| 31. |
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| 32. |
- Caroff, Philippe, et al.
(författare)
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InAs film grown on Si(111) by Metalorganic Vapor Phase Epitaxy
- 2008
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Ingår i: Journal of Physics: Conference Series. - : IOP Publishing. - 1742-6588 .- 1742-6596. ; 100, s. 042017-042017
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Konferensbidrag (refereegranskat)abstract
- We report the successful growth of high quality InAs films directly on Si( 111) by Metal Organic Vapor Phase Epitaxy. A nearly mirror-like and uniform InAs film is obtained at 580 C for a thickness of 2 mu m. We measured a high value of the electron mobility of 5100 cm(2)/Vs at room temperature. The growth is performed using a standard two-step procedure. The influence of the nucleation layer, group V flow rate, and layer thickness on the electrical and morphological properties of the InAs film have been investigated. We present results of our studies by Atomic Force Microscopy, Scanning Electron Microscopy, electrical Hall/van der Pauw and structural X-Ray Diffraction characterization.
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| 33. |
- Caroff, Philippe, et al.
(författare)
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InSb heterostructure nanowires: MOVPE growth under extreme lattice mismatch.
- 2009
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Ingår i: Nanotechnology. - : IOP Publishing. - 0957-4484 .- 1361-6528. ; 20:49
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Tidskriftsartikel (refereegranskat)abstract
- We demonstrate the growth of InSb-based nanowire heterostructures by metalorganic vapour phase epitaxy and use it to integrate InSb on extremely lattice-mismatched III-V nanowire templates made of InAs, InP, and GaAs. Influence of temperature, V/III ratio, and diameter are investigated in order to investigate the growth rate and morphology. The range of growth temperatures used for InSb nanowire growth is very similar to that used for planar growth due to the nature of the precursor decomposition. This makes optimization of growth parameters very important, and more difficult than for most other nanowire III-V materials. Analysis of the InSb nanowire epitaxial quality when grown on InAs, InP, and GaAs, along with InSb segment and particle compositions are reported. This successful direct integration of InSb nanowires, on nanowire templates with unprecedented strain levels show great promise for fabrication of vertical InSb devices.
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| 34. |
- Delker, Collin J., et al.
(författare)
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1/f Noise Sources in Dual-Gated Indium Arsenide Nanowire Transistors
- 2012
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Ingår i: IEEE Transactions on Electron Devices. - 0018-9383. ; 59:7, s. 1980-1987
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Tidskriftsartikel (refereegranskat)abstract
- 1/f noise is studied in dual-gated InAs nanowire transistors consisting of an omega top gate with high-k atomic layer deposited dielectric and silicon dioxide to substrate back gate. Noise spectra at varying gate bias combinations are compared from devices with differing top-gate lengths to separate the noise contributions of the top-gated channel from the ungated access portion, including the metal-nanowire contacts. For a given device geometry, it is possible to bias the device into four different regimes where the resistance and the noise amplitude can each be independently dominated by either the channel or the access/contact regions. When the device is fully in the on state, the access/contact regions dominate both resistance and noise. When the device is operating near or below threshold, the channel dominates resistance and noise. For the lowest amount of overall 1/f noise, most of the nanowire should be covered by the top gate, minimizing the access region length.
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| 35. |
- Dey, Anil, et al.
(författare)
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15 nm diameter InAs nanowire MOSFETs
- 2011
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Ingår i: [Host publication title missing]. - 1548-3770. ; , s. 21-22
-
Konferensbidrag (refereegranskat)abstract
- InAs is an attractive channel material for III–V nanowire MOSFETs and early prototype high performance nanowire transistors have been demonstrated1. As the gate length is reduced, the nanowire diameter must be scaled quite aggressively in order to suppress short-channel effects2. However, a reduction in transconductance (gm) and drive current (ION) could be expected due to increased surface scattering for thin wires. We present data for the device properties of thin InAs nanowires, with diameters in the 15 nm range, and investigate possible improvements of the performance focusing on transistor applications. In order to boost ION, the source and drain resistance need to be reduced. Several doping sources were therefore evaluated in the study, among them selenium (Se), tin (Sn) and sulphur (S) to form n-i-n structures. We report very high current densities, up to 33 MA/cm2, comparable to modern HEMTs3, and a normalized transconductance of 1.8 S/mm for a nanowire with an intrinsic segment of nominally 150 nm and a diameter of 15 nm.
