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Träfflista för sökning "WFRF:(Wuttig Matthias) srt2:(2011-2014)"

Sökning: WFRF:(Wuttig Matthias) > (2011-2014)

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2.
  • Schmidt, Ruediger M., et al. (författare)
  • Increasing the carbon deposition rate using sputter yield amplification upon serial magnetron co-sputtering
  • 2014
  • Ingår i: Surface & Coatings Technology. - : Elsevier BV. - 0257-8972 .- 1879-3347. ; 252, s. 74-78
  • Tidskriftsartikel (refereegranskat)abstract
    • Deposition of carbon based materials by magnetron sputtering suffers frequently from the low deposition rate of carbon due to its low sputtering yield. Here, we describe an approach based on the so-called sputtering yield amplification, which significantly increases the sputtering yield. Carbon has been doped by serial co-sputtering with two different elements, namely tungsten and niobium. Both elements provide a significant rate increase. Addition of 3 at.% of Nb increases the deposition rate of carbon by 130%, whereas the same concentration of W increases it by 280%. TRIDYN simulations have been performed, which reproduce the experimental data. Additionally, our experiments find evidence for very long residence times of the dopant in the target as a result of recoil implantation.  
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3.
  • Schmidt, Rüdiger, et al. (författare)
  • Sputter Yield Amplification of reactively sputtered TiO2
  • 2011
  • Konferensbidrag (refereegranskat)abstract
    • TiO2 is a material with attractive properties which have led to various applications such as anti-reflective coatings [1] or self cleaning surfaces [2]. One of the most applied deposition techniques used for TiO2 is reactive magnetron sputtering. Unfortunately TiO2 suffers from a comparatively low deposition rate when reactively sputtered.  To increase the deposition rate, Sputter Yield Amplification (SYA) can be used through recoil of the sputtering species at implanted heavy dopants below the target surface [3,4]. Here we present experimental results showing a large increase of the TiO2 deposition rate when doped with Tungsten. Although SYA has been proposed earlier [5], the production of doped targets was complicated. We have built a designated sputter deposition tool which enables systematic studies of SYA. In this study the rate increase by SYA is investigated for two different dopants, namely Tungsten and Bismuth. Bismuth was chosen since it is the heaviest non-radioactive material available. Our experiments show that the rate increase of TiO2 by Bismuth is surprisingly low. Tungsten on the other hand results in a large rate increase of 160% in DC and 220% in HiPIMS mode. A number of additional experiments have been carried out to verify and explain this observation. Finally TRIDYN [6] simulations have been performed which reproduce the experimental results.
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