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Search: WFRF:(von Fieandt Linus) > (2019)

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1.
  • Fritze, Stefan, et al. (author)
  • Influence of Deposition Temperature on the Phase Evolution of HfNbTiVZr High-Entropy Thin Films
  • 2019
  • In: Materials. - : MDPI. - 1996-1944. ; 12:4
  • Journal article (peer-reviewed)abstract
    • In this study, we show that the phase formation of HfNbTiVZr high-entropy thin films is strongly influenced by the substrate temperature. Films deposited at room temperature exhibit an amorphous microstructure and are 6.5 GPa hard. With increasing substrate temperature (room temperature to 275 degrees C), a transition from an amorphous to a single-phased body-centred cubic (bcc) solid solution occurs, resulting in a hardness increase to 7.9 GPa. A higher deposition temperature (450 degrees C) leads to the formation of C14 or C15 Laves phase precipitates in the bcc matrix and a further enhancement of mechanical properties with a peak hardness value of 9.2 GPa. These results also show that thin films follow different phase formation pathways compared to HfNbTiVZr bulk alloys.
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2.
  • von Fieandt, Linus, et al. (author)
  • Texture formation in chemical vapor deposition of Ti(C,N)
  • 2019
  • In: Journal of Crystal Growth. - : Elsevier BV. - 0022-0248 .- 1873-5002. ; 508, s. 90-95
  • Journal article (peer-reviewed)abstract
    • The growth mechanism of Ti(C,N) coatings produced by chemical vapor deposition was investigated as a function of the TiCl4/CH3CN molar ratio in excess of H-2. The depositions were carried out at a total pressure of 8 kPa, using single crystalline (0 0 l) alpha-Al2O3 substrates. The Ti(C,N) coatings were characterized by X-ray diffraction, X-ray photoelectron spectroscopy and scanning electron microscopy. The investigated coatings were between 6 and 13 mu m thick. The reaction orders of TiCl4 CH3CN were determined to 0 and 1, respectively, showing that CH3CN is the rate-determining reactant. The preferred orientation of the deposited Ti(C,N) was investigated, showing that molar ratios TiCl4 /CH3CN higher than 2.5 lead to < 2 1 1 >/< 3 1 1 > oriented coatings. A formation mechanism for the < 2 1 1 >/< 3 1 1 > orientations is suggested. Such high ratios lead to the formation of Ti {1 1 1} twinning planes, which provide surface sites that can facilitate fast dissociation of the strong cyanide bond, and thereby cause faster growth in the < 2 1 1 >/< 3 1 1 > directions. Coatings deposited at lower molar ratios show a pronounced < 1 1 1 > out-of-plane orientation, characterized by a {1 1 1} rocking curve yielding values for full width at half maximum (FWHM) below 0.5 degrees.
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