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Sökning: WFRF:(Campbell Eleanor E B 1960) > (2002)

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1.
  • Lassesson, Andreas, 1976, et al. (författare)
  • Investigations into the fragmentation and ionization of highly excited La@C-82
  • 2002
  • Ingår i: Journal of Chemical Physics. - : AIP Publishing. - 1089-7690 .- 0021-9606. ; 117:21, s. 9811-9817
  • Tidskriftsartikel (refereegranskat)abstract
    • We report the first measurements of delayed ionization of the metallofullerene La@C-82. When highly excited in laser desorption, La@C-82 was found to ionize over several microseconds. The rate of delayed ionization of La@C-82 was compared to C-60 under the same extraction conditions, and found to be significantly different. A theoretical model was used for the fitting of the ion signal of the two fullerenes. The metallofullerene results can be fitted well over a time window
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2.
  • Popok, Vladimir, 1966, et al. (författare)
  • Design and capabilities of a cluster implantation and deposition apparatus: First results on hillock formation under energetic cluster ion bombardment
  • 2002
  • Ingår i: Review of Scientific Instruments. ; 73:12, s. 4283-4287
  • Tidskriftsartikel (refereegranskat)abstract
    • A description, advantages, and capabilities of a cluster implantation and deposition apparatus supplied by a pulsed cluster source from gaseous precursors are presented. A number of possible in situ and ex situ experimental methods to study clustersurface collisions and modified substrate surfaces are discussed. Test experiments on cluster production show formation of Ar, N2, and O2 clusters with size up to 150 atoms for Ar and 6070 molecules for the other gases. The possibility of cluster mass selection and acceleration up to 25 keV is reported. Nanosize hillock formation was found as a result of clustersurface collisions with pyrolytic graphite and indiumtinoxide. It is suggested that the hillocks' parameters such as size and density per surface area can be controlled by varying the implantation parameters and substrate material and thus provide a promising technique for nanoscale surface modification.
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