1. |
- Hansson, B. A. M., et al.
(författare)
-
A liquid-xenon-jet laser-plasma X-ray and EUV source
- 2000
-
Ingår i: Microelectronic Engineering. - 0167-9317 .- 1873-5568. ; 53:04-jan, s. 667-670
-
Tidskriftsartikel (refereegranskat)abstract
- We describe a laser-plasma soft-x-ray source based on a cryogenic-xenon liquid-jet target. The source is suitable for extreme ultraviolet (EUV) projection lithography and proximity x-ray lithography (PXL). Absolute calibrated spectra in the 1-2 nm range and uncalibrated spectra in the 9-15 nm range are obtained using a free-standing transmission grating and a CCD-detector.
|
|