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- Kero, Anneli, 1950-, et al.
(författare)
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The male partner involved in legal abortion
- 1999
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Ingår i: Human Reproduction. - : Oxford University Press (OUP). - 0268-1161 .- 1460-2350. ; 14:10, s. 2669-2675
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Tidskriftsartikel (refereegranskat)abstract
- This study comprises 75 men who have been involved in legal abortion. The men answered a questionnaire concerning living conditions and attitudes about pregnancy and abortion. Most men were found to be in stable relationships with good finances. More than half clearly stated that they wanted the woman to have an abortion while 20 stressed that they submitted themselves to their partner's decision. Only one man wanted the woman to complete the pregnancy. Apart from wanting children within functioning family units, the motivation for abortion revealed that the desire to have children depended on the ability to provide qualitatively good parenting. More than half the men had discussed with their partner what to do in event of pregnancy and half had decided to have an abortion if a pregnancy occurred. More than half expressed ambivalent feelings about the coming abortion, using words such as anxiety, responsibility, guilt, relief and grief. In spite of these contradictory feelings, prevailing expectations concerning lifestyle make abortion an acceptable form of birth control. A deeper understanding of the complexity of legal abortion makes it necessary to accept the role of paradox, which the ambivalence reflects. Obviously, men must constitute a target group in efforts to prevent abortions.
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| 2. |
- Norin, L, et al.
(författare)
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Deposition of transition metal carbide superlattices using C-60 as a carbon source
- 1998
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Ingår i: Applied Physics Letters. ; 73:19, s. 2754-2756
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Tidskriftsartikel (refereegranskat)abstract
- Epitaxial films of TiC and VC can be deposited at low temperatures on Mg(001) substrates by coevaporation of the metals with C-60 in a ultrahigh vacuum system. This process was used to deposit TiC/VC (001) superlattices on MgO(001) at 400 degrees C. The
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| 3. |
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| 4. |
- Tågström, P, et al.
(författare)
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LOW-PRESSURE CVD OF TUNGSTEN CARBIDES
- 1995
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Ingår i: Journal de Physique IV. ; 5:c5, s. 967-974
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Tidskriftsartikel (refereegranskat)abstract
- Tungsten carbide films have been deposited by CVD from a WF6/C3H8/H-2 gas mixture on several different substrate materials (Ta, Si, SiC and C). Single-phase WC films could easily be obtained on Ta substrates at 900 degrees C using a total pressure of 100
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| 5. |
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