Laser based aerial microscope for at-wavelength characterization of extreme ultraviolet lithography masks

• We have developed a compact aerial full-field microscope based on a table-top 13.2 nmwavelength extreme ultraviolet laser and diffractive optics to characterize the printing performance of EUV lithographic masks.

Ämnesord

TEKNIK OCH TEKNOLOGIER  -- Annan teknik (hsv//swe)

ENGINEERING AND TECHNOLOGY  -- Other Engineering and Technologies (hsv//eng)

Nyckelord

At-wavelength characterization

Extreme ultraviolet lasers

Extreme ultraviolet lithography masks

Full-field

Lithographic mask

Printing performance

Table-top

Publikations- och innehållstyp

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