| 1. |
- Mennerick, Steven, et al.
(författare)
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Selective antagonism of 5alpha-reduced neurosteroid effects at GABA(A) receptors
- 2004
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Ingår i: Molecular Pharmacology. - : American Society for Pharmacology & Experimental Therapeutics (ASPET). - 0026-895X .- 1521-0111. ; 65:5, s. 1191-1197
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Tidskriftsartikel (refereegranskat)abstract
- Although neurosteroids have rapid effects on GABA(A) receptors, study of steroid actions at GABA receptors has been hampered by a lack of pharmacological antagonists. In this study, we report the synthesis and characterization of a steroid analog, (3alpha,5alpha)-17-phenylandrost-16-en-3-ol (17PA), that selectively antagonized neurosteroid potentiation of GABA responses. We examined 17PA using the alpha1beta2gamma2 subunit combination expressed in Xenopus laevis oocytes. 17PA had little or no effect on baseline GABA responses but antagonized both the response augmentation and the direct gating of GABA receptors by 5alpha-reduced potentiating steroids. The effect was selective for 5alpha-reduced potentiating steroids; 5beta-reduced potentiators were only weakly affected. Likewise, 17PA did not affect barbiturate and benzodiazepine potentiation. 17PA acted primarily by shifting the concentration response for steroid potentiation to the right, suggesting the possibility of a competitive component to the antagonism. 17PA also antagonized 5alpha-reduced steroid potentiation and gating in hippocampal neurons and inhibited anesthetic actions in X. laevis tadpoles. Analogous to benzodiazepine site antagonists, the development of neurosteroid antagonists may help clarify the role of GABA-potentiating neurosteroids in health and disease.
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| 2. |
- Du, Chun-Xia, et al.
(författare)
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Efficient 1.54 µm light emission from Si/SiGe/Si : Er
- 2001
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Ingår i: Materials Science & Engineering. - 0921-5107 .- 1873-4944. ; 81:1-3, s. 105-108
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Tidskriftsartikel (refereegranskat)abstract
- Si/SiGe/Si:Er:O-heterojunction bipolar transistor (HBT)-type light emitting devices with Er3+ ions incorporated in the collector region have been fabricated using layered structures prepared by differential molecular beam epitaxy (MBE). Intense light emission at 1.54 µm has been observed at room temperature by hot electron impact excitation at rather low injection current and applied voltage. Separate controls of the injection current and bias voltage make it possible to perform detailed electroluminescence (EL) studies that can not be done with conventional Si:Er light emitting diodes (LEDs). Saturation of the EL intensity occurs at very low current densities indicating a 100-fold increase of the effective excitation cross-section for Si/SiGe/Si:Er:O-HBTs compared with Si:Er-LEDs. © 2001 Elsevier Science B.V.
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| 3. |
- Du, Chun-Xia, et al.
(författare)
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Electroluminescence studies of Er and SiO co-doped Si layers prepared by molecular beam epitaxy
- 2000
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Ingår i: Optical materials (Amsterdam). - 0925-3467 .- 1873-1252. ; 14:3, s. 259-265
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Tidskriftsartikel (refereegranskat)abstract
- Er/O co-doped Si light emitting diodes (LEDs) have been fabricated using layer structures prepared by molecular beam epitaxy (MBE). The Er/O doping was realized by sublimation of elemental Er and silicon monoxide simultaneously with Si during MBE growth. Intense Er-related electroluminescence (EL) at 1.54 mu m was observed at room temperature from p(+)-SiGe/i-SiGe-Si/Si:Er/n(+)-Si LEDs by electron impact excitation under reverse bias. It has been found that the EL intensity was increased with increasing growth temperature of the Si:Er/O layer in the range of 430-575 degrees C. The electrical pumping power dependence of EL intensity has been studied. An excitation cross section value of similar to 1 x 10(-16) cm(2) was estimated based on the experimental data and model fitting. The EL decay behavior under various injection and bias conditions has been studied by time-resolved EL measurements. The overall luminescence decay time is found to strongly depend on the injection parameters. Two types of de-excitation mechanisms due to Auger energy transfer to free carriers introduced by either dopant ionization or carrier injection have been discussed. Both Auger processes play an important role in reduction of the EL intensity when there is a high density of carriers with excited Er ions. (C) 2000 Elsevier Science B.V. All rights reserved.
