Sökning: id:"swepub:oai:DiVA.org:liu-160243" >
Reactive magnetron ...
Reactive magnetron sputtering of tungsten target in krypton/trimethylboron atmosphere
-
- Magnuson, Martin, 1965- (författare)
- Linköpings universitet,Tunnfilmsfysik,Tekniska fakulteten
-
- Tengdelius, Lina, 1986- (författare)
- Linköpings universitet,Tunnfilmsfysik,Tekniska fakulteten
-
- Eriksson, Fredrik, 1975- (författare)
- Linköpings universitet,Tunnfilmsfysik,Tekniska fakulteten
-
visa fler...
-
- Samuelsson, Mattias, 1976- (författare)
- Linköpings universitet,Nanodesign,Tekniska fakulteten
-
- Broitman, Esteban, 1958- (författare)
- Linköpings universitet,Tunnfilmsfysik,Tekniska fakulteten
-
- Greczynski, Grzegorz, 1973- (författare)
- Linköpings universitet,Tunnfilmsfysik,Tekniska fakulteten
-
- Hultman, Lars, Professor, 1960- (författare)
- Linköpings universitet,Tunnfilmsfysik,Tekniska fakulteten
-
- Högberg, Hans, 1968- (författare)
- Linköpings universitet,Tunnfilmsfysik,Tekniska fakulteten
-
visa färre...
-
(creator_code:org_t)
- Elsevier, 2019
- 2019
- Engelska.
-
Ingår i: Thin Solid Films. - : Elsevier. - 0040-6090 .- 1879-2731. ; 688
- Relaterad länk:
-
https://arxiv.org/ab...
-
visa fler...
-
https://liu.diva-por... (primary) (Raw object)
-
http://arxiv.org/pdf...
-
https://urn.kb.se/re...
-
https://doi.org/10.1...
-
visa färre...
Abstract
Ämnesord
Stäng
- W-B-C films were deposited on Si(100) substrates held at elevated temperature by reactive sputtering from a W target in Kr/trimethylboron (TMB) plasmas. Quantitative analysis by Xray photoelectron spectroscopy (XPS) shows that the films are W-rich between ~ 73 and ~ 93 at.% W. The highest metal content is detected in the film deposited with 1 sccm TMB. The C and B concentrations increase with increasing TMB flow to a maximum of ~18 and ~7 at.%, respectively, while the O content remains nearly constant at 2-3 at.%. Chemical bonding structure analysis performed after samples sputter-cleaning reveals C-W and B-W bonding and no detectable W-O bonds. During film growth with 5 sccm TMB and 500 o C or with 10 sccm TMB and 300-600 o C thin film X-ray diffraction shows the formation of cubic 100-oriented WC1-x with a possible solid solution of B. Lower flows and lower growth temperatures favor growth of W and W2C, respectively. Depositions at 700 and 800 o C result in the formation of WSi2 due to a reaction with the substrate. At 900 o C, XPS analysis shows ~96 at.% Si in the film due to Si interdiffusion. Scanning electron microscopy images reveal a fine-grained microstructure for the deposited WC1-x films. Nanoindentation gives hardness values in the range from ~23 to ~31 GPa and reduced elastic moduli between ~220 and 280 GPa in the films deposited at temperatures lower than 600 o C. At higher growth temperatures the hardness decreases by a factor of 3 to 4 following the formation of WSi2 at 700-800 o C and Si-rich surface at 900 o C.
Ämnesord
- NATURVETENSKAP -- Kemi -- Oorganisk kemi (hsv//swe)
- NATURAL SCIENCES -- Chemical Sciences -- Inorganic Chemistry (hsv//eng)
Nyckelord
- W-B-C films
- reactive magnetron sputtering
- trimethylboron
- nanoindentation
- Xray photoelectron spectroscopy
- thin film X-ray diffraction
- Scanning Electron Microscope
Publikations- och innehållstyp
- ref (ämneskategori)
- art (ämneskategori)
Hitta via bibliotek
Till lärosätets databas
- Av författaren/redakt...
-
Magnuson, Martin ...
-
Tengdelius, Lina ...
-
Eriksson, Fredri ...
-
Samuelsson, Matt ...
-
Broitman, Esteba ...
-
Greczynski, Grze ...
-
visa fler...
-
Hultman, Lars, P ...
-
Högberg, Hans, 1 ...
-
visa färre...
- Om ämnet
-
- NATURVETENSKAP
-
NATURVETENSKAP
-
och Kemi
-
och Oorganisk kemi
- Artiklar i publikationen
-
Thin Solid Films
- Av lärosätet
-
Linköpings universitet