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- Rockstuhl, C., et al.
(författare)
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Large scale simulations in the realm of nanooptics
- 2010
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Ingår i: Proceedings of SPIE - The International Society for Optical Engineering. - : SPIE. - 0277-786X .- 1996-756X. - 9780819480002 ; 7604
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Konferensbidrag (övrigt vetenskapligt/konstnärligt)abstract
- The realm of nanooptics is usually characterized by the interaction of light with structures having relevant feature sizes much smaller than the wavelength. To model such problems, a large variety of methods exists. However, most of them either require a periodic arrangement of a unit cell or can handle only single entities. But there exists a great variety of functional devices which may have either a spatial extent much larger than the wavelength and which comprise structural details with sizes in the order of a fraction of the wavelength or they may consist of an amorphous arrangement of strongly scattering entities. Such structures require large scale simulations where the fine details are retained. In this contribution we outline our latest research on such devices and detail the computational peculiarities we have to overcome. Presenting several examples, we show how simulations support the physical understanding of these devices. Examples are randomly textured surfaces used for solar cells, where guided modes excited in the light absorbing layers strongly affect the solar cell efficiency, amorphous metamaterials and stochastically arranged nanoantennas. The usage of computational experiments will be motivated by the unprecedented insight into the functionality of such components. © 2010 Copyright SPIE - The International Society for Optical Engineering.
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| 2. |
- Bustin, Stephen A., et al.
(författare)
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The need for transparency and good practices in the qPCR literature
- 2013
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Ingår i: Nature Methods. - : Springer Science and Business Media LLC. - 1548-7091 .- 1548-7105. ; 10:11, s. 1063-1067
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Tidskriftsartikel (övrigt vetenskapligt/konstnärligt)abstract
- Two surveys of over 1,700 publications whose authors use quantitative real-time PCR (qPCR) reveal a lack of transparent and comprehensive reporting of essential technical information. Reporting standards are significantly improved in publications that cite the Minimum Information for Publication of Quantitative Real-Time PCR Experiments (MIQE) guidelines, although such publications are still vastly outnumbered by those that do not.
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| 3. |
- Lauridsen, Jonas, et al.
(författare)
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High-rate deposition of amorphous and nanocomposite Ti-Si-C multifunctional coatings
- 2010
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Ingår i: Surface & Coatings Technology. - : Elsevier BV. - 0257-8972 .- 1879-3347. ; 205:2, s. 299-305
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Tidskriftsartikel (refereegranskat)abstract
- Amorphous (a) and nanocomposite Ti-Si-C coatings were deposited at rates up to 16 mu m/h by direct current magnetron sputtering from a Ti3SiC2 compound target, using an industrial pilot-plant system, onto high-speed steel. Si, and SiO2 substrates as well as NI-plated Cu cylinders, kept at a temperature of 200 or 270 degrees C. Electron microscopy, X-ray photoelectron spectroscopy, and X-ray diffraction analyses showed that TiC/a-C/a-SiC nanocomposites were formed consisting of textured TIC nanocrystallites (nc) embedded in a matrix of a-C and a-SiC. Elastic recoil detection analysis showed that coatings deposited at a target-to-substrate distance of 2 cm and an Ar pressure of 10 mTorr have a composition close to that of the Ti3SiC2 compound target, as explained by ballistic transport of the species Increased target-to-substrate distance from 2 cm to 8 cm resulted in a higher carbon-to-titanium ratio in the coatings than for the Ti3SiC2 compound target, due to different gas-phase scattering properties between the sputtered species The coating microstructure could be modified from nanocrystalline to predominantly amorphous by changing the pressure and target-to-substrate conditions to 4 mTorr and 2 cm, respectively. A decreased pressure from 10 mTorr to 4 or 2 mTorr at a target-to-substrate distance of 2 cm decreased the deposition rate up to a factor of similar to 7 as explained by resputtering and an increase in the plasma sheath thickness. The coatings exhibited electrical resistivity in the range 160-800 mu Omega cm, contact resistance down to 08 m Omega at a contact force of 40 N, and nanoindentation hardness in the range of 6-38 GPa.
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