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| 4. |
- Du, Chun-Xia, et al.
(författare)
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Si/SiGe/Si : Er
- 2001
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Ingår i: Applied Physics Letters. - : AIP Publishing. - 0003-6951 .- 1077-3118. ; 78:12, s. 1697-1699
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Tidskriftsartikel (refereegranskat)abstract
- Si/SiGe/Si:Er:O heterojunction bipolar transistor (HBT) type light-emitting devices with Er3+ ions incorporated in the collector region have been fabricated using a layered structure grown by differential molecular-beam epitaxy. Electroluminescence measurements on processed light-emitting HBTs can be performed in either constant driving current mode or constant applied bias mode, which is an important advantage over conventional Si:Er light-emitting diodes. Intense room-temperature light emission at the Er3+ characteristic wavelength of 1.54 µm has been observed at low driving current density, e.g., 0.1 A cm-2, and low applied bias, e.g., 3 V, across the collector and emitter. © 2001 American Institute of Physics.
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| 5. |
- Duteil, F., et al.
(författare)
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Er/O doped Si1-xGex alloy layers grown by MBE
- 2001
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Ingår i: Optical materials (Amsterdam). - 0925-3467 .- 1873-1252. ; 17:1-2, s. 131-134
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Konferensbidrag (övrigt vetenskapligt/konstnärligt)abstract
- Silicon-based light emitting diodes (LEDs) containing an Er/O-doped Si1-xGex active layer have been studied. The structures were grown by molecular beam epitaxy (MBE), with Er and O concentrations of 5 × 1019 and 1 × 1020 cm-3, respectively, using Er and silicon monoxide sources. The microstructure has been studied by X-ray diffraction (XRD) and cross-sectional transmission electron microscopy, and it is found that Er/O-doped Si0.92Ge0.08 layers of high crystalline quality, can be obtained. Electroluminescence (EL) measurements have been performed on reverse-biased Er/O doped diodes both from the surface and from the edge and the emission at 1.54 µm associated with the Er3+ ions has been studied at 300 K and lower temperatures. To evaluate the possibility to use a Si1-xGex layer for waveguiding in Si-based optoelectronics, studies of the refractive index n of strained Si1-xGex as a function of the Ge concentration have been done by spectroscopic ellipsometry in the range 0.3-1.7 µm. At 1.54 µm the refractive index increases monotonically with the Ge concentration up to n = 3.542 for a Ge concentration of 21.3%. © 2001 Elsevier Science B.V.
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| 6. |
- Duteil, F., et al.
(författare)
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Luminescence and microstructure of Er/O co-doped Si structures grown by MBE using Er and SiO evaporation
- 2000
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Ingår i: Materials Science in Semiconductor Processing. - 1369-8001 .- 1873-4081. ; 3:5-6, s. 523-528
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Tidskriftsartikel (refereegranskat)abstract
- Er and O co-doped Si structures have been prepared using molecular-beam epitaxy (MBE) with fluxes of Er and O obtained from Er and silicon monoxide (SiO) evaporation in high-temperature cells. The incorporation of Er and O has been studied for concentrations of up to 2×1020 and 1×1021 cm-3, respectively. Surface segregation of Er can take place, but with O co-doping the segregation is suppressed and Er-doped layers without any indication of surface segregation can be prepared. Si1-xGex and Si1-yCy layers doped with Er/O during growth at different substrate temperatures show more defects than corresponding Si layers. Strong emission at 1.54µm associated with the intra-4f transition of Er3+ ions is observed in electroluminescence (EL) at room temperature in reverse-biased p-i-n-junctions. To optimize the EL intensity we have varied the Er/O ratio and the temperature during growth of the Er/O-doped layer. Using an Er-concentration of around 1×1020 cm-3 we find that Er/O ratios of 1:2 or 1:4 give higher intensity than 1:1 while the stability with respect to breakdown is reduced for the highest used O concentrations. For increasing growth temperatures in the range 400-575 °C there is an increase in the EL intensity. A positive effect of post-annealing on the photoluminescence intensity has also been observed.