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| 36. |
- Dey, Anil, et al.
(författare)
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GaSb nanowire pFETs for III-V CMOS
- 2013
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Ingår i: IEEE Device Research Conference. Proceedings. - 1548-3770. ; , s. 13-14
-
Konferensbidrag (refereegranskat)
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| 37. |
- Dey, Anil, et al.
(författare)
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High Current Density InAsSb/GaSb Tunnel Field Effect Transistors
- 2012
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Ingår i: Device research conference. - 1548-3770. ; , s. 205-206
-
Konferensbidrag (refereegranskat)abstract
- Steep-slope devices, such as tunnel field-effect transistors (TFETs), have recently gained interest due to their potential for low power operation at room temperature. The devices are based on inter-band tunneling which could limit the on-current since the charge carriers must tunnel through a barrier to traverse the device. The InAs/GaSb heterostructure forms a broken type II band alignment which enables inter-band tunneling without a barrier, allowing high on-currents. We have recently demonstrated high current density (Ion,reverse = 17.5 mA/µm) nanowire Esaki diodes and in this work we investigate the potential of InAs/GaSb heterostructure nanowires to operate as TFETs. We present device characterization of InAs 0.85 Sb 0.15 /GaSb nanowire TFETs, which exhibit record-high on-current levels.
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| 38. |
- Dey, Anil, et al.
(författare)
-
High-Current GaSb/InAs(Sb) Nanowire Tunnel Field-Effect Transistors
- 2013
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Ingår i: IEEE Electron Device Letters. - 0741-3106. ; 34:2, s. 211-213
-
Tidskriftsartikel (refereegranskat)abstract
- We present electrical characterization of GaSb/InAs(Sb) nanowire tunnel field-effect transistors. The broken band alignment of the GaSb/InAs(Sb) heterostructure is exploited to allow for interband tunneling without a barrier, leading to high ON-current levels. We report a maximum drive current of 310 μA/μm at Vds = 0.5 V. Devices with scaled gate oxides display transconductances up to gm = 250 mS/mm at Vds = 300 mV, which are normalized to the nanowire circumference at the axial heterojunction.
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| 39. |
- Dey, Anil, et al.
(författare)
-
High-performance 15 nm diameter InAs nanowire Ω-gate MOSFETs
- 2012
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Konferensbidrag (refereegranskat)abstract
- In this paper we present 15 nm InAs nanowire lateral MOSFETs with an Ω-gate. The nanowires are grown from size-selected Au-aerosols by means of metal-organic vapor phase epixtaxy (MOVPE). In order to reduce the source and drain resistances, n-type dopants were introduced in the bottom and top parts of the nanowire forming a n-i-n structure. We report experimental data for 15 nm InAs nanowire MOSFETs, LG = 150 nm, with a normalized transconducatance gm = 0.7 S/mm (normalized to the circumference) and a current density Je = 24 MA/cm, comparable to modern high electron mobility transistors (HEMTs)
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| 40. |
- Dey, Anil, et al.
(författare)
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High-Performance InAs Nanowire MOSFETs
- 2012
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Ingår i: IEEE Electron Device Letters. - 0741-3106. ; 33:6, s. 791-793
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Tidskriftsartikel (refereegranskat)abstract
- In this letter, we present a 15-nm-diameter InAs nanowire MOSFET with excellent on and off characteristics. An n-i-n doping profile was used to reduce the source and drain resistances, and an Al2O3/HfO2 bilayer was introduced in the high-k process. The nanowires exhibit high drive currents, up to 1.25 A/mm, normalized to the nanowire circumference, and current densities up to 34 MA/cm2 (VD = 0.5 V). For a nominal LG = 100 nm, we observe an extrinsic transconductance (gm) of 1.23 S/mm and a subthreshold swing of 93 mV/decade at VD = 10 mV.
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