| 1. |
- Astromskas, Gvidas, et al.
(författare)
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Doping Incorporation in InAs nanowires characterized by capacitance measurements
- 2010
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Ingår i: Journal of Applied Physics. - : AIP Publishing. - 0021-8979 .- 1089-7550. ; 108
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Tidskriftsartikel (refereegranskat)abstract
- Sn and Se doped InAs nanowires are characterized using a capacitance-voltage technique where the threshold voltages of nanowire capacitors with different diameter are determined and analyzed using an improved radial metal-insulator-semiconductor field-effect transistor model. This allows for a separation of doping in the core of the nanowire from the surface charge at the side facets of the nanowire. The data show that the doping level in the InAs nanowire can be controlled on the level between 2×1018 to 1×1019 cm−3, while the surface charge density exceeds 5×1012 cm−2 and is shown to increase with higher dopant precursor molar fraction.
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| 2. |
- Astromskas, Gvidas, et al.
(författare)
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Temperature and frequency characterization of InAs nanowire and HfO2 interface using capacitance-voltage method
- 2011
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Ingår i: Microelectronic Engineering. - : Elsevier BV. - 1873-5568 .- 0167-9317. ; 88:4, s. 444-447
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Konferensbidrag (refereegranskat)abstract
- InAs/HfO2 nanowire capacitors using capacitance-voltage (CV) measurements are investigated in the range of 10 kHz to 10 MHz. The capacitors are based on vertical nanowire arrays that are coated with an 8 nm-thick HfO2 layer by atomic layer deposition. CV characteristics are measured at temperatures in the range between -140 and 40 degrees C and the CV characteristics for nanowires with different Sn and Se n-type doping levels are compared. The comparison of the data at various doping levels points towards large number of traps for highly doped samples, caused by the preferential dopant precursor incorporation at the nanowire surface. We also evaluate the frequency dispersion of the accumulation capacitance and determine values below 2% with weak temperature dependence, indicating the existence of border traps in these nanowire capacitors. (C) 2010 Elsevier B.V. All rights reserved.
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| 3. |
- Borgström, Magnus, et al.
(författare)
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Site control of InAs quantum dots on a patterned InP surface: As/P exchange reactions
- 2003
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Ingår i: Journal of Crystal Growth. - 0022-0248. ; 248, s. 310-316
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Tidskriftsartikel (refereegranskat)abstract
- In this paper. we present the effect of annealing temperature and annealing time on InAs site-controlled quantum dot growth. Individual InAs quantum dots formed by self-assembling have been positioned into holes, created by partial overgrowth of electron beam induced nano-carbon deposits by metal organic vapor phase epitaxy. As/P exchange reactions produce material sufficient for selective dot nucleation in the holes. Results. showing that As/P exchange reactions occur even when capping the dots with InP are presented. (C) 2002 Elsevier Science B.V. All rights reserved.
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| 4. |
- Borgström, Magnus, et al.
(författare)
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Site-control of InAs quantum dots on a patterned InP surface: As/P exchange reactions
- 2002
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Ingår i: 7th International Conference on Nanometer-Scale Science and Technology and 21st European Conference on Surface Science.
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Konferensbidrag (refereegranskat)abstract
- We present the effect of annealing temperature and annealing time on InAs/InP site-controlled quantum dot growth. Electron beam pre-patterning forms carbon nano-deposits at the InP surface, which then can be used as growth masks to form nano-holes at the surface. By only annealing of the patterned InP surface under an arsine ambient, As/P exchange reactions produce material sufficient for selective dot nucleation in the holes at the surface
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| 5. |
- Bryllert, Tomas, et al.
(författare)
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Designed emitter states in resonant tunneling through quantum dots
- 2002
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Ingår i: Applied Physics Letters. - : AIP Publishing. - 0003-6951 .- 1077-3118. ; 80:15, s. 2681-2683
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Tidskriftsartikel (refereegranskat)abstract
- Resonant tunneling through a single layer of self-assembled quantum dots (QDs) is compared to tunneling through two layers of vertically aligned (stacked) dots. The difference can be viewed as going from a two-dimensional emitter to a zero-dimensional emitter. The temperature dependence of current peaks originating in tunneling through individual QDs and individual stacks is used to clarify this point. In addition, we show that the statistical size distribution of self-assembled quantum dots causing the inhomogeneous broadening in luminescence experiments can be analyzed in a resonant tunneling experiment. (C) 2002 American Institute of Physics.
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| 6. |
- Bryllert, Tomas, et al.