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| 7. |
- Hansson, Göran, et al.
(författare)
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Origin of abnormal temperature dependence of electroluminescence from Er/O-doped Si diodes
- 2001
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Ingår i: Applied Physics Letters. - : AIP Publishing. - 0003-6951 .- 1077-3118. ; 78:15, s. 2104-2106
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Tidskriftsartikel (refereegranskat)abstract
- The temperature dependencies of the current-voltage characteristics and the electroluminescence (EL) intensity of molecular beam epitaxy grown Er/O-doped Si light emitting diodes at reverse bias have been studied. To minimize the scattering of electrons injected from the p-doped Si1-xGex electron emitters, an intrinsic Si layer was used in the depletion region. For many diodes, there is a temperature range where the EL intensity increases with temperature. Data are reported for a structure that shows increasing intensity up to 100°C. This is attributed to an increasing fraction of the pumping current being due to phonon-assisted tunneling, which gives a higher saturation intensity, compared to ionization-dominated breakdown at lower temperatures. © 2001 American Institute of Physics.
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| 8. |
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| 9. |
- Ni, Wei-Xin, et al.
(författare)
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1.54 µm light emitting devices based on Er/O-doped Si layered structures grown by molecular beam epitaxy
- 2001
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Ingår i: Optical materials (Amsterdam). - 0925-3467 .- 1873-1252. ; 17:1-2, s. 65-69
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Konferensbidrag (övrigt vetenskapligt/konstnärligt)abstract
- Two types of Si:Er light emitting devices have been processed and characterized with an aim to efficiently use hot electrons for impact excitation. One is a p+-SiGe/i-Si/n-Si:Er:O/n+-Si tunneling diode with a design favoring electron tunneling from the SiGe valence band to the Si conduction band and subsequent acceleration. Another type of Si:Er light emitters is based on a heterojunction bipolar transistor (HBT) structure containing an Er-doped active layer in the collector. In these devices, one can introduce hot electrons from the HBT emitter in a controlled way with a collector bias voltage prior to the avalanche breakdown to improve the impact excitation efficiency. Intense electroluminescence was observed at 300 K at low current (0.1 A cm-2) and low bias (3 V). An impact cross-section value of 1 × 10-14 cm2 has been estimated, which is a 100-fold increase compared with the values reported from any other type of Er-doped LEDs. © 2001 Elsevier Science B.V.
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| 10. |
- Ni, Wei-Xin, et al.
(författare)
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Light emitting SiGe/i-Si/Si : Er
- 2000
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Ingår i: Thin Solid Films. - 0040-6090 .- 1879-2731. ; 369:1, s. 414-418
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Tidskriftsartikel (refereegranskat)abstract
- p+-SiGe/i-Si/n-Si:Er:O/n+-Si tunneling diodes have been processed using layer structures prepared by molecular beam epitaxy (MBE). Electroluminescence has been observed at room temperature from these devices at reverse bias. The devices have been used for characterizing the optical activation of Er3+ ions in MBE Si:Er:O layers grown at different conditions. In the range of 400-575 °C, a high substrate temperature is favored for formation of Er emission centers, but this is limited by the silicidation process occurring above 600 °C. Several important device parameters such as the impact excitation cross section and various EL decay processes have been carefully studied. A fast decay (approximately 4 µs) due to the Auger carrier transfer process is observed.
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