity decay. The absolute values of the decay time differ by a factor of two, as expected from recombination and measurement theory. Variations within each wafer are comparable with the two techniques. Both techniques are shown to be sensitive to substrate quality and distribution of extended defects.
|
|
| 45. |
- Karhu, Robin, et al.
(författare)
-
CVD growth and properties of on-axis vanadium doped semi-insulating 4H-SiC epilayers
- 2019
-
Ingår i: Journal of Applied Physics. - : AMER INST PHYSICS. - 0021-8979 .- 1089-7550. ; 125:4
-
Tidskriftsartikel (refereegranskat)abstract
- Highly resistive homoepitaxial layers of 4H-SiC have been grown on the Si-face of nominally on-axis, n-type substrates using chemical vapor deposition. Vanadium tetrachloride has been used as the V-dopant which is responsible for the high resistivity of the epilayers. 100% 4H-polytype was reproduced in the epilayers using the optimized on-axis growth process. The upper limit of vanadium tetrachloride flow rate was also established to achieve high resistivity epilayers free of 3C polytype inclusion. A resistivity of more than 1 x 10(5) Omega cm has been achieved in epilayers with a very low concentration of V (1 x 10(15) cm(-3)). Owing to the low concentration of V, superior epilayer structural quality was achieved compared to V-doped and standard high purity semi-insulating bulk grown material of similar resistivity. Epitaxial layers with varying vanadium tetrachloride flow have also been grown to study the influence of V concentration on the polytype stability, structural quality, and optical and electrical properties of epilayers. A clear correspondence has been observed in the flow-rates of vanadium tetrachloride, the atomic concentration of V, and electrical, optical, and structural properties of epilayers. Published under license by AIP Publishing.
|
|
| 46. |
- Karhu, Robin, 1987-
(författare)
-
CVD growth of SiC for high-power and high-frequency applications
- 2019
-
Doktorsavhandling (övrigt vetenskapligt/konstnärligt)abstract
- Silicon Carbide (SiC) is a wide bandgap semiconductor that has attracted a lot of interest for electronic applications due to its high thermal conductivity, high saturation electron drift velocity and high critical electric field strength. In recent years commercial SiC devices have started to make their way into high and medium voltage applications.Despite the advancements in SiC growth over the years, several issues remain. One of these issues is that the bulk grown SiC wafers are not suitable for electronic applications due to the high background doping and high density of basal plane dislocations (BPD). Due to these problems SiC for electronic devices must be grown by homoepitaxy. The epitaxial growth is performed in chemical vapor deposition (CVD) reactors. In this work, growth has been performed in a horizontal hot-wall CVD (HWCVD) reactor. In these reactors it is possible to produce high-quality SiC epitaxial layers within a wide range of doping, both n- and p-type.SiC is a well-known example of polytypism, where the different polytypes exist as different stacking sequences of the Si-C bilayers. Polytypism makes polytype stability a problem during growth of SiC. To maintain polytype stability during homoepitaxy of the hexagonal polytypes the substrates are usually cut so that the angle between the surface normal and the c-axis is a few degrees, typically 4 or 8°. The off-cut creates a high density of micro-steps at the surface. These steps allow for the replication of the substrates polytype into the growing epitaxial layer, the growth will take place in a step-flow manner. However, there are some drawbacks with step-flow growth. One is that BPDs can replicate from the substrate into the epitaxial layer. Another problem is that 4H-SiC is often used as a substrate for growth of GaN epitaxial layers. The epitaxial growth of GaN has been developed on on-axis substrates (surface normal coincides with c-axis), so epitaxial 4H-SiC layers grown on off-axis substrates cannot be used as substrates for GaN epitaxial growth.In efforts to solve the problems with off-axis homoepitaxy of 4H-SiC, on-axis homoepitaxy has been developed. In this work, further development of wafer-scale on-axis homoepitaxy has been made. This development has been made on a Si-face of 4H-SiC substrates. The advances include highly resistive epilayers grown on on-axis substrates. In this thesis the ability to control the surface morphology of epitaxial layers grown on on-axis homoepitaxy is demonstrated. This work also includes growth of isotopically enriched 4H-SiC on on-axis substrates, this has been done to increase the thermal conductivity of the grown epitaxial layers.In (paper 1) on-axis homoepitaxy of 4H-SiC has been developed on 100 mm diameter substrates. This paper also contains comparisons between different precursors. In (paper 2) we have further developed on-axis homoepitaxy on 100 mm diameter wafers, by doping the epitaxial layers with vanadium. The vanadium doping of the epitaxial layers makes the layers highly resistive and thus suitable to use as a substrate for III-nitride growth. In (paper 3) we developed a method to control the surface morphology and reduce the as-grown surface roughness in samples grown on on-axis substrates. In (paper 4) we have increased the thermal conductivity of 4H-SiC epitaxial layers by growing the layers using isotopically enriched precursors. In (paper 5) we have investigated the role chlorine have in homoepitaxial growth of 4H-SiC. In (paper 6) we have investigated the charge carrier lifetime in as-grown samples and traced variations in lifetime to structural defects in the substrate. In (paper 7) we have investigated the formation mechanism of a morphological defect in homoepitaxial grown 4H-SiC.
|
|
| 47. |
- Karhu, Robin, 1987-, et al.