(författare)
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Resonant tunneling through coupled self-assembled quantum dots and the influence of inhomogeneous broadening
- 2002
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Ingår i: 7th International Conference on Nanometer-Scale Science and Technology and 21st European Conference on Surface Science.
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Konferensbidrag (refereegranskat)abstract
- Resonant tunneling through a single layer of self-assembled quantum dots (QDs) as well as tunneling through two layers of vertically aligned (stacked) dots is investigated. The difference between single and double layers of QDs can be viewed as going from a two-dimensional emitter to a zero-dimensional emitter. By fabricating small-area devices we are able to probe single stacks of quantum dots, revealing details of the coupling between the stacked dots. Very sharp resonances, with peak-to-valley ratios of several hundred, have been measured in the current-voltage characteristics. We also show that the statistical size distribution of self-assembled quantum dots causing the inhomogeneous broadening in luminescence experiments can be analysed in a resonant tunneling experiment
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| 7. |
- Bryllert, Tomas, et al.
(författare)
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Transport through an isolated artificial molecule formed from stacked self-assembled quantum dots
- 2003
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Ingår i: Applied Physics Letters. - : AIP Publishing. - 0003-6951 .- 1077-3118. ; 82:16, s. 2655-2657
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Tidskriftsartikel (refereegranskat)abstract
- We investigate resonant tunneling through two coupled self-assembled quantum dots. The strong confinement and the high crystalline quality provided by the self-assembled dots, in combination with the tunneling coupling between the dots, create a system that may be thought of as an artificial molecule. We are able to isolate one single artificial molecule and detailed investigations of the electrical properties are performed. Peak-to-valley ratios above 1000 and full width half maximum of a few millivolts are measured at 4 K. By changing the temperature we also observe Coulomb blockade effects in a different way. (C) 2003 American Institute of Physics.
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| 8. |
- Dey, Anil, et al.
(författare)
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15 nm diameter InAs nanowire MOSFETs
- 2011
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Ingår i: [Host publication title missing]. - 1548-3770. ; , s. 21-22
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Konferensbidrag (refereegranskat)abstract
- InAs is an attractive channel material for III–V nanowire MOSFETs and early prototype high performance nanowire transistors have been demonstrated1. As the gate length is reduced, the nanowire diameter must be scaled quite aggressively in order to suppress short-channel effects2. However, a reduction in transconductance (gm) and drive current (ION) could be expected due to increased surface scattering for thin wires. We present data for the device properties of thin InAs nanowires, with diameters in the 15 nm range, and investigate possible improvements of the performance focusing on transistor applications. In order to boost ION, the source and drain resistance need to be reduced. Several doping sources were therefore evaluated in the study, among them selenium (Se), tin (Sn) and sulphur (S) to form n-i-n structures. We report very high current densities, up to 33 MA/cm2, comparable to modern HEMTs3, and a normalized transconductance of 1.8 S/mm for a nanowire with an intrinsic segment of nominally 150 nm and a diameter of 15 nm.
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| 9. |
- Dey, Anil, et al.
(författare)
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High-performance 15 nm diameter InAs nanowire Ω-gate MOSFETs
- 2012
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Konferensbidrag (refereegranskat)abstract
- In this paper we present 15 nm InAs nanowire lateral MOSFETs with an Ω-gate. The nanowires are grown from size-selected Au-aerosols by means of metal-organic vapor phase epixtaxy (MOVPE). In order to reduce the source and drain resistances, n-type dopants were introduced in the bottom and top parts of the nanowire forming a n-i-n structure. We report experimental data for 15 nm InAs nanowire MOSFETs, LG = 150 nm, with a normalized transconducatance gm = 0.7 S/mm (normalized to the circumference) and a current density Je = 24 MA/cm, comparable to modern high electron mobility transistors (HEMTs)
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| 10. |
- Dey, Anil, et al.
(författare)
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High-Performance InAs Nanowire MOSFETs
- 2012
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Ingår i: IEEE Electron Device Letters. - 0741-3106. ; 33:6, s. 791-793
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Tidskriftsartikel (refereegranskat)abstract
- In this letter, we present a 15-nm-diameter InAs nanowire MOSFET with excellent on and off characteristics. An n-i-n doping profile was used to reduce the source and drain resistances, and an Al2O3/HfO2 bilayer was introduced in the high-k process. The nanowires exhibit high drive currents, up to 1.25 A/mm, normalized to the nanowire circumference, and current densities up to 34 MA/cm2 (VD = 0.5 V). For a nominal LG = 100 nm, we observe an extrinsic transconductance (gm) of 1.23 S/mm and a subthreshold swing of 93 mV/decade at VD = 10 mV.
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