| 1. |
- Kalinina, E., et al.
(författare)
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Characterization of Al-implanted 4H SiC high voltage diodes
- 2002
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Ingår i: Physica Scripta. - 0031-8949 .- 1402-4896. ; T101, s. 207-210
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Tidskriftsartikel (refereegranskat)abstract
- The properties of 4H-SiC chemical vapor deposition epitaxial layers were studied by different methods. The effects of structural defects in 4H-SiC epitaxial layers on electrical and luminescence properties of Al high dose ion implanted p(+)-n junctions were studied. It has been shown that the structural imperfections of low-doped layers affect some electrical characteristics of the ion doped p(+)-n junctions created in these epitaxial layers.
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| 2. |
- Kalinina, E., et al.
(författare)
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Electrical study of fast neutron irradiated devices based on 4H-SiC CVD epitaxial layers
- 2004
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Ingår i: SILICON CARBIDE AND RELATED MATERIALS 2003, PRTS 1 AND 2. ; , s. 705-708
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Konferensbidrag (refereegranskat)abstract
- The radiation-induced defect formation in high purity 4H-SiC CVD epitaxial layers and changes in the electrical properties of diode structures based on its after irradiation with different fluences I MeV neutrons were investigated at temperatures as high as 700 K. The Z(1), deep center, typical for 4H-SiC, was observed both in the initial and irradiated samples. The presence and number of different deep levels increased with the neutron fluence. The rectifying properties of the diode structures disappeared after neutron irradiation with fluence of 6.2x10(14) cm(-2). However, the diode structures that had been degraded after irradiation with fast neutrons, recovered their properties at the temperature of 700 K.
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| 3. |
- Kalinina, E., et al.
(författare)
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Structural, electrical, and optical properties of low-doped 4H-SiC chemical vapor deposited epitaxial layers
- 2001
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Ingår i: Journal of Applied Physics. - : AIP Publishing. - 0021-8979 .- 1089-7550. ; 90:10, s. 5402-5409
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Tidskriftsartikel (refereegranskat)abstract
- Results of complex studies of structural, optical, and electrical characteristics of 4H-SiC n-type low-doped epitaxial layers grown by the chemical vapor deposition (CVD) method are presented. Characteristics of CVD layers grown on commercial wafers with and without a thin (<0.1 mum) buffer layer grown by liquid phase epitaxy (LPE) between the commercial wafer and CVD epitaxial layer were compared. It has been shown that the LPE filling process caused a significant improvement in the structural quality of CVD layers. Cathodoluminescence (CL) data and electrical characteristics of Schottky barriers (SB) revealed that the LPE layer also made the concentration profiles of the uncompensated donors and recombination centers for holes as well as the hole diffusion lengths more uniform over the CVD layer. According to CL and secondary ion mass-spectroscopy measurements the presence of aluminum as an impurity was detected in initial commercial wafers, as well as having LPE and CVD epitaxial layers. Forward current-voltage characteristics of SBs formed on CVD layers with and without a LPE buffer layer followed an exponential relationship with an ideality factor of 1.04-1.06 over six to seven orders of magnitude in current density. A noticeable increase of the breakdown voltage was also observed in samples with a LPE layer.
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| 4. |
- Kalinina, E. V., et al.
(författare)
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Effect of irradiation with fast neutrons on electrical characteristics of devices based on CVD 4H-SiC epitaxial layers
- 2003
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Ingår i: Semiconductors (Woodbury, N.Y.). - : Pleiades Publishing Ltd. - 1063-7826 .- 1090-6479. ; 37:10, s. 1229-1233
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Tidskriftsartikel (refereegranskat)abstract
- The effect of irradiation with 1-MeV neutrons on electrical properties of Al-based Schottky barriers and p(+)-n-n(+) diodes doped by ion-implantation with Al was studied; the devices were formed on the basis of high-resistivity, pure 4H-SiC epitaxial layers possessing n-type conductivity and grown by vapor-transport epitaxy. The use of such structures made it possible to study the radiation defects in the epitaxial layer at temperatures as high as 700 K. Rectifying properties of the diode structures were no longer observed after irradiation of the samples with neutrons with a dose of 6 x 10(14) cm(-2); this effect is caused by high (up to 50 GOmega) resistance of the layer damaged by neutron radiation. However, the diode characteristics of irradiated p(+)-n-n(+) structures were partially recovered after an annealing at 650 K.
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| 5. |
- Kalinina, E. V., et al.
(författare)
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Optical and electrical properties of 4H-SiC irradiated with fast neutrons and high-energy heavy ions
- 2004
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Ingår i: Semiconductors (Woodbury, N.Y.). - : Pleiades Publishing Ltd. - 1063-7826 .- 1090-6479. ; 38:10, s. 1187-1191
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Tidskriftsartikel (refereegranskat)abstract
- Photoluminescence and deep-level transient spectroscopy are used to study the effect of irradiation with fast neutrons and high-energy Kr (235 MeV) and Bi (710 MeV) ions on the optical and electrical properties of high-resistivity high-purity n-type 4H-SiC epitaxial layers grown by chemical vapor deposition. Electrical characteristics were studied using the barrier structures based on these epitaxial layers: Schottky barriers with Al and Cr contacts and p(+)-n-n(+) diodes fabricated by Al ion implantation. According to the experimental data obtained, neutrons and high-energy ions give rise to the same defect-related centers. The results show that, even for the extremely high ionization density (34 keV/nm) characteristic of Bi ions, the formation of the defect structure in SiC single crystals is governed by energy losses of particles due to elastic collisions.
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| 6. |
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| 7. |
- Zimmermann, U., et al.
(författare)
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Material defects in 4H-silicon carbide diodes
- 2003
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Ingår i: Journal of Applied Physics. - : AIP Publishing. - 0021-8979 .- 1089-7550. ; 93:1, s. 611-618
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Tidskriftsartikel (refereegranskat)abstract
- Crystallographic defects revealed by synchrotron white beam x-ray topography, electron beam induced current, optical microscopy, and electroluminescence are correlated with the electrical characteristics of medium-voltage epitaxial 4H-silicon carbide diodes. Diodes that include macroscopic crystallographic defects show a significantly reduced reverse breakdown voltage with typical microplasma current fluctuations under reverse bias. Microplasma current paths are revealed by increased electroluminescence both under forward and reverse bias of the diodes and coincide with the locations of screw dislocations in the epitaxial layers of the diodes. The role of crystallographic imperfections on the formation of stacking faults responsible for the degradation of bipolar silicon carbide components is discussed.
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