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- Paskova, Tanja, et al.
(författare)
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Defect and stress relaxation in HVPE-GaN films using high temperature reactively sputtered AlN buffer
- 2001
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Ingår i: Journal of Crystal Growth. - 0022-0248 .- 1873-5002. ; 230:3-4, s. 381-386
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Tidskriftsartikel (refereegranskat)abstract
- The influence of high temperature buffer layers on the structural characteristics of GaN grown by hydride vapour phase epitaxy on sapphire was investigated. Strain relaxation as well as mismatch-induced defect reduction in thick GaN layers grown on AlN buffer was microscopically identified using cathodoluminescence and micro-Raman spectroscopy in cross-section of the films. The results were correlated with photoluminescence and Hall-effect data of layers with different thicknesses. These relaxation processes were suggested to account for the specific defect distribution in the buffers revealed by high-resolution X-ray diffraction and transmission electron microscopy. © 2001 Elsevier Science B.V. All rights reserved.
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