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- Karlsson, Linda H., et al.
(författare)
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Atomically resolved microscopy of ion implantation induced dislocation loops in 4H-SiC
- 2016
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Ingår i: Materials letters (General ed.). - : Elsevier. - 0167-577X .- 1873-4979. ; 181, s. 325-327
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Tidskriftsartikel (refereegranskat)abstract
- During high temperature electrical activation of ion-implanted dopant species in SiC, extrinsic dislocation loops are formed on the basal planes of the SiC lattice. Investigations have suggested Si-based loops are caused in accordance with the well-known +1 model. Herein we apply aberration corrected STEM to resolve the atomic structure of these loops. It is shown that the dislocation loops formed during annealing of Al-implanted SiC consist of an extra inserted Si-C bilayer of the (0001) polar sense, which upon insertion into the lattice causes a local extrinsic stacking fault. The +1 model thus needs to be expanded for binary systems. (C) 2016 Elsevier B.V. All rights reserved.
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