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- Paskova, T., et al.
(författare)
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6H-SiC crystallinity behaviour upon B implantation studied by Raman scattering
- 1998
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Ingår i: Silicon carbide, III-nitrides and related materials : ICSCIII-N'97. - : Trans Tech Publications Inc.. - 0878497900 ; , s. 741-744
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Konferensbidrag (refereegranskat)abstract
- In this study, B ion implantation was performed in n-type 6H-SiC single crystals at 500 degrees C. The implanted specimens were annealed at 1700 degrees C in SiH4 atmosphere. Lattice damage induced by implantation and its recovery was characterised by Raman scattering. Reduced damage compared with other ions implantation was observed. Recrystallization of the implanted material and absence of amorphous phases was detected after high temperature annealing.
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