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  • Tengstrand, Olof, et al. (author)
  • Incorporation effects of Si in TiCx thin films
  • 2014
  • In: Surface & Coatings Technology. - : Elsevier BV. - 0257-8972 .- 1879-3347. ; 258, s. 392-397
  • Journal article (peer-reviewed)abstract
    • Ti-Si-C thin films with varying Si content between 0 to 10 at.% were deposited by DC magnetron sputtering from elemental targets. The effects on microstructure and lattice parameters were investigated using x-ray diffraction, x-ray photoelectron spectroscopy, transmission electron microscopy, and first-principles calculations. The results show that the growth of pure TiCx onto Al2O3(0001) substrates at a temperature of 350 degrees C yields (111) epitaxial and understoichiometric films with x similar to 0.7. For Si contents up to 4 at.%, the TiCx epitaxy is retained locally. Si starts to segregate out from the TiCx to column boundaries at concentrations between 1 and 4 at.%, and causes a transition from epitaxial to polycrystalline growth above 4 at.%. Eventually, the top part of the films form a nanocomposite of crystalline TiC grains surrounded by amorphous SiC and C for Si contents studied up to 10 at.%. The results show that Si takes the place of carbon when incorporated in the TiC lattice.
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Type of publication
journal article (1)
Type of content
peer-reviewed (1)
Author/Editor
Hultman, Lars (1)
Alling, Björn (1)
Jansson, Ulf (1)
Eklund, Per (1)
Flink, Axel (1)
Tengstrand, Olof (1)
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Nedfors, Nils (1)
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University
Uppsala University (1)
Linköping University (1)
Language
English (1)
Research subject (UKÄ/SCB)
Natural sciences (1)
Year
2014 (1)

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