| 1. |
- Wang, X., et al.
(author)
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Involvement of the MKK6-p38? cascade in ?-radiation-induced cell cycle arrest
- 2000
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In: Molecular and Cellular Biology. - 0270-7306 .- 1098-5549. ; 20:13, s. 4543-4552
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Journal article (peer-reviewed)abstract
- The p38 group of kinases belongs to the mitogen-activated protein (MAP) kinase superfamily with structural and functional characteristics distinguishable from those of the ERK, JNK (SAPK), and BMK (ERK5) kinases. Although there is a high degree of similarity among members of the p38 group in terms of structure and activation, each member appears to have a unique function. Here we show that activation of p38-? (also known as ERK6 or SAPK3), but not the other p38 isoforms, is required for ?-irradiation- induced G2 arrest. Activation of the MKK6-p38? cascade is sufficient to induce G2 arrest in cells, and expression of dominant negative alleles of MKK6 or p38? allows cells to escape the DNA damage-induce G2 delay. Activation of p38? is dependent on ATM and leads to activation of Cds1 (also known as Chk2). These data suggest a model in which activation of ATM by ? irradiation leads to the activation of MKK6, p38?, and Cds1 and that activation of both MKK6 and p38? is essential for the proper regulation of the G2 checkpoint in mammalian cells.
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| 2. |
- Zheng, W.T., et al.
(author)
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Chemical bonding, structure, and hardness of carbon nitride thin films
- 2000
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In: Diamond and related materials. - 0925-9635 .- 1879-0062. ; 9:9-10, s. 1790-1794
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Conference paper (other academic/artistic)abstract
- Carbon nitride films are deposited on Si(001) substrates by reactive d.c. magnetron sputtering graphite in a pure N2 discharge. The chemical bonding and structure of carbon nitride films were probed using Fourier transformation infrared (FTIR) and near edge X-ray absorption fine structure (NEXAFS), and the hardness was evaluated using nanoindentation experiments. The structure and hardness for the films are dependent on the substrate temperature (T(s)). FTIR and NEXAFS spectra show that N atoms are bound to sp1, sp2 and sp3 hybridized C atoms, and the intensity of p(*) resonance for C1s NEXAFS spectra is the lowest for the film grown at T(s) = 350°C, having a turbostratic-like structure, high hardness and stress. The correlation between the structure and hardness of carbon nitride films is discussed. (C) 2000 Elsevier Science S.A. All rights reserved.Carbon nitride films are deposited on Si(001) substrates by reactive d.c. magnetron sputtering graphite in a pure N2 discharge. The chemical bonding and structure of carbon nitride films were probed using Fourier transformation infrared (FTIR) and near edge X-ray absorption fine structure (NEXAFS), and the hardness was evaluated using nanoindentation experiments. The structure and hardness for the films are dependent on the substrate temperature (Ts). FTIR and NEXAFS spectra show that N atoms are bound to sp1, sp2 and sp3 hybridized C atoms, and the intensity of p* resonance for C1s NEXAFS spectra is the lowest for the film grown at Ts = 350°C, having a turbostratic-like structure, high hardness and stress. The correlation between the structure and hardness of carbon nitride films is discussed.
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