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Träfflista för sökning "WFRF:(Yu B. X.) srt2:(2000-2004)"

Sökning: WFRF:(Yu B. X.) > (2000-2004)

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1.
  • Abreu, P., et al. (författare)
  • Study of dimuon production in photon-photon collisions and measurement of QED photon structure functions at LEP
  • 2001
  • Ingår i: European Physical Journal C. - : Springer Science and Business Media LLC. - 1434-6044 .- 1434-6052. ; 19:1, s. 15-28
  • Tidskriftsartikel (refereegranskat)abstract
    • Muon pair production in the process e+e- → e+e- μ+μ- is studied using the data taken at LEP1 (√s ≃ mz) with the DELPHI detector during the years 1992-1995. The corresponding integrated luminosity is 138.5 pb-1. The QED predictions have been tested over the whole Q2 range accessible at LEP1 (from several GeV2/c4 to several hundred GeV2/c4) by comparing experimental distributions with distributions resulting from Monte Carlo simulations using various generators. Selected events are used to extract the leptonic photon structure function Fγ 2. Azimuthal correlations are used to obtain information on additional structure functions, Fγ A and Fγ B, which originate from interference terms of the scattering amplitudes. The measured ratios Fγ A/Fγ 2 and FγB/Fγ 2 are significantly different from zero and consistent with QED predictions.
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2.
  • Zheng, W.T., et al. (författare)
  • Chemical bonding, structure, and hardness of carbon nitride thin films
  • 2000
  • Ingår i: Diamond and related materials. - 0925-9635 .- 1879-0062. ; 9:9-10, s. 1790-1794
  • Konferensbidrag (övrigt vetenskapligt/konstnärligt)abstract
    • Carbon nitride films are deposited on Si(001) substrates by reactive d.c. magnetron sputtering graphite in a pure N2 discharge. The chemical bonding and structure of carbon nitride films were probed using Fourier transformation infrared (FTIR) and near edge X-ray absorption fine structure (NEXAFS), and the hardness was evaluated using nanoindentation experiments. The structure and hardness for the films are dependent on the substrate temperature (T(s)). FTIR and NEXAFS spectra show that N atoms are bound to sp1, sp2 and sp3 hybridized C atoms, and the intensity of p(*) resonance for C1s NEXAFS spectra is the lowest for the film grown at T(s) = 350°C, having a turbostratic-like structure, high hardness and stress. The correlation between the structure and hardness of carbon nitride films is discussed. (C) 2000 Elsevier Science S.A. All rights reserved.Carbon nitride films are deposited on Si(001) substrates by reactive d.c. magnetron sputtering graphite in a pure N2 discharge. The chemical bonding and structure of carbon nitride films were probed using Fourier transformation infrared (FTIR) and near edge X-ray absorption fine structure (NEXAFS), and the hardness was evaluated using nanoindentation experiments. The structure and hardness for the films are dependent on the substrate temperature (Ts). FTIR and NEXAFS spectra show that N atoms are bound to sp1, sp2 and sp3 hybridized C atoms, and the intensity of p* resonance for C1s NEXAFS spectra is the lowest for the film grown at Ts = 350°C, having a turbostratic-like structure, high hardness and stress. The correlation between the structure and hardness of carbon nitride films is discussed.
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