| 1. |
- Connolly, S., et al.
(författare)
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Rationale and design of ACTIVE: the atrial fibrillation clopidogrel trial with irbesartan for prevention of vascular events
- 2006
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Ingår i: American heart journal. - 1097-6744. ; 151:6, s. 1187-93
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Tidskriftsartikel (refereegranskat)abstract
- BACKGROUND: Atrial fibrillation (AF) is the most frequently occurring cardiac arrhythmia with often serious clinical consequences. Many patients have contraindications to anticoagulation, and it is often underused in clinical practice. The addition of clopidogrel to aspirin (ASA) has been shown to reduce vascular events in a number of high-risk populations. Irbesartan is an angiotensin receptor-blocking agent that reduces blood pressure and has other vascular protective effects. METHODS AND RESULTS: ACTIVE W is a noninferiority trial of clopidogrel plus ASA versus oral anticoagulation in patients with AF and at least 1 risk factor for stroke. ACTIVE A is a double-blind, placebo-controlled trial of clopidogrel in patients with AF and with at least 1 risk factor for stroke who receive ASA because they have a contraindication for oral anticoagulation or because they are unwilling to take an oral anticoagulant. ACTIVE I is a partial factorial, double-blind, placebo-controlled trial of irbesartan in patients participating in ACTIVE A or ACTIVE W. The primary outcomes of these studies are composites of vascular events. A total of 14000 patients will be enrolled in these trials. CONCLUSIONS: ACTIVE is the largest trial yet conducted in AF. Its results will lead to a new understanding of the role of combined antiplatelet therapy and the role of blood pressure lowering with an angiotensin II receptor blocker in patients with AF.
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| 2. |
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| 3. |
- Friedman, James S., et al.
(författare)
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Mutations in a BTB-Kelch Protein, KLHL7, Cause Autosomal-Dominant Retinitis Pigmentosa
- 2009
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Ingår i: American Journal of Human Genetics. - : Elsevier BV. - 0002-9297. ; 84:6, s. 792-800
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Tidskriftsartikel (refereegranskat)abstract
- Retinitis pigmentosa (RP) refers to a genetically heterogeneous group of progressive neurodegenerative diseases that result in dysfunction and/or death of rod and cone photoreceptors in the retina. So far, 18 genes have been identified for autosomal-dominant (ad) RP. Here, we describe an adRP locus (RP42) at chromosome 7p15 through linkage analysis in a six-generation Scandinavian family and identify a disease-causing mutation, c.449G -> A (p.S150N), in exon 6 of the KLHL7 gene. Mutation screening of KLHL7 in 502 retinopathy probands has revealed three different missense mutations in six independent families. KLHL7 is widely expressed, including expression in rod photoreceptors, and encodes a 75 kDa protein of the BTB-Kelch Subfamily within the BTB superfamily. BTB-Kelch proteins have been implicated in ubiquitination through Cullin E3 ligases. Notably, all three putative disease-causing KLHL7 mutations are within a conserved BACK domain; homology modeling suggests that mutant amino acid side chains can potentially fill the cleft between two helices, thereby affecting the ubiquitination complexes. Mutations in an identical region of another BTB-Kelch protein, gigaxonin, have previously been associated with giant axonal neuropathy. Our studies suggest an additional role of the ubiquitin-proteasome protein-degradation pathway in maintaining neuronal health and in disease.
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| 4. |
- Berrier, Audrey, et al.
(författare)
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Characterization of the feature-size dependence in Ar/Cl2 chemically assisted ion beam etching of InP-based photonic crystal devices
- 2007
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Ingår i: Journal of Vacuum Science & Technology B. - : American Vacuum Society. - 1071-1023 .- 1520-8567. ; 25:1, s. 1-10
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Tidskriftsartikel (refereegranskat)abstract
- The authors address feature-size dependence in Ar/Cl-2, chemically assisted ion beam etching (CAIBE) in the context of the fabrication of photonic crystal (PhC) structures. They systematically investigate the influence of various parameters such as hole diameter (115-600 nm), etch duration (10-60 min), and ion beam energy (300-600 eV) on PhC etching in InP with Ar/Cl-2, CAIBE. For a 60 min etching at an Ar-ion energy of 400 eV, the authors report an etch depth of 5 mu m for hole diameters d larger than 300 nm; the etch depth is in excess of 3 mu m for d larger than 200 nm. The evolution of roughness at the bottom of the etched holes and its dependence on hole size and etching conditions,is discussed. The physical mechanism of the observed feature-size dependent etching (FSDE) is then discussed and the effect of the process parameters is qualitatively understood using a model combining the effect of ion sputtering and surface chemical reactions. Finally, the effect of FSDE on the PhC optical properties is assessed by measuring the quality factor of one-dimensional Fabry-Perot PhC cavities. The measured quality factors show a clear trend with the etch depth: the cavity Q increases as the etch depth increases.
