| 1. |
- Afzal, Wasif, et al.
(författare)
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The MegaM@Rt2 ECSEL project : MegaModelling at Runtime – Scalable model-based framework for continuous development and runtime validation of complex systems
- 2018
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Ingår i: Microprocessors and microsystems. - : Elsevier B.V.. - 0141-9331 .- 1872-9436. ; 61, s. 86-95
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Tidskriftsartikel (refereegranskat)abstract
- A major challenge for the European electronic industry is to enhance productivity by ensuring quality of development, integration and maintenance while reducing the associated costs. Model-Driven Engineering (MDE) principles and techniques have already shown promising capabilities, but they still need to scale up to support real-world scenarios implied by the full deployment and use of complex electronic components and systems. Moreover, maintaining efficient traceability, integration, and communication between two fundamental system life cycle phases (design time and runtime) is another challenge requiring the scalability of MDE. This paper presents an overview of the ECSEL 1 project entitled “MegaModelling at runtime – Scalable model-based framework for continuous development and runtime validation of complex systems” (MegaM@Rt2), whose aim is to address the above mentioned challenges facing MDE. Driven by both large and small industrial enterprises, with the support of research partners and technology providers, MegaM@Rt2 aims to deliver a framework of tools and methods for: 1) system engineering/design and continuous development, 2) related runtime analysis and 3) global models and traceability management. Diverse industrial use cases (covering strategic domains such as aeronautics, railway, construction and telecommunications) will integrate and demonstrate the validity of the MegaM@Rt2 solution. This paper provides an overview of the MegaM@Rt2 project with respect to its approach, mission, objectives as well as to its implementation details. It further introduces the consortium as well as describes the work packages and few already produced deliverables.
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| 2. |
- Chen, W. H., et al.
(författare)
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Nanophotonics-based low-temperature PECVD epitaxial crystalline silicon solar cells
- 2016
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Ingår i: Journal of Physics D: Applied Physics. - : IOP Publishing. - 1361-6463 .- 0022-3727. ; 49:12
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Tidskriftsartikel (refereegranskat)abstract
- The enhancement of light absorption via nanopatterning in crystalline silicon solar cells is becoming extremely important with the decrease of wafer thickness for the further reduction of solar cell fabrication cost. In order to study the influence of nanopatterning on crystalline silicon thin-film solar cells, we applied two lithography techniques (laser interference lithography and nanoimprint lithography) combined with two etching techniques (dry and wet) to epitaxial crystalline silicon thin films deposited via plasma-enhanced chemical vapor deposition at 175 degrees C. The influence of nanopatterning with different etching profiles on solar cell performance is studied. We found that the etching profiles (pitch, depth and diameter) have a stronger impact on the passivation quality (open circuit voltage and fill factor) than on the optical performance (short circuit current density) of the solar cells. We also show that nanopatterns obtained via wet-etching can improve solar cell performance; and in contrast, dry-etching leads to poor passivation related to the etching profile, surface damage, and/ or contamination introduced during the etching process.
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