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| 2. |
- Beck, Marc, et al.
(författare)
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Nanoelectrochemical transducers for (bio-) chemical sensor applications fabricated by nanoimprint lithography
- 2004
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Ingår i: Microelectronic Engineering. - 1873-5568. ; 73-74, s. 837-842
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Tidskriftsartikel (refereegranskat)abstract
- Nanometer-structured transducers for commercial use in pharmaceutical, medical or (bio-) chemical analysis have so far been hardly accessible since they could not be produced by parallel lithography techniques at reasonable costs. We introduce here a method on. how to fabricate nanometer-structured interdigitated array electrodes including interconnections and bond pads in the micrometer range in a single imprint step on 2-in. wafer scale. The method enables the mass production of those devices at lowest cost opening a new field for the commercial use of nanometer-structured sensor systems.
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| 3. |
- Bunk, Richard, et al.
(författare)
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Guiding molecular motors with nano-imprinted structures
- 2005
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Ingår i: Japanese Journal of Applied Physics. - 0021-4922. ; 44:5A, s. 3337-3340
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Tidskriftsartikel (refereegranskat)abstract
- This work, for the first time, demonstrates that nano-imprinted samples, with 100 nm wide polymer lines, can act as guides for molecular motors consisting of motor proteins actin and myosin. The motor protein function was characterized using fluorescence microscopy and compared to actomyosin motility on non-structured nitrocellulose surfaces. Our results open for further use of the nano-imprint technique in the production of disposable chips for bio-nanotechnological applications and miniaturized biological test systems. We discuss how the nano-imprinted motor protein assay system may be optimized and also how it compares to previously tested assay systems involving low-resolution UV-lithography and low throughput but high-resolution electron beam lithography.
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| 4. |
- Carlberg, Patrick
(författare)
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Development of Nanoimprint Lithography for Applications in Electronics, Photonics and Life-sciences
- 2007
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Doktorsavhandling (övrigt vetenskapligt/konstnärligt)abstract
- This thesis describes different aspects of nanotechnology manufacturing with nanoimprint lithography (NIL), a relatively new nanofabrication tool capable of high resolution and high throughput. Surface structure creation with NIL is based on mechanical deformation of the patterning material. This is radically different from the two main established methods, ultra violet lithography (UVL) and electron beam lithography (EBL), which rely on chemical modification of the patterning media. The thesis is divided into two main parts, the first of which discusses process related issues and the second describes applications. Thus the initial discussion concerns production of stamps, perhaps the most important part of a working imprint technology. Aspects such as choice of materials, patterning methods, implications of structure layout and anti-sticking that have been used or developed in my work are described. The chapter on process outlines details concerning imprint related issues for different substrate materials and polymers and how these impact imprint parameters. The chapters on applications give a short introduction to each of them, and cover life-science, sensors, electronic devices and material research. However, the emphasis is on imprint related issues of the work, since this was my part of the projects. In the biological applications it is shown that nanoimprint patterned polymers are biocompatible and can be used to guide axon growth or create directional movement of motor proteins. In the following chapter imprint and a lift-off process is used to make interdigitated array electrodes for electrochemistry and cantilever sensors. It is shown that NIL can pattern both large area structures (contact pads) and nanometer structures in one single-step process. The electronic devices are made in III-V material and imprint is used to create an etch mask for a wet etch process. We show that the imprinted structures have properties similar to those made by EBL and thus that the electronic properties are not affected by the high pressure and temperature of the imprint process. In the last chapter we show using nanoimprint and a lift-off process that imprint can be used to position metal particles on a surface, which in turn may function as catalytic particles for growing nanowires.
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| 5. |
- Carlberg, Patrick, et al.
(författare)
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Lift-off process for nanoimprint lithography
- 2003
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Ingår i: Microelectronic Engineering. - 1873-5568 .- 0167-9317. ; 67-8, s. 203-207
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Konferensbidrag (refereegranskat)abstract
- We report a novel a lift-off method for nanoimprint lithography. This is a bi-layer method, using a polymethyl methacrylate (PMMA) on lift-off layer (LOL) resist scheme. For the imprint step, direct evidence for good pattern transfer down to 20 nm is shown. Oxygen plasma ashing is required to remove residual PMMA. A liquid solvent, MF 319, is used to transfer the pattern down to the silicon. The LOL is dissolved isotropically while the PMMA is unaffected. Ashing time can kept to a minimum through the wet etch method. This reduces the line widening effect. After metal evaporation a two-step lift-off process prevents metal flakes from adhering to the surface electrostatically. At first warm acetone breakes apart the metal layer and dissolves the PMMA, then warm Remover S-1165 removes the LOL and remaining metal. Structures of lines down to 50 nm and dots with a diameter of sub 20 nm are presented.
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| 6. |
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| 7. |
- Carlberg, Patrick, et al.
(författare)
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Nanoimprint - a tool for realizing nano-bio research
- 2004
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Ingår i: 2004 4th IEEE Conference on Nanotechnology. - 0780385365 ; , s. 199-200
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Konferensbidrag (refereegranskat)abstract
- In this paper, we present a status report on how implementation of nanoimprint lithography has advanced our research. Contact guidance nerve growth experiments have so far primarily been done on micrometer-structured surfaces. We have made a stamp with 17 areas of different, submicron, line width and spacing covering a total 2.6 mm
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| 8. |
- Carlberg, Patrick, et al.
(författare)
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Nanoimprint in mr-L 6000.1 XP/PMMA resist system
- 2002
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Ingår i: 7th International Conference on Nanometer-Scale Science and Technology and 21st European Conference on Surface Science.
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Konferensbidrag (refereegranskat)abstract
- Use of the new resist system mr-L 6000.1 XP in combination with PMMA is demonstrated to give sub-100 nm resolution in nanoimprint lithography. Low glass transition temperature in combination with high plasma stability makes this resist suitable for achieving desirable resist profiles after the imprint process. Imprint conditions for mr-L 6000.1 XP/PMMA resist system as well as imprint results are described and discussed
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| 9. |
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| 10. |
- Carlberg, Patrick
(författare)
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Nanoimprint lithography
- 2004
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Ingår i: NSF/SSF Workshop on Nanoscience and Nanotechnology, Lund, Sweden (2004).
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Konferensbidrag (refereegranskat)
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