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| 5. |
- Berrier, Audrey, et al.
(författare)
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Feature size effects in chemically assisted ion beam etching of InP-based photonic crystals - art. no. 632707
- 2006
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Ingår i: Nanoengineering: Fabrication, Properties, Optics, and Devices III. - BELLINGHAM, WA : SPIE-INT SOC OPTICAL ENGINEERING. - 0819464066 ; , s. 32707-32707
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Konferensbidrag (refereegranskat)abstract
- This work addresses feature size effects (the lag-effect and roughness development) in chemically assisted ion beam etching (CAIBE) etching of InP-based photonic crystals. Photonic crystal fields with varying hole size and periods were etched with different etching times. The slope of the etch depth versus diameter curves (lag-curves) reveals a hole size dependence, with a critical aspect ratio higher than 25. A model for the etch rate specific to Ar/Cl-2 CAIBE is proposed. We calculate the etch rate using a physico-chemical model which takes in to account the effect of Ar-ion sputtering and surface chemical reactions. In addition, it combines the aspect ratio dependence of the gas conductance of the etched holes. The origin and evolution of the bottom roughness of the etched holes is examined. The impact of the feature size dependence of the etching on the photonic crystal optical properties is then assessed by measuring the quality-factor of one-dimensional Fabry-Perot cavities using the Internal Light Source method, and discussed in terms of hole shape and depth. A systematic trend between the determined quality factor (Q) and the lag-effect is evidenced: Q decreases from about 250 to 60 when the hole depth drops from 5 mu m to 2 mu m.
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| 6. |
- Berrier, Audrey, et al.
(författare)
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Impact of feature-size dependent etching on the optical properties of photonic crystal devices
- 2008
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Ingår i: Journal of Applied Physics. - : AIP Publishing. - 0021-8979 .- 1089-7550. ; 103:9, s. 096106-1-096106-3
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Tidskriftsartikel (refereegranskat)abstract
- Feature size dependence in Ar/Cl-2 chemically assisted ion beam etching of InP-based photonic crystals (PhCs) and its influence on the optical properties of PhC devices operating in the band gap are investigated. The analysis of the measured quality factors, the determined mirror reflectivities, and losses of one-dimensional Fabry-Perot cavities clearly demonstrates the importance of feature-size dependent etching. The optical properties show a dramatic improvement up to a hole depth of about 3.5 mu m that is primarily due to a significant reduction in extrinsic losses. However, beyond this hole depth, the improvement is at a lower rate, which suggests that extrinsic losses, although present, are not dominant.
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| 7. |
- El-Kallassi, P., et al.
(författare)
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Optical and local tuning of planar photonic crystals infiltrated with organic molecules
- 2007
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Ingår i: Conference on Lasers and Electro-Optics, 2007, CLEO 2007. - 9781557528346 ; , s. 1375-1376
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Konferensbidrag (refereegranskat)abstract
- We report on the optical tuning of InP-based planar photonic crystals (PhCs) infiltrated with a photoresponsive liquid crystal system. Preliminary results on the local tuning of PhC devices are also presented.
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| 8. |
- El-Kallassi, P., et al.
(författare)
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Optical and local tuning of planar photonic crystals infiltrated with organic molecules
- 2007
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Ingår i: Lasers and Electro-Optics, 2007 European Conference on and the International Quantum Electronics Conference. - 1424409306 - 9781424409303 ; , s. 4387041-
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Konferensbidrag (refereegranskat)abstract
- We report on the optical tuning of InP-based planar photonic crystals infiltrated with a photoresponsive liquid crystal system. Preliminary results on the local tuning of infiltrated structures are also presented.
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