(författare)
-
Long Charge Carrier Lifetime in As-Grown 4H-SiC Epilayer
- 2016
-
Ingår i: Materials Science Forum. - : Trans Tech Publications. - 0255-5476 .- 1662-9752. ; 858, s. 125-128
-
Tidskriftsartikel (refereegranskat)abstract
- Over 150 μm thick epilayers of 4H-SiC with long carrier lifetime have been grown with a chlorinated growth process. The carrier lifetime have been determined by time resolved photoluminescence (TRPL), the lifetime varies a lot between different areas of the sample. This study investigates the origins of lifetime variations in different regions using deep level transient spectroscopy (DLTS), low temperature photoluminescence (LTPL) and a combination of KOH etching and optical microscopy. From optical microscope images it is shown that the area with the shortest carrier lifetime corresponds to an area with high density of structural defects.
|
|
| 48. |
- Karhu, Robin, 1987-, et al.
(författare)
-
The Origin and Formation Mechanism of an Inclined Line-like Defect in 4H-SiC Epilayers
- 2022
-
Ingår i: Physica status solidi. B, Basic research. - : Wiley-V C H Verlag GMBH. - 0370-1972 .- 1521-3951. ; 259:4
-
Tidskriftsartikel (refereegranskat)abstract
- The origin and the formation mechanism of a surface morphological defect in 4H-SiC epilayers are reported. The defect appears on the surface of an epilayer as an inclined line-like feature at an angle of +/- 80 degrees to the step-flow direction [ 11 2 over bar 0 ] . The defect is confirmed to originate from a threading screw dislocation intersecting the surface and its orientation is controlled by the sign of the Burgers vector of the dislocation. The defect forms through the interaction of local spiral growth associated with threading screw dislocations and step-flow growth related to the substrate offcut. The defect mainly appears in the epilayers grown through chloride-based chemistry, where in situ surface preparation of the substrate is performed in H-2 + HCl at a relatively high temperature.
|
|
| 49. |
- Karhu, Robin, et al.
(författare)
-
The Role of Chlorine during High Growth Rate Epitaxy
- 2015
-
Ingår i: Materials Science Forum. - Pfaffikon, Switzerland : Scientific.Net. - 0255-5476 .- 1662-9752. ; 821-823, s. 141-144
-
Tidskriftsartikel (refereegranskat)abstract
- The influence of chlorine has been investigated for high growth rates of 4H-SiC epilayers on 4o off-cut substrates. Samples were grown at a growth rate of approximately 50 and 100 μm/h and various Cl/Si ratios. The growth rate, net doping concentration and charge carrier lifetime have been studied as a function of Cl/Si ratio. This study shows some indications that a high Cl concentration in the growth cell leads to less availability of Si during the growth process.
|
|
| 50. |
- Khosa, Rabia Y., et al.
(författare)
-
Electrical characterization of amorphous Al2O3 dielectric films on n-type 4H-SiC
- 2018
-
Ingår i: AIP Advances. - : AIP Publishing. - 2158-3226 .- 2158-3226. ; 8:2
-
Tidskriftsartikel (refereegranskat)abstract
- We report on the electrical properties of Al 2 O 3 films grown on 4H-SiC by successive thermal oxidation of thin Al layers at low temperatures (200°C - 300°C). MOS capacitors made using these films contain lower density of interface traps, are more immune to electron injection and exhibit higher breakdown field (5MV/cm) than Al 2 O 3 films grown by atomic layer deposition (ALD) or rapid thermal processing (RTP). Furthermore, the interface state density is significantly lower than in MOS capacitors with nitrided thermal silicon dioxide, grown in N 2 O, serving as the gate dielectric. Deposition of an additional SiO 2 film on the top of the Al 2 O 3 layer increases the breakdown voltage of the MOS capacitors while maintaining low density of interface traps. We examine the origin of negative charges frequently encountered in Al 2 O 3 films grown on SiC and find that these charges consist of trapped electrons which can be released from the Al 2 O 3 layer by depletion bias stress and ultraviolet light exposure. This electron trapping needs to be reduced if Al 2 O 3 is to be used as a gate dielectric in SiC MOS technology.
|
|
