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Sökning: WFRF:(Lu Tien Chang) > (2021)

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1.
  • Hong, Kuo Bin, et al. (författare)
  • Monolithic high-index contrast grating mirror for a GaN-based vertical-cavity surface-emitting laser
  • 2021
  • Ingår i: Photonics Research. - 2327-9125. ; 9:11, s. 2214-2221
  • Tidskriftsartikel (refereegranskat)abstract
    • In this paper, a pulsed electrically pumped GaN-based vertical-cavity surface-emitting laser (VCSEL) with one dielectric distributed Bragg reflector and one n-GaN monolithic high-index contrast grating (MHCG) mirror was demonstrated at room temperature. The reflectance of the n-GaN MHCG and cavity mode behaviors of the VCSEL with MHCG for varying n-GaN thickness, MHCG pattern diameter, and current aperture size were numerically investigated. Measured characteristics of the fabricated device showed that the lasing action started at an injection current of 10.2 mA, corresponding to a current density of about 15.1 kA=cm2. Above threshold, the measured slope efficiency was 6.2 × 10−3 W∕A, and the output power was 0.13 mW at 30 mA. Moreover, the measured lasing peak occurring at 403.4 nm and the longitudinal mode spacing of 5.6 nm were in good agreement with simulations. The incorporation of an n-GaN MHCG mirror not only greatly simplified the fabrication but also substantially improved the lasing characteristics in comparison to the previous work applying TiO2 HCG mirrors.
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2.
  • Marciniak, Magdalena, et al. (författare)
  • Impact of Stripe Shape on the Reflectivity of Monolithic High Contrast Gratings
  • 2021
  • Ingår i: ACS Photonics. - : American Chemical Society (ACS). - 2330-4022. ; 8:11, s. 3173-3184
  • Tidskriftsartikel (refereegranskat)abstract
    • Monolithic high contrast gratings (MHCGs) composed of a one-dimensional grating patterned in a monolithic layer provide up to 100% optical power reflectance and can be fabricated in almost any semiconductor and dielectric material used in modern optoelectronics. MHCGs enable monolithic integration, polarization selectivity, and versatile phase tuning. They can be from 10 to 20 times thinner than distributed Bragg reflectors. The subwavelength dimensions of MHCGs significantly reduce the possibility of ensuring the smoothness of the sidewalls of the MHCG stripes and make precise control of the shape of the MHCG stripe cross-section difficult during the etching process. The question is then whether it is more beneficial to improve the etching methods to obtain a perfect cross-section shape, as assumed by the design, or whether it is possible to find geometrical parameters that enable high optical power reflectance using the shape that a given etching method provides. Here, we present a numerical study supported by the experimental characterization of MHCGs fabricated in various materials using a variety of common surface nanometer-scale shaping methods. We demonstrate that MHCG stripes with an arbitrary cross-section shape can provide optical power reflectance of nearly 100%, which greatly relaxes their fabrication requirements. Moreover, we show that optical power reflectance exceeding 99% with a record spectral bandwidth of more than 20% can be achieved for quasi-Trapezoidal cross-sections of MHCGs. We also show that sidewall corrugations of the MHCG stripes have only a slight impact on MHCG optical power reflectance if the amplitude of the corrugation is less than 16% of the MHCG period. This level of stripe fabrication precision can be achieved using the most current surface etching methods. Our results are significant for the design and production of a variety of photonic devices employing MHCGs. The flexibility with regard to cross-section shape facilitates the reliable fabrication of highly reflective subwavelength grating mirrors. This in turn will enable the manufacture of monolithically integrated high-quality-factor optical micro-and nanocavity devices.
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