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Interfacial chemistry of Alq3 and LiF with reactive metals

Mason, M.G. (författare)
Research Laboratories, Eastman Kodak Company, Rochester, NY 14650-2132, United States
Tang, C.W. (författare)
Research Laboratories, Eastman Kodak Company, Rochester, NY 14650-2132, United States
Hung, L.-S. (författare)
Research Laboratories, Eastman Kodak Company, Rochester, NY 14650-2132, United States
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Raychaudhuri, P. (författare)
Research Laboratories, Eastman Kodak Company, Rochester, NY 14650-2132, United States
Madathil, J. (författare)
Research Laboratories, Eastman Kodak Company, Rochester, NY 14650-2132, United States
Giesen, D.J. (författare)
Research Laboratories, Eastman Kodak Company, Rochester, NY 14650-2132, United States
Yan, L. (författare)
Department of Physics and Astronomy, University of Rochester, Rochester, NY 14627, United States
Le, Q.T. (författare)
Department of Physics and Astronomy, University of Rochester, Rochester, NY 14627, United States
Gao, Y. (författare)
Department of Physics and Astronomy, University of Rochester, Rochester, NY 14627, United States
Lee, S.-T. (författare)
Dept. of Phys. and Mat. Research, Center for Super Diamond Research, City University of Hong Kong, Kowloon, Hong Kong
Liao, L.S. (författare)
Dept. of Phys. and Mat. Research, Center for Super Diamond Research, City University of Hong Kong, Kowloon, Hong Kong
Cheng, L.F. (författare)
Dept. of Phys. and Mat. Research, Center for Super Diamond Research, City University of Hong Kong, Kowloon, Hong Kong
Salaneck, William R (författare)
Linköpings universitet,Tekniska högskolan,Ytors Fysik och Kemi
Dos, Santos D.A. (författare)
Dos Santos, D.A., Ctr. Rech. Electron. Photonique M., Université de Mons-Hainaut, B-7000 Mons, Belgium
Bredas, J.L. (författare)
Brédas, J.L., Ctr. Rech. Electron. Photonique M., Université de Mons-Hainaut, B-7000 Mons, Belgium, Department of Chemistry, University of Arizona, Tucson, AZ 85721-0041, United States
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 (creator_code:org_t)
AIP Publishing, 2001
2001
Engelska.
Ingår i: Journal of Applied Physics. - : AIP Publishing. - 0021-8979 .- 1089-7550. ; 89:5, s. 2756-2765
  • Tidskriftsartikel (refereegranskat)
Abstract Ämnesord
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  • The electronic structure and chemistry of interfaces between tris-(8-hydroxyquinoline) aluminum (Alq3) and representative group IA and IIA metals, Al, and Al/LiF have been studied by x-ray and ultraviolet photoelectron spectroscopies. Quantum-chemical calculations at the density functional theory level predict that the Alq3 radical anion is formed upon reaction with the alkali metals. In this case, up to three metal atoms can react with a given Alq3 molecule to form the trivalent anion. The anion formation results in a splitting of the N 1 s core level and formation of a new feature in the previously forbidden energy gap. Virtually identical spectra are observed in the Al/LiF/Alq3 system, leading to the conclusion that the radical anion is also formed when all three of these constituents are present. This is support by a simple thermodynamic model based on bulk heats of formation. In the absence of LiF or similar material, the reaction of Al with Alq3 appears to be destructive, with the deposited Al reacting directly with the quinolate oxygen. We proposed that in those circumstances where the radical anion is formed, it and not the cathode metal are responsible for the electron injection properties. This is borne out by producing excellent injecting contacts when Ag and Au are used as the metallic component of the cathode structure. © 2001 American Institute of Physics.

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