| 1. |
- Echternach, P. M., et al.
(författare)
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Effect of non-classical current paths in networks of 1-dimensional wires
- 1996
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Ingår i: Czechoslovak Journal of Physics. - 0011-4626.
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Konferensbidrag (övrigt vetenskapligt/konstnärligt)abstract
- At low temperatures, the quantum corrections to the resistance due to weak localization and electron-electron interaction are affected by the shape and topology of samples. We observed these effects in the resistance of 2D percolation networks made from 1D wires and in a series of long 1D wires with regularly spaced side branches. Branches outside the classical current path strongly reduce the quantum corrections to the resistance and these reductions become a measure of the quantum lengths
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| 2. |
- Gershenson, M. E., et al.
(författare)
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Nonlocal effects in the resistance of one-dimensional wires with dangling side branches
- 1995
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Ingår i: Physical Review B. - 2469-9969 .- 2469-9950. ; 51, s. 10256-9
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Tidskriftsartikel (refereegranskat)abstract
- We have studied the quantum corrections to the resistance of one-dimensional gold wires with periodically spaced dangling side branches. Both the weak localization and interaction corrections to the resistance of such samples are strongly reduced when the distance between branches becomes smaller than the quantum length scales. The dependence of the quantum corrections on the distance between the branches then becomes a measurement of the quantum lengths
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| 3. |
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| 4. |
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| 5. |
- Gershenson, M. E., et al.
(författare)
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Quantum effects in the resistivity of percolation metal networks
- 1995
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Ingår i: Physical Review Letters. - 1079-7114 .- 0031-9007. ; 74, s. 446-9
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Tidskriftsartikel (refereegranskat)abstract
- We have studied the quantum corrections to the resistance of two-dimensional (2D) percolation networks of quasi-one-dimensional (1D) wires in which the ratio between the percolation correlation length and the quantum lengths L,LT could be controllably changed over a wide range. We have shown that the percolation networks behave like homogeneous 2D conductors with respect to the quantum corrections if L, LT. Close to the percolation threshold (L, LT) a crossover to 1D quantum corrections is observed
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| 6. |
- Malmqvist, L, et al.
(författare)
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Liquid-target laser-plasma source for X-ray lithography
- 1997
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Ingår i: Microelectronic Engineering. - 1873-5568. ; 35:1-4, s. 535-536
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Tidskriftsartikel (refereegranskat)abstract
- We describe a compact and practically debris-free laser-plasma x-ray source suitable for proximity lithography. The source is based on a microscopic fluorocarbon continuous liquid jet droplet target, generating high-brightness lambda=1.2-1.7 nm x-ray emission with similar to 5% conversion efficiency. This target type has the advantages of producing only negligible amounts of debris, and being regenerative, thereby allowing high-repetition-rate uninterrupted operation. The source is combined with an Au/SiNx x-ray mask to demonstrate lithography of sub-100 nm structures in SAL-601 chemically enhanced resist.
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| 7. |
- Malmqvist, L, et al.
(författare)
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Nanometer table-top proximity x-ray lithography with liquid-target laser-plasma source
- 1997
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Ingår i: Journal of Vacuum Science and Technology B. - : American Vacuum Society. - 1520-8567. ; 15:4, s. 814-817
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Tidskriftsartikel (refereegranskat)abstract
- A compact laser-plasma proximity x-ray lithography system suitable for laboratory-scale low-volume nanometer patterning is presented. The laser-plasma source, which is based on a fluorocarbon liquid-jet target, generates high-brightness lambda = 1.2-1.7 nm x-ray emission with only negligible debris production. The Au/SiNx x-ray mask is fabricated by employing ion milling and a high-contrast e-beam resist. With SAL-601 chemically enhanced resist we demonstrate fabrication of high-aspect-ratio, sub-100 nm structures. The exposure time is currently 20 min using a compact 10 Hz, lambda = 532 nm, 70 mJ/pulse mode-locked Nd:YAG laser. However, the regenerative liquid-jet target is designed for operation with future, e.g., 1000 Hz, lasers resulting in projected exposure times of similar to 10 s. (C) 1997 American Vacuum Society.
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| 8. |
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